WO2011114593A1 - 感光性樹脂組成物並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 - Google Patents
感光性樹脂組成物並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 Download PDFInfo
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- WO2011114593A1 WO2011114593A1 PCT/JP2010/072490 JP2010072490W WO2011114593A1 WO 2011114593 A1 WO2011114593 A1 WO 2011114593A1 JP 2010072490 W JP2010072490 W JP 2010072490W WO 2011114593 A1 WO2011114593 A1 WO 2011114593A1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
Definitions
- the present invention relates to a photosensitive resin composition, a photosensitive element using the same, a resist pattern forming method, and a printed wiring board manufacturing method.
- photosensitive resin compositions are widely used as resist materials used for etching and plating.
- the photosensitive resin composition is used as a photosensitive element including a support film and a layer (hereinafter referred to as “photosensitive resin layer”) formed using the photosensitive resin composition formed on the support film. It is often done.
- the printed wiring board is manufactured as follows. First, the photosensitive resin layer of the photosensitive element is laminated (laminated) on the substrate (lamination step). Next, in some cases, after peeling off and removing the support film, a predetermined portion of the photosensitive resin layer is irradiated with actinic rays to expose and cure the predetermined portion (exposure process). Thereafter, by removing (developing) portions (unexposed / uncured portions) other than the predetermined portion from the substrate, a resist pattern made of a cured product of the photosensitive resin composition is formed on the substrate (development). Process).
- the substrate on which the resist pattern is formed is etched or plated to form a circuit pattern, and finally the resist pattern is peeled off from the substrate (circuit pattern forming step). In this way, a printed wiring board having a circuit pattern formed on the substrate is manufactured.
- a mask exposure method in which an actinic ray is irradiated through a mask film having a pattern is used.
- a light source for actinic light a light source that effectively emits ultraviolet rays, such as a carbon arc lamp, a mercury vapor arc lamp, an ultrahigh pressure mercury lamp, a high pressure mercury lamp, and a xenon lamp, is used.
- a direct drawing method in which actinic rays are directly irradiated in an image form using digital data without using a mask film has been put into practical use.
- a light source used for the direct drawing method a YAG laser, a semiconductor laser, etc. are used from the viewpoint of safety and handleability, and recently, a technology using a long-life, high-power gallium nitride blue laser, etc. Proposed.
- DLP Digital Light Processing
- active light having a wavelength of 390 to 430 nm using a blue-violet semiconductor laser as a light source
- an exposure method using a polygon multi-beam having a wavelength of 355 nm using a YAG laser as a light source which is compatible with a small amount and a wide variety of products in general-purpose printed wiring boards, is also used.
- the developer used for removing the unexposed portion of the photosensitive resin layer from the substrate in the above development step is an alkali such as an aqueous sodium carbonate solution or an aqueous sodium hydrogen carbonate solution from the viewpoint of environment and safety. Developers are mainstream.
- the unexposed portion of the photosensitive resin layer is removed from the substrate by the development with these developers and the spray pressure of water washing. Therefore, the photosensitive resin composition is required to have excellent tent reliability (tenting property) that is not damaged by the development or water spray pressure after exposure.
- a photosensitive resin composition containing a bifunctional or trifunctional monomer has been proposed as a photosensitive resin composition having excellent tent reliability in a conventional mask exposure method (see, for example, Patent Documents 1 and 2).
- the photosensitive resin composition containing the bifunctional or trifunctional monomer has excellent tent reliability in the conventional mask exposure method, it does not have sufficient tent reliability in the direct drawing method. It was.
- an object of the present invention is to provide a photosensitive resin composition having excellent tent reliability when exposed by a direct drawing method. Moreover, it aims at providing the photosensitive element using the said photosensitive resin composition, the formation method of a resist pattern, and the manufacturing method of a printed wiring board.
- the present inventors have achieved excellent tent reliability when exposed by a direct drawing method by using a compound having a specific chemical structure as a photopolymerizable compound.
- the present inventors have found that it is possible to provide a photosensitive resin composition having the above, and have completed the present invention.
- the present invention comprises (A) a binder polymer, (B) a photopolymerizable compound, and (C) a photopolymerization initiator, and the (B) photopolymerizable compound is represented by the following general formula (I).
- a photosensitive resin composition used for forming a resist pattern by a direct drawing method By using the compound represented by the following general formula (I) as the photopolymerizable compound (B), the photosensitive resin composition of the present invention has good sensitivity and is excellent when exposed by a direct drawing method. Tent reliability.
- R 1 and R 2 each independently represents a hydrogen atom or a methyl group, and n represents an integer of 0 to 50. In order to further improve the tent reliability, n is preferably an integer of 4 to 25.
- the (B) photopolymerizable compound further includes a compound represented by the following general formula (II) because the peelability is further improved.
- R 3 represents a hydrogen atom or a methyl group
- R 4 represents a hydrocarbon group having 9 carbon atoms
- m represents an integer of 0 to 20.
- m is preferably an integer of 4 to 8.
- the above (C) photopolymerization initiator preferably contains a compound represented by the following general formula (III) and / or a compound represented by the following general formula (IV) because the sensitivity is further improved.
- R 5 represents an alkylene group having 2 to 20 carbon atoms, an oxadialkylene group or a thiodialkylene group.
- R 6 represents a monovalent aromatic group which may have a substituent.
- the present invention also relates to a photosensitive element comprising a support film and a photosensitive resin layer formed using the photosensitive resin composition formed on the support film.
- the present invention also includes a laminating step of laminating a photosensitive resin layer formed using the photosensitive resin composition on a substrate, and irradiating the photosensitive resin layer with actinic rays in an image form by a direct drawing method. And an exposure step for curing the exposed portion and a development step for forming a resist pattern made of a cured product of the photosensitive resin composition on the substrate by removing the unexposed portion of the photosensitive resin layer from the substrate. And a method of forming a resist pattern.
- the present invention also relates to a method for manufacturing a printed wiring board, including etching or plating a substrate on which a resist pattern is formed by the above method.
- a photosensitive resin composition having excellent sensitivity and having excellent tent reliability when exposed by a direct drawing method. Also, by providing a photosensitive element using the photosensitive resin composition, a method for forming a resist pattern, and a method for producing a printed wiring board, it is possible to produce a printed wiring board having a high-definition circuit pattern. Become.
- the photosensitive resin composition of the present embodiment includes (A) a binder polymer (hereinafter also referred to as “(A) component”), (B) a photopolymerizable compound (hereinafter also referred to as “(B) component”). And (C) a photopolymerization initiator (hereinafter also referred to as “component (C)”), which is a photosensitive resin composition used for forming a resist pattern by a direct drawing method.
- the “direct drawing method” means that a desired pattern is directly exposed to light by irradiating a photosensitive resin layer with an actinic ray such as a laser beam based on digital data without using a mask film or the like. It means an exposure method for drawing on a resin layer.
- the photosensitive resin composition of this embodiment contains the compound represented by the following general formula (I) as a photopolymerizable compound which is (B) component.
- tent reliability means a property (tenting property) that is not damaged by the spray pressure of development or washing after exposure
- the evaluation of tent reliability is a substrate for measuring the number of broken holes shown in FIG. Is used to measure the deformed tent tear rate (%).
- R 1 and R 2 each independently represent a hydrogen atom or a methyl group.
- R 1 and R 2 are preferably methyl groups because the developer resistance is improved.
- n represents an integer of 0 to 50. In order to further improve the tent reliability, n is preferably an integer of 4 to 25, more preferably an integer of 9 to 24, and even more preferably an integer of 9 to 14.
- the content of the compound represented by the general formula (I) is preferably 5 to 90% by mass on the basis of the total mass of the component (B) from the viewpoint of excellent balance between sensitivity and resolution.
- the content is preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 15% by mass or more, and particularly preferably 20% by mass or more.
- the content is preferably 90% by mass or less, more preferably 70% by mass or less, still more preferably 50% by mass or less, and particularly preferably 40% by mass or less.
- the photosensitive resin composition of this embodiment can further contain (B) component other than the compound represented by the said general formula (I).
