JPS604940A - 光重合可能な画像形成用組成物 - Google Patents

光重合可能な画像形成用組成物

Info

Publication number
JPS604940A
JPS604940A JP11253483A JP11253483A JPS604940A JP S604940 A JPS604940 A JP S604940A JP 11253483 A JP11253483 A JP 11253483A JP 11253483 A JP11253483 A JP 11253483A JP S604940 A JPS604940 A JP S604940A
Authority
JP
Japan
Prior art keywords
composition
light
dye
amino
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11253483A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0313581B2 (cg-RX-API-DMAC7.html
Inventor
Yasuhiko Araki
泰彦 荒木
Kunio Yanagisawa
柳沢　邦夫
Hajime Shiyouhi
初 松扉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sekisui Chemical Co Ltd
Original Assignee
Sekisui Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sekisui Chemical Co Ltd filed Critical Sekisui Chemical Co Ltd
Priority to JP11253483A priority Critical patent/JPS604940A/ja
Publication of JPS604940A publication Critical patent/JPS604940A/ja
Publication of JPH0313581B2 publication Critical patent/JPH0313581B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
JP11253483A 1983-06-22 1983-06-22 光重合可能な画像形成用組成物 Granted JPS604940A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11253483A JPS604940A (ja) 1983-06-22 1983-06-22 光重合可能な画像形成用組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11253483A JPS604940A (ja) 1983-06-22 1983-06-22 光重合可能な画像形成用組成物

Publications (2)

Publication Number Publication Date
JPS604940A true JPS604940A (ja) 1985-01-11
JPH0313581B2 JPH0313581B2 (cg-RX-API-DMAC7.html) 1991-02-22

Family

ID=14589046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11253483A Granted JPS604940A (ja) 1983-06-22 1983-06-22 光重合可能な画像形成用組成物

Country Status (1)

Country Link
JP (1) JPS604940A (cg-RX-API-DMAC7.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003050459A (ja) * 2001-08-07 2003-02-21 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法およびプリント配線板の製造法
EP1321290A3 (de) * 2001-12-13 2003-11-26 Andreas Peter Galac Verfahren zur Herstellung von Verbundglas
JP2011095765A (ja) * 2010-12-16 2011-05-12 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法およびプリント配線板の製造法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003050459A (ja) * 2001-08-07 2003-02-21 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法およびプリント配線板の製造法
EP1321290A3 (de) * 2001-12-13 2003-11-26 Andreas Peter Galac Verfahren zur Herstellung von Verbundglas
JP2011095765A (ja) * 2010-12-16 2011-05-12 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法およびプリント配線板の製造法

Also Published As

Publication number Publication date
JPH0313581B2 (cg-RX-API-DMAC7.html) 1991-02-22

Similar Documents

Publication Publication Date Title
US4515877A (en) Image-recording materials and image-recording carried out using these to produce an optical mask
EP0343984A2 (en) Color filter array for liquid crystal display device
JPH0248664A (ja) ドライフイルムレジスト用光重合性組成物
WO2012067107A1 (ja) 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP4924230B2 (ja) 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
US5885746A (en) Photosensitive resin composition, photosensitive printing plate using the same and method of manufacturing printing master plate
JP3508819B2 (ja) 光重合性組成物
JPH0374382B2 (cg-RX-API-DMAC7.html)
JP5600903B2 (ja) 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JPS62210443A (ja) 感光性記録素子
JP5793924B2 (ja) 感光性樹脂組成物、感光性エレメント、レジストパターンの製造方法、及びプリント配線板の製造方法
JP5376043B2 (ja) 感光性樹脂組成物並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP4752656B2 (ja) 感光性樹脂組成物、感光性エレメント、これらを用いたレジストパターンの形成方法及びプリント配線板の製造方法
JPS604940A (ja) 光重合可能な画像形成用組成物
JPH03179447A (ja) 感光性組成物及びこれを使用するフォトレジスト及び印刷版体の製造方法
JPS59178448A (ja) 光重合可能な画像形成用組成物
JPH01118842A (ja) レジストパターン形成方法
JPS59211036A (ja) 光重合可能な画像形成用組成物
US6033829A (en) Photopolymerizable composition and dry film resist
JP2002040646A (ja) 光重合性組成物
EP0889362B1 (en) Photopolymerizable composition and dry film resist
EP0851296B1 (en) Thermally imageable material
JPS59178449A (ja) 光重合可能な画像形成用組成物
JPS59193446A (ja) 感光性積層物
JPH045182B2 (cg-RX-API-DMAC7.html)