JPH0317277A - メッキ組成物および黒色無電解ニッケルメッキ膜の形成方法 - Google Patents

メッキ組成物および黒色無電解ニッケルメッキ膜の形成方法

Info

Publication number
JPH0317277A
JPH0317277A JP2047102A JP4710290A JPH0317277A JP H0317277 A JPH0317277 A JP H0317277A JP 2047102 A JP2047102 A JP 2047102A JP 4710290 A JP4710290 A JP 4710290A JP H0317277 A JPH0317277 A JP H0317277A
Authority
JP
Japan
Prior art keywords
concentration
composition
plating
saccharin
composition according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2047102A
Other languages
English (en)
Japanese (ja)
Inventor
Peter Verhoeven
ペーター・フェルヘーフェン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OMI International Corp
Original Assignee
OMI International Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OMI International Corp filed Critical OMI International Corp
Publication of JPH0317277A publication Critical patent/JPH0317277A/ja
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
JP2047102A 1989-02-27 1990-02-27 メッキ組成物および黒色無電解ニッケルメッキ膜の形成方法 Pending JPH0317277A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB8904435A GB2231063A (en) 1989-02-27 1989-02-27 Electroless plating composition containing saccharin
GB8904435.8 1989-02-27

Publications (1)

Publication Number Publication Date
JPH0317277A true JPH0317277A (ja) 1991-01-25

Family

ID=10652386

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2047102A Pending JPH0317277A (ja) 1989-02-27 1990-02-27 メッキ組成物および黒色無電解ニッケルメッキ膜の形成方法

Country Status (8)

Country Link
JP (1) JPH0317277A (en, 2012)
BE (1) BE1003583A5 (en, 2012)
CH (1) CH680449A5 (en, 2012)
DE (1) DE4005088A1 (en, 2012)
ES (1) ES2021949A6 (en, 2012)
GB (1) GB2231063A (en, 2012)
IT (1) IT1240776B (en, 2012)
NL (1) NL9000308A (en, 2012)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004124261A (ja) * 2002-10-04 2004-04-22 Enthone Inc 金属の無電解析出法
JP2006169605A (ja) * 2004-12-17 2006-06-29 Nippon Kanizen Kk リン酸塩被膜を有する無電解ニッケルめっき膜の形成方法およびその形成膜
KR20120050999A (ko) * 2009-07-03 2012-05-21 엔쏜 인코포레이티드 베타-아미노산 함유 전해질 및 금속 층 침착 방법

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2135635C1 (ru) * 1998-04-27 1999-08-27 Институт химии твердого тела и механохимии СО РАН Раствор для химического никелирования
CN111850534B (zh) * 2020-06-16 2022-03-01 中国石油天然气集团有限公司 一种马氏体不锈钢油管低应力预钝化膜及其制备方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3088846A (en) * 1962-01-24 1963-05-07 Gen Am Transport Processes of treating nickel-phosphorus alloy coatings and the resulting modified coatings
US3215700A (en) * 1964-02-03 1965-11-02 Harshaw Chem Corp Certain 2-(hydroxyalkynyl)-substituted saccharins
US3586524A (en) * 1969-07-10 1971-06-22 Shell Oil Co Consolidation of formations by electroless metal plating process
DE2111136A1 (de) * 1971-03-09 1972-09-28 Kalle Ag Verfahren zur Herstellung von metallisierten Formkoerpern aus makromolekularem Material
JPS5437088B2 (en, 2012) * 1972-02-18 1979-11-13
CA1016488A (en) * 1974-04-01 1977-08-30 Oxy Metal Industries Corporation Electrodeposition of bright nickel-iron deposits
GB1553503A (en) * 1976-05-14 1979-09-26 Oxy Metal Industries Corp Electrodeposition of bright nickel-iron deposits
US4179343A (en) * 1979-02-12 1979-12-18 Oxy Metal Industries Corporation Electroplating bath and process for producing bright, high-leveling nickel iron electrodeposits
NL8201849A (nl) * 1982-05-06 1983-12-01 Philips Nv Voorwerp met een laag van een nikkel-fosfor-legering en met een conversielaag bedekt.
JPS6075583A (ja) * 1983-09-29 1985-04-27 Komatsu Ltd 超砥粒の無電解めつき法
JPS60248882A (ja) * 1984-05-24 1985-12-09 Aisin Seiki Co Ltd 高リン含有ニツケル合金の無電解めつき浴
CA1274754A (en) * 1985-09-06 1990-10-02 Gary A. Reghi Passivation process and composition for zinc-aluminum alloys

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004124261A (ja) * 2002-10-04 2004-04-22 Enthone Inc 金属の無電解析出法
JP2006169605A (ja) * 2004-12-17 2006-06-29 Nippon Kanizen Kk リン酸塩被膜を有する無電解ニッケルめっき膜の形成方法およびその形成膜
KR20120050999A (ko) * 2009-07-03 2012-05-21 엔쏜 인코포레이티드 베타-아미노산 함유 전해질 및 금속 층 침착 방법
JP2013508538A (ja) * 2009-07-03 2013-03-07 エンソン インコーポレイテッド β−アミノ酸含有電解質および金属層の堆積方法
JP2017166073A (ja) * 2009-07-03 2017-09-21 マクダーミッド エンソン インコーポレイテッド 基板上に金属層を堆積させるための鍍金処方物

Also Published As

Publication number Publication date
IT9047670A0 (it) 1990-02-23
GB8904435D0 (en) 1989-04-12
NL9000308A (nl) 1990-09-17
IT1240776B (it) 1993-12-17
GB2231063A (en) 1990-11-07
ES2021949A6 (es) 1991-11-16
BE1003583A5 (fr) 1992-04-28
IT9047670A1 (it) 1990-08-28
DE4005088A1 (de) 1990-08-30
CH680449A5 (en, 2012) 1992-08-31

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