- These components (B) are not particularly limited as long as they have an ethylenically unsaturated bond and can be photocrosslinked, and examples thereof include the following compounds (B1) to (B5). These can be used alone or in combination of two or more.
- B1 Bisphenol A di (meth) acrylate compound
- B2 Compound having one ethylenically unsaturated bond
- B3 Compound obtained by reacting polyhydric alcohol with ⁇ , ⁇ -unsaturated carboxylic acid
- B4 Compound obtained by reacting glycidyl group-containing compound with ⁇ , ⁇ -unsaturated carboxylic acid
- Urethane monomer such as (meth) acrylate compound having urethane bond
- (B) component contains the bisphenol A type
- (B1) include 2,2-bis (4-((meth) acryloxypolyethoxy) phenyl) propane, 2,2-bis (4-((meth) acryloxypolypropoxy) phenyl) propane, And 2,2-bis (4-((meth) acryloxypolyethoxypolypropoxy) phenyl) propane.
- Examples of the 2,2-bis (4-((meth) acryloxypolyethoxy) phenyl) propane include 2,2-bis (4-((meth) acryloxydiethoxy) phenyl) propane, 2,2 -Bis (4-((meth) acryloxytriethoxy) phenyl) propane, 2,2-bis (4-((meth) acryloxytetraethoxy) phenyl) propane, 2,2-bis (4-((meta ) Acryloxypentaethoxy) phenyl) propane, 2,2-bis (4-((meth) acryloxyhexaethoxy) phenyl) propane, 2,2-bis (4-((meth) acryloxyheptaethoxy) phenyl) Propane, 2,2-bis (4-((meth) acryloxyoctaethoxy) phenyl) propane, 2,2-bis (4-((meth) acryloxynona) Toxi) phenyl) propane, 2,2-bis (4-((
- BPE-500 (methacryloxypentaethoxy) propane
- BPE-1300 (trade name, manufactured by Shin-Nakamura Chemical Co., Ltd.).
- Examples of the 2,2-bis (4-((meth) acryloxypolypropoxy) phenyl) propane include 2,2-bis (4-((meth) acryloxydipropoxy) phenyl) propane, 2,2 -Bis (4-((meth) acryloxytripropoxy) phenyl) propane, 2,2-bis (4-((meth) acryloxytetrapropoxy) phenyl) propane, 2,2-bis (4-((meta ) Acryloxypentapropoxy) phenyl) propane, 2,2-bis (4-((meth) acryloxyhexapropoxy) phenyl) propane, 2,2-bis (4-((meth) acryloxyheptapropoxy) phenyl) Propane, 2,2-bis (4-((meth) acryloxyoctapropoxy) phenyl) propane, 2,2-bis (4-((meth)) Acryloxynonapropoxy) phenyl) propane, 2,2-bis (4-((meth) acryloxy
- Examples of the 2,2-bis (4-((meth) acryloxypolyethoxypolypropoxy) phenyl) propane include 2,2-bis (4-((meth) acryloxydiethoxyoctapropoxy) phenyl) propane. 2,2-bis (4-((meth) acryloxytetraethoxytetrapropoxy) phenyl) propane and 2,2-bis (4-((meth) acryloxyhexaethoxyhexapropoxy) phenyl) propane. These can be used alone or in combination of two or more.
- the content is preferably 20 to 80% by mass, based on the total mass of the component (B), and 30 to 70% by mass. % Is more preferable.
- the component (B) contains a compound (B2) having one ethylenically unsaturated bond in the molecule from the viewpoint of excellent tent reliability.
- Examples of (B2) include nonylphenoxy-based (meth) acrylate compounds represented by the following general formula (II), ⁇ -chloro- ⁇ -hydroxypropyl- ⁇ '-(meth) acryloyloxyethyl-o-phthalate, ⁇ - Examples thereof include hydroxyethyl- ⁇ '-(meth) acryloyloxyethyl-o-phthalate, ⁇ -hydroxypropyl- ⁇ '-(meth) acryloyloxyethyl-o-phthalate, and the like.
- R 3 represents a hydrogen atom or a methyl group.
- R 3 is preferably a hydrogen atom from the viewpoint of improving developer properties.
- R 4 represents a hydrocarbon group having 9 carbon atoms.
- m represents an integer of 0-20. In order to further improve the tent reliability, m is preferably an integer of 4 to 15, more preferably an integer of 4 to 10, and still more preferably an integer of 4 to 8.
- Nonylphenoxy (poly) ethylene glycol (meth) acrylate is obtained by reacting (poly) ethylene glycol, nonylphenol and (meth) acrylic acid.
- Examples of nonylphenoxy (poly) ethylene glycol (meth) acrylate include nonylphenoxytetraethylene glycol (meth) acrylate and nonylphenoxyoctaethylene glycol (meth) acrylate.
- Examples of commercially available compounds represented by the above general formula (II) include nonylphenoxy (poly) ethylene glycol such as FA-314A and FA-318A (both manufactured by Hitachi Chemical Co., Ltd., trade names). An acrylate is mentioned.
- the content of the compound represented by the general formula (II) is preferably 5 to 90% by mass based on the total mass of the component (B) in terms of excellent balance between sensitivity and resolution.
- the content is preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 15% by mass or more, and particularly preferably 20% by mass or more.
- the content is preferably 90% by mass or less, more preferably 70% by mass or less, still more preferably 50% by mass or less, and particularly preferably 40% by mass or less.
- Examples of the compound (B3) obtained by reacting the polyhydric alcohol with an ⁇ , ⁇ -unsaturated carboxylic acid include polypropylene glycol di (meth) acrylate having 2 to 14 oxypropylene groups and trimethylolpropane.
- EO-modified means a compound (polyoxyethylenated compound) having a block structure of a (poly) oxyethylene chain
- PO-modified means (poly) oxypropylene. This means a compound having a chain block structure (compound converted to polyoxypropylene), and “EO / PO modified” has a block structure of (poly) oxyethylene chain and (poly) oxypropylene chain. It means that the compound is a compound (polyoxyethylenated and polyoxypropylenated compound). These can be used alone or in combination of two or more.
- Examples of the urethane monomer (B5) include (meth) acrylic monomers having a hydroxyl group at the ⁇ -position, isophorone diisocyanate, 2,6-toluene diisocyanate, 2,4-toluene diisocyanate, and 1,6-hexamethylene diisocyanate. Examples include addition reaction products with diisocyanate compounds, tris ((meth) acryloxytetraethylene glycol isocyanate) hexamethylene isocyanurate, EO-modified urethane di (meth) acrylate, EO, PO-modified urethane di (meth) acrylate, and the like.
- Examples of the EO-modified urethane di (meth) acrylate include trade name UA-11 manufactured by Shin-Nakamura Chemical Co., Ltd.
- Examples of EO and PO-modified urethane di (meth) acrylates include trade name UA-13 manufactured by Shin-Nakamura Chemical Co., Ltd.
- Examples of tris ((meth) acryloxytetraethylene glycol isocyanate) hexamethylene isocyanurate include trade name UA-21 manufactured by Shin-Nakamura Chemical Co., Ltd.
- UA-21 is preferably 5 to 25% by weight, and more preferably 7 to 15% by weight from the viewpoint of further improving the tent reliability. These can be used alone or in combination of two or more.
- the content of the component (B) (photopolymerizable compound) is preferably 20 to 60 parts by mass with respect to 100 parts by mass as a total of the components (A) and (B).
- the content of the component (B) is preferably 20 parts by mass or more, more preferably 25 parts by mass or more, and further preferably 30 parts by mass or more.
- the content of the component (B) is preferably 60 parts by mass or less, more preferably 55 parts by mass or less, and even more preferably 50 parts by mass or less in that the film property is imparted and the resist shape after curing is excellent.
- Binder polymer The binder polymer as the component (A) is not particularly limited as long as it is soluble in an alkaline aqueous solution and can form a film.
- acrylic resin styrene resin, epoxy resin, amide resin, amide epoxy Resin, alkyd resin, and phenol resin.
