JPH0313581B2 - - Google Patents

Info

Publication number
JPH0313581B2
JPH0313581B2 JP11253483A JP11253483A JPH0313581B2 JP H0313581 B2 JPH0313581 B2 JP H0313581B2 JP 11253483 A JP11253483 A JP 11253483A JP 11253483 A JP11253483 A JP 11253483A JP H0313581 B2 JPH0313581 B2 JP H0313581B2
Authority
JP
Japan
Prior art keywords
substituted
compound
photopolymerization initiator
group
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11253483A
Other languages
English (en)
Japanese (ja)
Other versions
JPS604940A (ja
Inventor
Yasuhiko Araki
Kunio Yanagisawa
Hajime Shobi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP11253483A priority Critical patent/JPS604940A/ja
Publication of JPS604940A publication Critical patent/JPS604940A/ja
Publication of JPH0313581B2 publication Critical patent/JPH0313581B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
JP11253483A 1983-06-22 1983-06-22 光重合可能な画像形成用組成物 Granted JPS604940A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11253483A JPS604940A (ja) 1983-06-22 1983-06-22 光重合可能な画像形成用組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11253483A JPS604940A (ja) 1983-06-22 1983-06-22 光重合可能な画像形成用組成物

Publications (2)

Publication Number Publication Date
JPS604940A JPS604940A (ja) 1985-01-11
JPH0313581B2 true JPH0313581B2 (cg-RX-API-DMAC7.html) 1991-02-22

Family

ID=14589046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11253483A Granted JPS604940A (ja) 1983-06-22 1983-06-22 光重合可能な画像形成用組成物

Country Status (1)

Country Link
JP (1) JPS604940A (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003050459A (ja) * 2001-08-07 2003-02-21 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法およびプリント配線板の製造法
DE10161242C1 (de) * 2001-12-13 2003-03-13 Andreas Peter Galac Verfahren zur Herstellung von Verbundglas
JP2011095765A (ja) * 2010-12-16 2011-05-12 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法およびプリント配線板の製造法

Also Published As

Publication number Publication date
JPS604940A (ja) 1985-01-11

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