JPH0313580B2 - - Google Patents

Info

Publication number
JPH0313580B2
JPH0313580B2 JP5470983A JP5470983A JPH0313580B2 JP H0313580 B2 JPH0313580 B2 JP H0313580B2 JP 5470983 A JP5470983 A JP 5470983A JP 5470983 A JP5470983 A JP 5470983A JP H0313580 B2 JPH0313580 B2 JP H0313580B2
Authority
JP
Japan
Prior art keywords
substituted
compound
group
cyan group
cyan
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5470983A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59178448A (ja
Inventor
Yasuhiko Araki
Kunio Yanagisawa
Hajime Shobi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP5470983A priority Critical patent/JPS59178448A/ja
Publication of JPS59178448A publication Critical patent/JPS59178448A/ja
Publication of JPH0313580B2 publication Critical patent/JPH0313580B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
JP5470983A 1983-03-30 1983-03-30 光重合可能な画像形成用組成物 Granted JPS59178448A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5470983A JPS59178448A (ja) 1983-03-30 1983-03-30 光重合可能な画像形成用組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5470983A JPS59178448A (ja) 1983-03-30 1983-03-30 光重合可能な画像形成用組成物

Publications (2)

Publication Number Publication Date
JPS59178448A JPS59178448A (ja) 1984-10-09
JPH0313580B2 true JPH0313580B2 (cg-RX-API-DMAC7.html) 1991-02-22

Family

ID=12978325

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5470983A Granted JPS59178448A (ja) 1983-03-30 1983-03-30 光重合可能な画像形成用組成物

Country Status (1)

Country Link
JP (1) JPS59178448A (cg-RX-API-DMAC7.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3602215A1 (de) * 1986-01-25 1987-07-30 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
JP2003050459A (ja) * 2001-08-07 2003-02-21 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法およびプリント配線板の製造法
US7582390B2 (en) * 2003-05-23 2009-09-01 Fujifilm Corporation Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method
EP1510862A3 (en) * 2003-08-25 2006-08-09 Fuji Photo Film Co., Ltd. Hologram recording method and hologram recording material
JP2011095765A (ja) * 2010-12-16 2011-05-12 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法およびプリント配線板の製造法
WO2021039320A1 (ja) * 2019-08-29 2021-03-04 積水ポリマテック株式会社 光硬化性組成物及びその硬化体、シール材、保護材、防水構造並びに硬化体の製造方法

Also Published As

Publication number Publication date
JPS59178448A (ja) 1984-10-09

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