- acrylic resins are preferred from the standpoint of alkali developability. These can be used alone or in combination of two or more.
- the component (A) can be produced, for example, by radical polymerization of a polymerizable monomer (monomer).
- the polymerizable monomer include styrene; a polymerizable styrene derivative substituted at the ⁇ -position or aromatic ring such as ⁇ -methylstyrene and vinyltoluene; acrylamide such as diacetone acrylamide; acrylonitrile; vinyl- ethers of vinyl alcohol such as n-butyl ether; (meth) acrylic acid alkyl ester, (meth) acrylic acid benzyl ester, (meth) acrylic acid tetrahydrofurfuryl ester, (meth) acrylic acid dimethylaminoethyl ester, (meth) (Meth) acrylic acid such as diethylaminoethyl acrylate, glycidyl (meth) acrylate, 2,2,2-trifluoroethyl (meth) acrylate, 2,2,3,3
- Examples of the (meth) acrylic acid alkyl ester include compounds represented by the following general formula (V).
- R 7 represents a hydrogen atom or a methyl group
- R 8 represents an alkyl group having 1 to 12 carbon atoms.
- Examples of the alkyl group having 1 to 12 carbon atoms represented by R 8 in the general formula (V) include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, and an octyl group. , Nonyl group, decyl group, undecyl group, dodecyl group and structural isomers thereof.
- Examples of the compound represented by the general formula (V) include (meth) acrylic acid methyl ester, (meth) acrylic acid ethyl ester, (meth) acrylic acid propyl ester, (meth) acrylic acid butyl ester, (meth) ) Acrylic acid pentyl ester, (meth) acrylic acid hexyl ester, (meth) acrylic acid heptyl ester, (meth) acrylic acid octyl ester, (meth) acrylic acid 2-ethylhexyl ester, (meth) acrylic acid nonyl ester, (meth) ) Acrylic acid decyl ester, (meth) acrylic acid undecyl ester, (meth) acrylic acid dodecyl ester. These can be used alone or in combination of two or more.
- examples of the (meth) acrylic acid alkyl ester include compounds in which an alkyl group is substituted with a hydroxyl group, an epoxy group, a halogen group, or the like in the compound represented by the general formula (V).
- the component (A) preferably contains a carboxyl group from the viewpoint of alkali developability.
- the component (A) containing a carboxyl group can be produced, for example, by radical polymerization of a polymerizable monomer having a carboxyl group and another polymerizable monomer.
- a polymerizable monomer having a carboxyl group (meth) acrylic acid is preferable, and methacrylic acid is more preferable.
- Component (A) carboxyl group content is the component (A) from the viewpoint of the balance between alkali developability and developer resistance.
- the total mass is preferably 12 to 50% by mass. In terms of excellent alkali developability, 12% by mass or more is preferable, and 15% by mass or more is more preferable. Further, in terms of excellent developer resistance, it is preferably 50% by mass or less, more preferably 40% by mass or less, still more preferably 30% by mass or less, and particularly preferably 25% by mass or less.
- the component (A) preferably contains styrene or a styrene derivative as a polymerizable monomer from the viewpoint of adhesion and release properties.
- the content of the above styrene or styrene derivative as a copolymerization component (ratio of styrene or styrene derivative to the total polymerizable monomer used) is (A ) It is preferable to contain 0.1 to 30% by mass based on the total mass of the components. In the point which is excellent in adhesiveness, 0.1 mass% or more is preferable, 1 mass% or more is more preferable, and 1.5 mass% or more is still more preferable. Moreover, from the point which is excellent in peelability, 30 mass% or less is preferable, 28 mass% or less is more preferable, and 27 mass% or less is still more preferable.
- binder polymers can be used alone or in combination of two or more.
- binder polymer used in combination of two or more types include, for example, two or more types of binder polymers composed of different copolymerization components, two or more types of binder polymers having different weight average molecular weights, and two or more types of binders having different dispersities. Examples thereof include polymers.
- the weight average molecular weight of the component (A) is preferably 20,000 to 300,000 from the viewpoint of the balance between developer resistance and alkali developability. In terms of excellent developer resistance, 20,000 or more is preferable, 40,000 or more is more preferable, and 50,000 or more is more preferable. In terms of excellent alkali developability, 150,000 or less is preferable, and 120,000 or less is more preferable.
- the weight average molecular weight in this specification is a value measured by a gel permeation chromatography method and converted by a calibration curve created using standard polystyrene.
- the content of component (A) is preferably 40 to 80 parts by mass with respect to 100 parts by mass of the total amount of components (A) and (B).
- 40 mass parts or more are preferable, 45 mass parts or more are more preferable, and 50 mass parts or more are still more preferable.
- 80 mass parts or less are preferable at the point which is excellent in a sensitivity and resolution, 75 mass parts or less are more preferable, and 70 mass parts or less are still more preferable.
- photoinitiator which is (C) component contains the compound represented by the following general formula (III) and / or the following general formula (IV).
- R 5 represents an alkylene group having 2 to 20 carbon atoms, an oxadialkylene group or a thiodialkylene group.
- the component (C) is a compound represented by the above general formula (III), in which R 5 is an alkylene group having 7 carbon atoms (for example, ADEKA Corporation). Product name “N-1717”).
- the content is from the viewpoint of balance between sensitivity and resolution, with respect to 100 parts by mass of the total amount of the component (A) and the component (B).
- the amount is preferably 0.01 to 20 parts by weight, more preferably 0.1 to 10 parts by weight, and still more preferably 0.2 to 5 parts by weight. If the content is less than 0.01 parts by weight, sufficient sensitivity tends not to be obtained. If the content exceeds 20 parts by weight, the resist shape becomes an inverted trapezoid, and sufficient adhesion and resolution tend not to be obtained. .
- R 6 represents a monovalent aromatic group which may have a substituent.
- the component (C) is a compound represented by the above general formula (IV), a compound in which R 6 is a phenyl group (for example, manufactured by Nippon Steel Chemical Co., Ltd.). , Trade name “9-PA”).
- the component (C) is a compound represented by the above general formula (IV), wherein R 6 is a phenyl group substituted with an alkyl group, a halogen atom, or the like. It is preferable to include.
- Examples of such compounds include compounds in which R 6 is a p-methylphenyl group, m-methylphenyl group, o-methylphenyl group, or p-chlorophenyl group (for example, products manufactured by Changzhou Power Electronics New Materials Co., Ltd. Names "TR-PAD102", “TR-PAD103", “TR-PAD104", “TR-PAD105”).
- the content is from the viewpoint of balance between sensitivity and resolution, with respect to 100 parts by mass of the total amount of the component (A) and the component (B). It is preferably 0.01 to 10 parts by weight, more preferably 0.05 to 5 parts by weight, and still more preferably 0.1 to 3 parts by weight. If the content is less than 0.01 parts by weight, sufficient sensitivity tends not to be obtained. If the content exceeds 10 parts by weight, the resist shape becomes an inverted trapezoid and sufficient adhesion and resolution tend not to be obtained. .
- the compound represented by the general formula (III) and the compound represented by the general formula (IV) may be used singly or in combination, or the compound represented by the general formula (III) or Two or more compounds represented by the above general formula (IV) may be used in combination.
- Examples of the component (C) (photopolymerization initiator) other than the compound represented by the general formula (III) and the compound represented by the general formula (IV) include benzophenone, N, N′-tetramethyl- 4,4′-diaminobenzophenone (Michler ketone), N, N′-tetraethyl-4,4′-diaminobenzophenone, 4-methoxy-4′-dimethylaminobenzophenone, 2-benzyl-2-dimethylamino-1- (4 -Morpholinophenyl) -butanone-1, and aromatic ketones such as 2-methyl-1- [4- (methylthio) phenyl] -2-morpholino-propanone-1, 2-ethylanthraquinone, phenanthrenequinone, 2-tert- Butyl anthraquinone, octamethylanthraquinone, 1,2-benzanthraquinone, 2,3-
- substituents of the aryl groups of two 2,4,5-triarylimidazoles may be the same to give the target compound, or differently give an asymmetric compound.
