JPH031821B2 - - Google Patents

Info

Publication number
JPH031821B2
JPH031821B2 JP28680785A JP28680785A JPH031821B2 JP H031821 B2 JPH031821 B2 JP H031821B2 JP 28680785 A JP28680785 A JP 28680785A JP 28680785 A JP28680785 A JP 28680785A JP H031821 B2 JPH031821 B2 JP H031821B2
Authority
JP
Japan
Prior art keywords
ray
mask
absorption band
pattern
ray absorption
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP28680785A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62144328A (ja
Inventor
Hiroki Shimano
Nobuyuki Yoshioka
Kiichi Nishikawa
Nobuo Fujiwara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP60286807A priority Critical patent/JPS62144328A/ja
Publication of JPS62144328A publication Critical patent/JPS62144328A/ja
Publication of JPH031821B2 publication Critical patent/JPH031821B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP60286807A 1985-12-18 1985-12-18 Ｘ線マスク及びその製造方法 Granted JPS62144328A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60286807A JPS62144328A (ja) 1985-12-18 1985-12-18 Ｘ線マスク及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60286807A JPS62144328A (ja) 1985-12-18 1985-12-18 Ｘ線マスク及びその製造方法

Publications (2)

Publication Number Publication Date
JPS62144328A JPS62144328A (ja) 1987-06-27
JPH031821B2 true JPH031821B2 (enrdf_load_html_response) 1991-01-11

Family

ID=17709302

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60286807A Granted JPS62144328A (ja) 1985-12-18 1985-12-18 Ｘ線マスク及びその製造方法

Country Status (1)

Country Link
JP (1) JPS62144328A (enrdf_load_html_response)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0294421A (ja) * 1988-09-30 1990-04-05 Toshiba Corp Ｘ線露光マスク
DE10150874A1 (de) * 2001-10-04 2003-04-30 Zeiss Carl Optisches Element und Verfahren zu dessen Herstellung sowie ein Lithographiegerät und ein Verfahren zur Herstellung eines Halbleiterbauelements
JP4857001B2 (ja) * 2006-03-24 2012-01-18 積水化成品工業株式会社 融雪装置

Also Published As

Publication number Publication date
JPS62144328A (ja) 1987-06-27

Similar Documents

Publication Publication Date Title
EP0234166A1 (fr) Procédé de masquage et masque utilisé
US4634643A (en) X-ray mask and method of manufacturing the same
JPS60108851A (ja) Ｘ線リソグラフイ用のマスクの製造方法
JPH031821B2 (enrdf_load_html_response)
EP0103844B1 (en) X-ray mask
JP2742683B2 (ja) 透過型回折格子の製造方法
JPS60230650A (ja) 微細パタ−ンの製作法
JPS63237523A (ja) Ｘ線マスクおよびその製造方法
JP2694140B2 (ja) Ｘ線マスク及びその製造方法
JPS62201444A (ja) フオトマスクおよびその製造方法
JPH01237660A (ja) フォトマスク
JP2912692B2 (ja) Ｘ線マスクの製造方法
JPS61173250A (ja) フオトマスク材料
JPS63115332A (ja) Ｘ線露光用マスク
JPS5992531A (ja) Ｘ線露光用マスク
JPS62216327A (ja) Ｘ線マスク
JPH03155120A (ja) 反射型ｘ線マスク
JPH0472714A (ja) 反射型ｘ線露光用マスク
JPH0374178B2 (enrdf_load_html_response)
JPS61126551A (ja) Ｘ線リソグラフイ−用マスク構造体の製造方法
JPS63214754A (ja) フオトマスク
JPS58207635A (ja) メンブラン・マスクの製造方法
JPS59213131A (ja) Ｘ線露光用マスクの製造方法
JPS5989422A (ja) Ｘ線マスクの製造方法
JPH01302723A (ja) Ｘ線露光用マスク及びその製造方法