JPS59178448A - 光重合可能な画像形成用組成物 - Google Patents

光重合可能な画像形成用組成物

Info

Publication number
JPS59178448A
JPS59178448A JP5470983A JP5470983A JPS59178448A JP S59178448 A JPS59178448 A JP S59178448A JP 5470983 A JP5470983 A JP 5470983A JP 5470983 A JP5470983 A JP 5470983A JP S59178448 A JPS59178448 A JP S59178448A
Authority
JP
Japan
Prior art keywords
leuco dye
initiator
photopolymn
color
photopolymerizable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5470983A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0313580B2 (cg-RX-API-DMAC7.html
Inventor
Yasuhiko Araki
泰彦 荒木
Kunio Yanagisawa
柳沢　邦夫
Hajime Shiyouhi
初 松扉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP5470983A priority Critical patent/JPS59178448A/ja
Publication of JPS59178448A publication Critical patent/JPS59178448A/ja
Publication of JPH0313580B2 publication Critical patent/JPH0313580B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
JP5470983A 1983-03-30 1983-03-30 光重合可能な画像形成用組成物 Granted JPS59178448A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5470983A JPS59178448A (ja) 1983-03-30 1983-03-30 光重合可能な画像形成用組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5470983A JPS59178448A (ja) 1983-03-30 1983-03-30 光重合可能な画像形成用組成物

Publications (2)

Publication Number Publication Date
JPS59178448A true JPS59178448A (ja) 1984-10-09
JPH0313580B2 JPH0313580B2 (cg-RX-API-DMAC7.html) 1991-02-22

Family

ID=12978325

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5470983A Granted JPS59178448A (ja) 1983-03-30 1983-03-30 光重合可能な画像形成用組成物

Country Status (1)

Country Link
JP (1) JPS59178448A (cg-RX-API-DMAC7.html)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62184455A (ja) * 1986-01-25 1987-08-12 モートン　インターナショナル　インコーポレイテッド 光重合性組成物
JP2003050459A (ja) * 2001-08-07 2003-02-21 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法およびプリント配線板の製造法
US7582390B2 (en) * 2003-05-23 2009-09-01 Fujifilm Corporation Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method
US7588863B2 (en) * 2003-08-25 2009-09-15 Fujifilm Corporation Hologram recording method and hologram recording material
JP2011095765A (ja) * 2010-12-16 2011-05-12 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法およびプリント配線板の製造法
JPWO2021039320A1 (cg-RX-API-DMAC7.html) * 2019-08-29 2021-03-04

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62184455A (ja) * 1986-01-25 1987-08-12 モートン　インターナショナル　インコーポレイテッド 光重合性組成物
JP2003050459A (ja) * 2001-08-07 2003-02-21 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法およびプリント配線板の製造法
US7582390B2 (en) * 2003-05-23 2009-09-01 Fujifilm Corporation Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method
US7588863B2 (en) * 2003-08-25 2009-09-15 Fujifilm Corporation Hologram recording method and hologram recording material
JP2011095765A (ja) * 2010-12-16 2011-05-12 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法およびプリント配線板の製造法
JPWO2021039320A1 (cg-RX-API-DMAC7.html) * 2019-08-29 2021-03-04
WO2021039320A1 (ja) * 2019-08-29 2021-03-04 積水ポリマテック株式会社 光硬化性組成物及びその硬化体、シール材、保護材、防水構造並びに硬化体の製造方法

Also Published As

Publication number Publication date
JPH0313580B2 (cg-RX-API-DMAC7.html) 1991-02-22

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