- the content of the component (C) is preferably 0.01 to 20 parts by weight, and preferably 0.1 to 10 parts by weight with respect to 100 parts by weight as the total of the components (A) and (B). Is more preferable, and 0.2 to 5 parts by weight is particularly preferable. When the content of the component (C) is within this range, the sensitivity and the internal photocurability of the photosensitive resin composition become better.
- the photosensitive resin composition of the present embodiment may contain, as necessary, dyes such as malachite green, Victoria pure blue, brilliant green, and methyl violet; leuco crystal violet, diphenylamine, benzylamine, triphenylamine, diethylaniline, Photochromic agents such as o-chloroaniline and tribromomethylsulfone; Thermochromic inhibitors; Plasticizers such as p-toluenesulfonamide; Pigments; Fillers; Antifoaming agents; Flame retardants; Adhesion imparting agents; An exfoliation accelerator; an antioxidant; a fragrance; an imaging agent; These can be used alone or in combination of two or more.
- dyes such as malachite green, Victoria pure blue, brilliant green, and methyl violet
- leuco crystal violet diphenylamine, benzylamine, triphenylamine, diethylaniline
- Photochromic agents such as o-chloroaniline and tribromomethylsulf
- the photosensitive resin composition of the present embodiment can be dissolved in an organic solvent and used as a solution (coating solution) having a solid content of about 30 to 60% by mass.
- organic solvent include methanol, ethanol, acetone, methyl ethyl ketone, methyl cellosolve, ethyl cellosolve, toluene, N, N-dimethylformamide, propylene glycol monomethyl ether, or a mixed solvent thereof.
- the photosensitive resin layer formed using the photosensitive resin composition of the present embodiment can be formed by applying the coating liquid on the surface of a metal plate or the like and drying it.
- the metal plate include iron alloys such as copper, copper alloys, nickel, chromium, iron, and stainless steel, preferably copper, copper alloys, and iron alloys.
- the thickness of the photosensitive resin layer varies depending on its use, but is preferably about 1 to 100 ⁇ m after drying.
- the surface of the photosensitive resin layer opposite to the metal plate may be covered with a protective film.
- the protective film include polymer films such as polyethylene and polypropylene.
- FIG. 1 shows an embodiment of the photosensitive element of the present invention.
- Forming the photosensitive resin layer 3 formed using the photosensitive resin composition on the support film 2 by applying the solution of the photosensitive resin composition on the support film 2 and drying it. it can.
- the surface of the photosensitive resin layer 3 opposite to the supporting film 2 is covered with a protective film 4, thereby supporting the supporting film 2, the photosensitive resin layer 3 laminated on the supporting film 2, and the photosensitive film.
- stacked on the photosensitive resin layer 3 is obtained.
- the protective film 4 is not necessarily provided.
- the support film 2 a polymer film having heat resistance and solvent resistance such as polyester such as polyethylene terephthalate, polypropylene, and polyethylene can be used.
- the thickness of the support film 2 is preferably 1 to 100 ⁇ m, more preferably 1 to 50 ⁇ m, still more preferably 1 to 30 ⁇ m. When the thickness is less than 1 ⁇ m, the support film 2 tends to be easily broken when the support film 2 is peeled off, and when it exceeds 100 ⁇ m, the resolution tends to be difficult to obtain sufficiently.
- the protective film 4 preferably has a lower adhesive force to the photosensitive resin layer 3 than the adhesive force of the support film 2 to the photosensitive resin layer 3, and is preferably a low fish eye film.
- fish eye means that when a material is heat-melted, kneaded, extruded, biaxially stretched, casting method, etc., foreign materials, undissolved materials, oxidatively deteriorated materials, etc. are present in the film. It means what was taken in. That is, “low fish eye” means that the above-mentioned foreign matter or the like in the film is small.
- the protective film 4 a polymer film having heat resistance and solvent resistance such as polyester such as polyethylene terephthalate, polypropylene, and polyethylene can be used.
- polyester such as polyethylene terephthalate, polypropylene, and polyethylene
- examples of commercially available products include polypropylene films such as Alphan MA-410 and E-200C manufactured by Oji Paper Co., Ltd., Shin-Etsu Film Co., Ltd., and PS series such as PS series such as Teijin PS-25, and the like.
- the protective film 4 may be the same as the support film 2.
- the thickness of the protective film 4 is preferably 1 to 100 ⁇ m, more preferably 1 to 50 ⁇ m, still more preferably 1 to 30 ⁇ m. When the thickness is less than 1 ⁇ m, the protective film 4 tends to be easily broken when the photosensitive resin layer 3 and the protective film 4 are laminated (laminated) on the substrate, and when the thickness exceeds 100 ⁇ m, the cost is sufficiently low. Tend to disappear.
- Application of the photosensitive resin composition solution onto the support film 2 can be performed by a known method such as a roll coater, a comma coater, a gravure coater, an air knife coater, a die coater, or a bar coater.
- the above solution is preferably dried at 70 to 150 ° C. for about 5 to 30 minutes. After drying, the amount of the remaining organic solvent in the photosensitive resin layer is preferably 2% by mass or less from the viewpoint of preventing diffusion of the organic solvent in the subsequent step.
- the thickness of the photosensitive resin layer 3 in the photosensitive element 1 varies depending on the application, but is preferably 1 to 200 ⁇ m, more preferably 5 to 100 ⁇ m, and more preferably 10 to 50 ⁇ m after drying. Further preferred. If the thickness is less than 1 ⁇ m, it tends to be difficult to apply industrially, and if it exceeds 200 ⁇ m, the sensitivity and the photocurability at the bottom of the resist tend not to be sufficiently obtained.
- the photosensitive element 1 may further include an intermediate layer such as a cushion layer, an adhesive layer, a light absorption layer, and a gas barrier layer.
- an intermediate layer such as a cushion layer, an adhesive layer, a light absorption layer, and a gas barrier layer.
- the obtained photosensitive element 1 can be stored in the form of a sheet or a roll wound around a core.
- the core include plastics such as polyethylene resin, polypropylene resin, polystyrene resin, polyvinyl chloride resin, and ABS resin (acrylonitrile-butadiene-styrene copolymer).
- plastics such as polyethylene resin, polypropylene resin, polystyrene resin, polyvinyl chloride resin, and ABS resin (acrylonitrile-butadiene-styrene copolymer).
- end face separator it is preferable to install an end face separator on the end face of the roll-shaped photosensitive element roll thus obtained, and it is preferable to install a moisture-proof end face separator from the standpoint of edge fusion resistance.
- As a packaging method it is preferable to wrap and package in a black sheet with low moisture permeability.
- a resist pattern can be formed using the photosensitive resin composition.
- the resist pattern forming method according to the present embodiment includes (i) a lamination step of laminating a photosensitive resin layer formed using the photosensitive resin composition on a substrate, and (ii) the photosensitive resin layer.
- a development step of forming a resist pattern made of a cured product of the composition is forming a resist pattern made of a cured product of the composition.
- the photosensitive resin layer formed using the photosensitive resin composition is laminated
- a substrate circuit forming substrate
- Lamination of the photosensitive resin layer on the substrate is performed, for example, by removing the protective film 4 of the photosensitive element 1 and then pressing the photosensitive resin layer 3 of the photosensitive element 1 on the substrate while heating. Is called.
- the laminated body which consists of a board
- This lamination operation is preferably performed under reduced pressure from the viewpoint of adhesion and followability.
- the photosensitive resin layer and / or the substrate is preferably heated at a temperature of 70 to 130 ° C. during the pressure bonding, and is pressure-bonded at a pressure of about 0.1 to 1.0 MPa (about 1 to 10 kgf / cm 2 ).
- these conditions are not particularly limited. If the photosensitive resin layer is heated to 70 to 130 ° C., it is not necessary to pre-heat the substrate in advance, but the substrate may be pre-heated in order to further improve the stackability.
