JPH0322694B2 - - Google Patents
Info
- Publication number
- JPH0322694B2 JPH0322694B2 JP59164603A JP16460384A JPH0322694B2 JP H0322694 B2 JPH0322694 B2 JP H0322694B2 JP 59164603 A JP59164603 A JP 59164603A JP 16460384 A JP16460384 A JP 16460384A JP H0322694 B2 JPH0322694 B2 JP H0322694B2
- Authority
- JP
- Japan
- Prior art keywords
- base region
- oxide film
- conductor layer
- region
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/34—Bipolar devices
- H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions
Landscapes
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59164603A JPS6063962A (ja) | 1984-08-06 | 1984-08-06 | バイポ−ラトランジスタの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59164603A JPS6063962A (ja) | 1984-08-06 | 1984-08-06 | バイポ−ラトランジスタの製造方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55155376A Division JPS6044823B2 (ja) | 1980-11-05 | 1980-11-05 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6063962A JPS6063962A (ja) | 1985-04-12 |
JPH0322694B2 true JPH0322694B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1991-03-27 |
Family
ID=15796314
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59164603A Granted JPS6063962A (ja) | 1984-08-06 | 1984-08-06 | バイポ−ラトランジスタの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6063962A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62150748A (ja) * | 1985-12-24 | 1987-07-04 | Rohm Co Ltd | 半導体装置の配線形成方法 |
JPH0693458B2 (ja) * | 1986-01-27 | 1994-11-16 | 富士通株式会社 | バイポ−ラトランジスタ |
EP0265489B1 (en) * | 1986-04-23 | 1991-01-16 | AT&T Corp. | Process for manufacturing semiconductor devices |
JPH04219928A (ja) * | 1990-12-20 | 1992-08-11 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
US6633069B2 (en) * | 1997-05-20 | 2003-10-14 | Kabushiki Kaisha Toshiba | Semiconductor device |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2709477B2 (ja) * | 1988-07-21 | 1998-02-04 | キヤノン株式会社 | シリアル記録装置 |
-
1984
- 1984-08-06 JP JP59164603A patent/JPS6063962A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6063962A (ja) | 1985-04-12 |