- Exposure Step Exposure Step Next, exposure is performed by a direct drawing method. That is, a desired pattern is directly drawn on the photosensitive resin layer by irradiating the photosensitive resin layer 3 with an actinic ray such as a laser beam on the basis of digital data without using a mask film.
- an actinic ray such as a laser beam
- the support film 2 existing on the photosensitive resin layer 3 is transparent to actinic rays, it can be irradiated with actinic rays through the support film 2, but the support film 2 is light-shielding.
- the photosensitive resin layer is irradiated with actinic rays after the support film 2 is removed.
- Examples of the direct drawing method include a laser direct drawing exposure method and a DLP (Digital Light Processing) exposure method.
- the active light source is preferably a YAG laser, a semiconductor laser, a gallium nitride blue-violet laser, etc., but effectively emits ultraviolet rays such as a carbon arc lamp, a mercury vapor arc lamp, an ultrahigh pressure mercury lamp, a high pressure mercury lamp, and a xenon lamp.
- Those that effectively radiate visible light such as photographic flood bulbs and solar lamps, may be used.
- cured material of the photosensitive resin composition is formed on a board
- development the support film 2 exists on the photosensitive resin layer 3, the support film 2 is removed, and then the unexposed portion is removed (development).
- Development methods include wet development and dry development, but wet development is widely used.
- development is performed by a known development method using a developer corresponding to the photosensitive resin composition.
- the developing method include a method using a dip method, a battle method, a spray method, brushing, slapping, scraping, rocking immersion, and the like. From the viewpoint of improving the resolution, the high pressure spray method is most suitable. You may develop by combining these 2 or more types of methods.
- Examples of the developer include an alkaline aqueous solution, an aqueous developer, and an organic solvent developer.
- An alkaline aqueous solution is safe and stable when used as a developer, and has good operability.
- Examples of the base of the alkaline aqueous solution include alkali hydroxides such as lithium, sodium, or potassium hydroxide; alkali carbonates such as lithium, sodium, potassium, or ammonium carbonate or bicarbonate; potassium phosphate, sodium phosphate, and the like.
- Alkali metal phosphates; alkali metal pyrophosphates such as sodium pyrophosphate and potassium pyrophosphate are used.
- Examples of the alkaline aqueous solution include a dilute solution of 0.1 to 5% by mass sodium carbonate, a dilute solution of 0.1 to 5% by mass potassium carbonate, a dilute solution of 0.1 to 5% by mass sodium hydroxide, and 0.1 to 5%.
- a dilute solution of mass% sodium tetraborate is preferred.
- the pH of the alkaline aqueous solution is preferably in the range of 9 to 11, and the temperature is adjusted according to the alkali developability of the photosensitive resin layer.
- a surfactant, an antifoaming agent, a small amount of an organic solvent for promoting development, and the like may be mixed.
- the aqueous developer is, for example, a developer composed of water or an alkaline aqueous solution and one or more organic solvents.
- the base of the alkaline aqueous solution in addition to the substances described above, for example, borax, sodium metasilicate, tetramethylammonium hydroxide, ethanolamine, ethylenediamine, diethylenetriamine, 2-amino-2-hydroxymethyl-1 , 3-propanediol, 1,3-diaminopropanol-2, morpholine and the like.
- the pH of the aqueous developer is preferably as low as possible within a range where development is sufficiently performed, preferably pH 8 to 12, and more preferably pH 9 to 10.
- Organic solvents used in the aqueous developer include acetone, ethyl acetate, alkoxyethanol having 1 to 4 carbon atoms, ethyl alcohol, isopropyl alcohol, butyl alcohol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether Etc. These are used alone or in combination of two or more.
- the concentration of the organic solvent in the aqueous developer is preferably 2 to 90% by mass, and the temperature can be adjusted according to the alkali developability.
- a small amount of a surfactant, an antifoaming agent or the like can be mixed in the aqueous developer.
- organic solvent developer examples include organic solvents such as 1,1,1-trichloroethane, N-methylpyrrolidone, N, N-dimethylformamide, cyclohexanone, methyl isobutyl ketone, and ⁇ -butyrolactone. It is preferable to add water to these organic solvents in an amount of 1 to 20% by mass in order to prevent ignition.
- organic solvents such as 1,1,1-trichloroethane, N-methylpyrrolidone, N, N-dimethylformamide, cyclohexanone, methyl isobutyl ketone, and ⁇ -butyrolactone. It is preferable to add water to these organic solvents in an amount of 1 to 20% by mass in order to prevent ignition.
- the resist pattern may be further cured by heating at about 60 to 250 ° C. or exposure at about 0.2 to 10 J / cm 2 as necessary.
- a printed wiring board can be manufactured by etching or plating a substrate on which a resist pattern is formed by the above method. Etching or plating of the substrate is performed on the conductor layer of the substrate using the formed resist pattern as a mask.
- Etching solutions used for etching include cupric chloride solution, ferric chloride solution, alkaline etching solution, and hydrogen peroxide etching solution. It is preferable to use an iron solution.
- Plating methods for plating include copper plating such as copper sulfate plating and copper pyrophosphate plating, solder plating such as high-throw solder plating, watt bath (nickel sulfate-nickel chloride) plating, nickel plating such as nickel sulfamate, Examples thereof include gold plating such as hard gold plating and soft gold plating.
- the resist pattern can be peeled off with a stronger alkaline aqueous solution than the alkaline aqueous solution used for development, for example.
- a strong alkaline aqueous solution for example, a 1 to 10% by mass sodium hydroxide aqueous solution, a 1 to 10% by mass potassium hydroxide aqueous solution and the like are used. Among them, it is preferable to use a 1 to 10% by mass sodium hydroxide aqueous solution or a potassium hydroxide aqueous solution, and it is more preferable to use a 1 to 5% by mass sodium hydroxide aqueous solution or a potassium hydroxide aqueous solution.
- Examples of the resist pattern peeling method include an immersion method and a spray method, which may be used alone or in combination.
- the printed wiring board on which the resist pattern is formed may be a multilayer printed wiring board or may have a small diameter through hole.
- solution b was prepared by dissolving 1.2 g of azobisisobutyronitrile as a radical reaction initiator in 100 g of a mixed solution (mass ratio 3: 2) of 60 g of methyl cellosolve as an organic solvent and 40 g of toluene. .
- the solution a was dropped into the mixed solution in the flask over 4 hours, and then the solution in the flask was kept at 80 ° C. for 2 hours while stirring.
- the solution b was added dropwise to the solution in the flask over 10 minutes, and then the solution in the flask was kept at 80 ° C. for 3 hours while stirring.
- the solution in the flask was heated to 90 ° C. over 30 minutes, kept at 90 ° C. for 2 hours, and then cooled to obtain a binder polymer solution as the component (A).
- Acetone was added to this binder polymer solution to prepare a non-volatile component (solid content) of 50% by mass.
- the weight average molecular weight of the binder polymer was 80,000.
- the weight average molecular weight was measured by gel permeation chromatography (GPC) and derived by conversion using a standard polystyrene calibration curve.
- GPC gel permeation chromatography
- GPC condition pump Hitachi L-6000 type (manufactured by Hitachi, Ltd.) Column: 3 total below Gelpack GL-R420 Gelpack GL-R430 Gelpack GL-R440 (above, manufactured by Hitachi Chemical Co., Ltd., trade name) Eluent: Tetrahydrofuran Measurement temperature: 25 ° C Flow rate: 2.05 mL / min Detector: Hitachi L-3300 type RI (manufactured by Hitachi, Ltd.)
- Photosensitive element The solutions of the photosensitive resin compositions of Examples 1 to 10 and Comparative Examples 1 to 4 were each uniformly applied onto a polyethylene terephthalate film (trade name “G2-16” manufactured by Teijin Ltd.) having a thickness of 16 ⁇ m.
- a protective film (manufactured by Tamapoly Co., Ltd., trade name “NF-13”) was laminated on the photosensitive resin layer by roll pressurization to form a polyethylene terephthalate film (support film) and the film thereon.
- Photosensitive elements of Examples 1 to 10 and Comparative Examples 1 to 4 comprising each photosensitive resin layer and a protective film formed thereon were obtained.
- [Laminated substrate] A 1.6 mm thick copper clad laminate (made by Hitachi Chemical Co., Ltd., trade name “MCL-E-67”) made of glass epoxy material and copper foil (thickness 35 ⁇ m) formed on both sides thereof The copper surface was polished using a polishing machine (manufactured by Sankei Co., Ltd.) having a brush equivalent to # 600, washed with water, and then dried with an air flow.
- the copper clad laminate (hereinafter referred to as “substrate”) was heated to 80 ° C., and then the photosensitive elements of Examples 1 to 10 and Comparative Examples 1 to 4 were bonded to the copper surfaces on both sides of the substrate.
- Lamination is performed at a speed of 1.5 m / min so that the photosensitive resin layer of each photosensitive element adheres to each copper surface of the substrate while removing the protective film using a 110 ° C. heat roll. It was.
- the polyethylene terephthalate film was peeled off from the laminated substrate to expose the photosensitive resin layer.
- the exposed photosensitive resin layer was sprayed (development treatment) with a 1.0% by mass aqueous sodium carbonate solution at 30 ° C. for 50 seconds to remove unexposed portions.
- the cured film which consists of hardened
- the sensitivity (photosensitivity) of the photosensitive resin compositions and photosensitive elements of Examples 1 to 10 and Comparative Examples 1 to 4 was evaluated by measuring the number of steps of the step tablet of the obtained cured film. The higher the number of steps of the step tablet, the higher the sensitivity. The results are shown in Table 4.
- a wiring pattern having a line width / space width of 5/400 to 200/400 (unit: ⁇ m) is formed on the photosensitive resin layer of the laminated substrate by direct drawing using an exposure machine using the laser as a light source. Drawn. The exposure was performed with an energy amount such that the number of remaining step steps after development of the Hitachi 41-step tablet was 17.0. After the exposure, the same development processing as in the sensitivity evaluation was performed.
- the adhesion was evaluated based on the minimum value of the line width of the wiring pattern when the line part (exposed part) was formed without causing meandering or chipping. A smaller minimum value means better adhesion.
- Table 4 The results are shown in Table 4.
- a wiring pattern having a line width / space width of 400/5 to 400/200 (unit: ⁇ m) is formed on the photosensitive resin layer of the multilayer substrate by direct drawing using an exposure machine using the laser as a light source. Drawn. The exposure was performed with an energy amount such that the number of remaining step steps after development of the Hitachi 41-step tablet was 17.0. After the exposure, the same development processing as in the sensitivity evaluation was performed.
- test piece was allowed to stand at room temperature for a whole day and night, then immersed (dip) in a 3 mass% sodium hydroxide aqueous solution (stripping solution) at 50 ° C., and stirred with a stirrer.
- the peelability was evaluated by measuring the time from the start of stirring until the cured film was completely peeled and removed from the substrate (peeling time (seconds)). The shorter the peeling time, the better the peelability. The results are shown in Table 4.
- Lamination was performed so that the photosensitive resin layer of the photosensitive element was in close contact with the copper surface of the substrate for measuring the number of holes while removing the protective film.
- the hole tearing number measuring substrate is cooled, and when the temperature of the hole tearing number measuring substrate reaches 23 ° C., an exposure machine using the laser as a light source with respect to the polyethylene terephthalate film (supporting film) surface The exposure was performed with an energy amount such that the number of remaining step steps after development of the Hitachi 41-step tablet was 17.0 (direct drawing method).
- tent reliability %. The smaller this value, the higher the tent reliability. The results are shown in Table 4.
- the photosensitive resin compositions of Examples 1 to 10 are comparative examples that do not contain the compound (B-1 to B-3) represented by the general formula (I) as the component (B).
- the sensitivity and tent reliability were superior to those of the photosensitive resin compositions 1 to 4.
- the tent reliability was 12 to 23% in Comparative Examples 1 to 4, whereas the Examples 1 to 10 showed a remarkably low value of 2 to 6%, and the photosensitive resin composition of the present invention.
- the object was found to have very good tent reliability.
- Reference Example 2 Using the photosensitive resin composition of Comparative Example 1, except that the exposure condition was changed to the same exposure condition (mask exposure method) as in Reference Example 1, the same procedure as in Comparative Example 1 was followed. Resolution, peelability and tent reliability were evaluated. The results are shown in Table 5.
- Example 1 As shown in Table 5, in Reference Example 1 in which exposure was performed by the conventional mask exposure method using the photosensitive resin composition of Example 1, sufficient tent reliability was not obtained. On the other hand, as shown in Table 4, excellent tent reliability was obtained in Example 1 in which exposure was performed by a direct drawing method using a photosensitive resin composition having the same composition as a laser as a light source. .
- the photosensitive resin composition of Comparative Example which does not contain the compound represented by formula (I) as the component (B) has sufficient sensitivity and tent reliability when exposed by the conventional mask exposure method.
- the photosensitivity of the present invention containing the compound represented by the formula (I)
- the photosensitive resin composition does not have sufficient tent reliability when exposed by the conventional mask exposure method, but has sensitivity and tent reliability superior to those of the comparative example when exposed by the direct drawing method. Became clear.
- the photosensitive resin composition and photosensitive element of the present invention have excellent tent reliability when exposed by a direct drawing method, and enable high-definition resist pattern formation and production of printed wiring boards.
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Abstract
Description
本実施形態の感光性樹脂組成物は、(A)バインダーポリマー(以下、「(A)成分」ともいう。)、(B)光重合性化合物(以下、「(B)成分」ともいう。)及び(C)光重合開始剤(以下、「(C)成分」ともいう。)を含有する、直接描画法によるレジストパターンの形成に用いられる感光性樹脂組成物である。ここで、「直接描画法」とは、マスクフィルム等を用いずに、デジタルデータに基づき、感光性樹脂層にレーザー光線等の活性光線を画像状に照射することにより、所望のパターンを直接感光性樹脂層に描画する露光方法を意味する。
本実施形態の感光性樹脂組成物は、(B)成分である光重合性化合物として、下記一般式(I)で表される化合物を含む。これにより、本実施形態の感光性樹脂組成物は、直接描画法により露光した場合に、優れたテント信頼性を有するものとなる。ここで、「テント信頼性」とは、露光後、現像や水洗のスプレー圧によって破損しない性質(テンティング性)を意味し、テント信頼性の評価は、図2に示す穴破れ数測定用基板を用いて異形テント破れ率(%)を測定することにより行われる。
(B1)ビスフェノールA系ジ(メタ)アクリレート化合物
(B2)エチレン性不飽和結合を1つ有する化合物
(B3)多価アルコールにα,β-不飽和カルボン酸を反応させて得られる化合物
(B4)グリシジル基含有化合物にα、β-不飽和カルボン酸を反応させて得られる化合物
(B5)ウレタン結合を有する(メタ)アクリレート化合物等のウレタンモノマー
(A)成分であるバインダーポリマーとしては、アルカリ水溶液に可溶で皮膜形成可能なものであれば特に制限はなく、例えば、アクリル系樹脂、スチレン系樹脂、エポキシ系樹脂、アミド系樹脂、アミドエポキシ系樹脂、アルキド系樹脂、及びフェノール系樹脂が挙げられる。中でも、アルカリ現像性の見地からは、アクリル系樹脂が好ましい。これらは単独で、又は二種以上を組み合わせて用いることができる。
(C)成分である光重合開始剤は、下記一般式(III)で表される化合物及び/又は下記一般式(IV)で表される化合物を含むことが好ましい。
さらに、本実施形態の感光性樹脂組成物は、必要に応じて、マラカイトグリーン、ビクトリアピュアブルー、ブリリアントグリーン、メチルバイオレット等の染料;ロイコクリスタルバイオレット、ジフェニルアミン、ベンジルアミン、トリフェニルアミン、ジエチルアニリン、o-クロロアニリン、トリブロモメチルスルホン等の光発色剤;熱発色防止剤;p-トルエンスルホンアミド等の可塑剤;顔料;充填剤;消泡剤;難燃剤;密着性付与剤;レベリング剤;剥離促進剤;酸化防止剤;香料;イメージング剤;熱架橋剤などを(A)成分及び(B)成分の総量100重量部に対して各々0.01~20重量部程度含有することができる。これらは、単独で又は二種類以上を組み合わせて用いることができる。
本実施形態の感光性樹脂組成物を有機溶剤に溶解して、固形分30~60質量%程度の溶液(塗布液)として用いることができる。有機溶剤としては、メタノール、エタノール、アセトン、メチルエチルケトン、メチルセロソルブ、エチルセロソルブ、トルエン、N,N-ジメチルホルムアミド、プロピレングリコールモノメチルエーテル、又はこれらの混合溶剤が挙げられる。
図1に、本発明の感光性エレメントの一実施形態を示す。上記感光性樹脂組成物の溶液を、支持フィルム2上に塗布し、乾燥させることにより、支持フィルム2上に上記感光性樹脂組成物を用いて形成される感光性樹脂層3を形成することができる。次いで、感光性樹脂層3の支持フィルム2とは反対側の表面を保護フィルム4で被覆することにより、支持フィルム2と、該支持フィルム2上に積層された感光性樹脂層3と、該感光性樹脂層3上に積層された保護フィルム4とを備える、本実施形態の感光性エレメント1が得られる。保護フィルム4は必ずしも備えなくてもよい。
この厚みが1μm未満であると、支持フィルム2を剥離する際に支持フィルム2が破れやすくなる傾向があり、100μmを超えると解像度が十分に得られにくくなる傾向がある。
上記感光性樹脂組成物を用いて、レジストパターンを形成することができる。本実施形態に係るレジストパターンの形成方法は、(i)上記感光性樹脂組成物を用いて形成される感光性樹脂層を基板上に積層する積層工程と、(ii)上記感光性樹脂層に、直接描画法により活性光線を画像状に照射し、露光部を硬化させる露光工程と、(iii)感光性樹脂層の未露光部分を基板上から除去することにより、基板上に、感光性樹脂組成物の硬化物からなるレジストパターンを形成する現像工程と、を有する。
まず、感光性樹脂組成物を用いて形成される感光性樹脂層を基板上に積層する。基板としては、絶縁層と該絶縁層上に形成された導体層とを備えた基板(回路形成用基板)を用いることができる。
次に、直接描画法により露光を行う。すなわち、マスクフィルムを用いずに、デジタルデータに基づき、感光性樹脂層3にレーザー光線等の活性光線を画像状に照射することにより、所望のパターンを直接感光性樹脂層に描画する。この際、感光性樹脂層3上に存在する支持フィルム2が活性光線に対して透過性である場合には、支持フィルム2を通して活性光線を照射することができるが、支持フィルム2が遮光性である場合には、支持フィルム2を除去した後に感光性樹脂層に活性光線を照射する。
さらに、感光性樹脂層3の未露光部分を基板上から除去することにより、基板上に、感光性樹脂組成物の硬化物からなるレジストパターンを形成する。感光性樹脂層3上に支持フィルム2が存在している場合には、支持フィルム2を除去してから、未露光部分の除去(現像)を行う。現像方法には、ウェット現像とドライ現像とがあるが、ウェット現像が広く用いられている。
水系現像液のpHは、現像が十分に行われる範囲でできるだけ小さくすることが好ましく、pH8~12とすることが好ましく、pH9~10とすることがより好ましい。
上記方法によりレジストパターンが形成された基板をエッチング又はめっきすることにより、プリント配線板を製造することができる。基板のエッチング又はめっきは、形成されたレジストパターンをマスクとして、基板の導体層等に対して行われる。
(溶液aの調製)
表1に示す重合性単量体(共重合単量体、モノマー)からなる混合液に、ラジカル反応開始剤であるアゾビスイソブチロニトリル0.8gを溶解して、「溶液a」を調製した。
有機溶剤であるメチルセロソルブ60g及びトルエン40gの混合液(質量比3:2)100gに、ラジカル反応開始剤であるアゾビスイソブチロニトリル1.2gを溶解して、「溶液b」を調製した。
撹拌機、還流冷却器、温度計、滴下ロート及び窒素ガス導入管を備えたフラスコに、有機溶剤であるメチルセロソルブ240g及びトルエン160gの混合液(質量比3:2)400gを投入した。フラスコ内に窒素ガスを吹き込みながら、上記混合液を撹拌しつつ加熱して80℃まで昇温させた。
なお、重量平均分子量は、ゲルパーミエーションクロマトグラフィー法(GPC)によって測定し、標準ポリスチレンの検量線を用いて換算することにより導出した。GPCの条件は、以下に示すとおりである。
GPC条件
ポンプ :日立 L-6000型((株)日立製作所製)
カラム :以下の計3本
Gelpack GL-R420
Gelpack GL-R430
Gelpack GL-R440(以上、日立化成工業(株)製、商品名)
溶離液 :テトラヒドロフラン
測定温度:25℃
流量 :2.05mL/分
検出器 :日立 L-3300型RI((株)日立製作所製)
得られたバインダーポリマー((A)成分)の溶液に、表2に示す成分を同表に示す配合量(g)で配合し、得られた混合液に、表3に示す(B)成分及び(C)成分を同表に示す配合量(g)で配合することにより、実施例1~10及び比較例1~4の感光性樹脂組成物の溶液を調製した。なお、表2に示す(A)成分の配合量は、不揮発成分の質量(固形分量)である。
(光発色剤)
・BMPS(住友精化(株)製、商品名):トリブロモメチルフェニルスルホン
・LCV(山田化学(株)製、商品名):ロイコクリスタルバイオレット
(染料)
・MKG(大阪有機化学工業(株)製、商品名):マラカイトグリーン
(1)一般式(I)で表される化合物
・(B-1)
9G(新中村化学工業(株)製、商品名)
ポリエチレングリコール#400ジメタクリレート
一般式(I)中、R1及びR2がメチル基、n=9
・(B-2)
14G(新中村化学工業(株)製、商品名)
ポリエチレングリコール#600ジメタクリレート
一般式(I)中、R1及びR2はメチル基、n=14
・(B-3)
23G(新中村化学工業(株)製、商品名)
ポリエチレングリコール#1000ジメタクリレート
一般式(I)中、R1及びR2はメチル基、n=23
・(B-4)
FA-321M(日立化成工業(株)製、商品名)
2,2-ビス(4-(メタクリロキシペンタエトキシ)フェニル)プロパン
・(B-5)
FA-314A(日立化成工業(株)製、商品名)
ノニルフェノキシテトラエチレングリコールアクリレート(オキシエチレン基総数の平均値が4)
・(B-6)
FA-318A(日立化成工業(株)製、商品名)
ノニルフェノキシオクタエチレングリコールアクリレート(オキシエチレン基総数の平均値が8)
・(B-7)
FA-MECH(日立化成工業株式会社製、商品名)
γ-クロロ-β-ヒドロキシプロピル-β’-メタクリロイルオキシエチル-o-フタレート
・(B-8)
UA-13(新中村化学工業(株)製、商品名)
EO,PO変性ウレタンジメタクリレート
・(B-9)
UA-21(新中村化学工業(株)製、商品名)
トリス((メタ)アクリロキシテトラエチレングリコールイソシアネート)ヘキサメチレンイソシアヌレート
・(C-1)
N-1717((株)ADEKA製、商品名)
1,7-ビス(9-アクリジニル)ヘプタン
式(II)で表される化合物(R3が炭素原子数7のアルキレン基)
・(C-2)
9-PA(新日鐵化学(株)製、商品名):9-フェニルアクリジン
式(III)で表される化合物(R4がフェニル基)
・(C-3)
TR-PAD103(常州強力電子新材料有限公司製、商品名)
9-(3-メチルフェニル)アクリジン
式(III)で表される化合物(R4がm-メチルフェニル基)
・(C-4)
B-CIM(Hampford社製、商品名)
2,2’-ビス(2-クロロフェニル)-4,4’,5,5’-テトラフェニルビスイミダゾール
・(C-5)
9,10-ジブトキシアントラセン
実施例1~10及び比較例1~4の感光性樹脂組成物の溶液を、それぞれ厚さ16μmのポリエチレンテレフタレートフィルム(帝人(株)製、商品名「G2-16」)上に均一に塗布し、100℃の熱風対流式乾燥器で10分間乾燥して、乾燥後の膜厚が38μmである感光性樹脂層を形成した。この感光性樹脂層上に保護フィルム(タマポリ(株)製、商品名「NF-13」)をロール加圧にて積層することにより、ポリエチレンテレフタレートフィルム(支持フィルム)と、その上に形成された各感光性樹脂層と、その上に形成された保護フィルムとからなる、実施例1~10及び比較例1~4の感光性エレメントを得た。
ガラスエポキシ材と、その両面に形成された銅箔(厚さ35μm)とからなる1.6mm厚の銅張積層板(日立化成工業(株)製、商品名「MCL-E-67」)の銅表面を、#600相当のブラシを持つ研磨機(三啓(株)製)を用いて研磨し、水洗後、空気流で乾燥させた。この銅張積層板(以下、「基板」という。)を加熱して80℃に昇温させた後、実施例1~10及び比較例1~4の感光性エレメントを、基板の両側の銅表面にラミネート(積層)した。ラミネートは、110℃のヒートロールを用いて、保護フィルムを除去しながら、各感光性エレメントの感光性樹脂層が基板の各銅表面に密着するようにして、1.5m/分の速度で行った。
(感度)
得られた積層基板を放冷し、23℃になった時点で、積層基板の表面のポリエチレンテレフタレートフィルム(支持フィルム)に、ステップタブレットを有するフォトツールを密着させた。ステップタブレットとしては、濃度領域が0.00~2.00、濃度ステップが0.05、タブレットの大きさが20mm×187mm、各ステップの大きさが3mm×12mmである41段ステップタブレットを用いた。このようなステップタブレットを有するフォトツール及びポリエチレンテレフタレートフィルムを介して、感光性樹脂層に対して露光を行った。露光は、半導体励起固体レーザーを光源とする露光機(日本オルボテック(株)製、商品名「Paragon-9000m」)を用いて、20mJ/cm2の露光量で行った。
ライン幅/スペース幅が5/400~200/400(単位:μm)である配線パターンを、上記レーザーを光源とする露光機を用いて、直接描画法により、上記積層基板の感光性樹脂層に描画した。露光は、日立41段ステップタブレットの現像後の残存ステップ段数が17.0となるエネルギー量で行った。露光後、上記感度の評価と同様の現像処理を行った。
ライン幅/スペース幅が400/5~400/200(単位:μm)である配線パターンを、上記レーザーを光源とする露光機を用いて、直接描画法により、上記積層基板の感光性樹脂層に描画した。露光は、日立41段ステップタブレットの現像後の残存ステップ段数が17.0となるエネルギー量で行った。露光後、上記感度の評価と同様の現像処理を行った。
60mm×45mmのパターンを、上記レーザーを光源とする露光機を用いて、直接描画法により、上記積層基板の感光性樹脂層に描画した。露光は、日立41段ステップタブレットの現像後の残存ステップ段数が17.0となるエネルギー量で行った。露光後、上記感度の評価と同様の現像処理を行い、基板上に60mm×45mmの硬化膜が形成された試験片を得た。
上記銅張積層板(日立化成工業(株)製商品名MCL-E-67)に、直径4~6mmの穴径で丸穴及び3連穴を型抜き機を用いて作成し、生じたバリを#600相当のブラシをもつ研磨機(三啓(株)製)を使用して取り除き、図2に示す穴破れ数測定用基板を得た。得られた穴破れ数測定用基板を80℃に加温し、その銅表面上に、実施例1~10及び比較例1~4の感光性エレメントを120℃、0.4MPaの条件でラミネートした。ラミネートは、保護フィルムを除去しながら、感光性エレメントの感光性樹脂層が穴破れ数測定用基板の銅表面に密着するようにして行った。ラミネート後、穴破れ数測定用基板を冷却し、穴破れ数測定用基板の温度が23℃になった時点で、ポリエチレンテレフタレートフィルム(支持フィルム)面に対して、上記レーザーを光源とする露光機を用いて、日立41段ステップタブレットの現像後の残存ステップ段数が17.0となるエネルギー量で露光を行った(直接描画法)。露光後、室温で15分間放置し、続いて穴破れ数測定用基板からポリエチレンテレフタレートフィルムをはがし、現像処理50秒後、3連穴の穴破れ数を測定し、異形テント破れ率として評価し、これをテント信頼性(%)とした。この数値が小さいほど、テント信頼性が高いことを意味する。結果を表4に示す。
(参考例1)
実施例1の感光性樹脂組成物を用いて、露光条件を以下のように変えたこと以外は、実施例1と同様の手順で、感度、密着性、解像度、剥離性及びテント信頼性を評価した。結果を表5に示す。
露光条件
露光機:HMW-201GX(オーク(株)製、商品名)
光源:高圧水銀ランプ
感度評価における露光量:40mJ/cm2
感度以外の評価における露光量:日立41段ステップタブレットの現像後の残存ステップ段数が23.0となるエネルギー量
露光法法:マスク露光法
比較例1の感光性樹脂組成物を用いて、露光条件を参考例1と同様の露光条件(マスク露光法)に変えたこと以外は、比較例1と同様の手順で、感度、密着性、解像度、剥離性及びテント信頼性を評価した。結果を表5に示す。
Claims (8)
- 前記一般式(I)で表される化合物におけるnが4~25の整数である、請求項1又は請求項2記載の感光性樹脂組成物。
- 前記一般式(II)で表される化合物におけるmが4~8の整数である、請求項2記載の感光性樹脂組成物。
- 支持フィルムと、該支持フィルム上に形成された請求項1~5のいずれか一項に記載の感光性樹脂組成物を用いて形成される感光性樹脂層と、を備える、感光性エレメント。
- 請求項1~5のいずれか一項に記載の感光性樹脂組成物を用いて形成される感光性樹脂層を基板上に積層する積層工程と、
前記感光性樹脂層に、直接描画法により活性光線を画像状に照射し、露光部を硬化させる露光工程と、
前記感光性樹脂層の未露光部分を前記基板上から除去することにより、前記基板上に、前記感光性樹脂組成物の硬化物からなるレジストパターンを形成する現像工程と、を有するレジストパターンの形成方法。 - 請求項7記載の方法によりレジストパターンが形成された基板をエッチング又はめっきすることを含む、プリント配線板の製造方法。
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WO2003077035A1 (fr) * | 2002-03-12 | 2003-09-18 | Asahi Kasei Kabushiki Kaisha | Composition de resine photosensible et utilisation de celle-ci |
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JP2015135482A (ja) * | 2013-12-20 | 2015-07-27 | 旭化成イーマテリアルズ株式会社 | 感光性エレメント、及びその製造方法 |
WO2015174468A1 (ja) * | 2014-05-13 | 2015-11-19 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法 |
WO2016117509A1 (ja) * | 2015-01-20 | 2016-07-28 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法、及び、構造体の製造方法 |
JPWO2016117509A1 (ja) * | 2015-01-20 | 2017-11-09 | 日立化成株式会社 | 感光性樹脂組成物、感光性エレメント、レジストパターンの形成方法、及び、構造体の製造方法 |
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KR20120139790A (ko) | 2012-12-27 |
JP5376043B2 (ja) | 2013-12-25 |
KR20140009600A (ko) | 2014-01-22 |
KR101409030B1 (ko) | 2014-06-18 |
KR101775206B1 (ko) | 2017-09-05 |
CN102754032A (zh) | 2012-10-24 |
CN102754032B (zh) | 2015-07-15 |
TWI625594B (zh) | 2018-06-01 |
TW201207554A (en) | 2012-02-16 |
JPWO2011114593A1 (ja) | 2013-06-27 |
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