JPH029337B2 - - Google Patents

Info

Publication number
JPH029337B2
JPH029337B2 JP56062341A JP6234181A JPH029337B2 JP H029337 B2 JPH029337 B2 JP H029337B2 JP 56062341 A JP56062341 A JP 56062341A JP 6234181 A JP6234181 A JP 6234181A JP H029337 B2 JPH029337 B2 JP H029337B2
Authority
JP
Japan
Prior art keywords
group
weight
coating
photosensitive
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56062341A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57178242A (en
Inventor
Takeshi Yamamoto
Sei Goto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP56062341A priority Critical patent/JPS57178242A/ja
Priority to DE19823215112 priority patent/DE3215112A1/de
Publication of JPS57178242A publication Critical patent/JPS57178242A/ja
Priority to US06/639,539 priority patent/US4504567A/en
Publication of JPH029337B2 publication Critical patent/JPH029337B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0166—Diazonium salts or compounds characterised by the non-macromolecular additives
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/109—Polyester

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP56062341A 1981-04-27 1981-04-27 Photosensitive lithographic plate Granted JPS57178242A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP56062341A JPS57178242A (en) 1981-04-27 1981-04-27 Photosensitive lithographic plate
DE19823215112 DE3215112A1 (de) 1981-04-27 1982-04-23 Lichtempfindliche lithographische druckplatte
US06/639,539 US4504567A (en) 1981-04-27 1984-08-09 Light-sensitive lithographic printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56062341A JPS57178242A (en) 1981-04-27 1981-04-27 Photosensitive lithographic plate

Publications (2)

Publication Number Publication Date
JPS57178242A JPS57178242A (en) 1982-11-02
JPH029337B2 true JPH029337B2 (en, 2012) 1990-03-01

Family

ID=13197316

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56062341A Granted JPS57178242A (en) 1981-04-27 1981-04-27 Photosensitive lithographic plate

Country Status (3)

Country Link
US (1) US4504567A (en, 2012)
JP (1) JPS57178242A (en, 2012)
DE (1) DE3215112A1 (en, 2012)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1169682B (it) * 1983-11-08 1987-06-03 I M G Ind Materiali Grafici Sp Composizione per fotoriproduzioni
DE3421448A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende polymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck
DE3421471A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende 1,2-naphthochinondiazidverbindungen und reproduktionsmaterialien, die diese verbindungen enthalten
US4876322A (en) * 1984-08-10 1989-10-24 Siemens Aktiengesselschaft Irradiation cross-linkable thermostable polymer system, for microelectronic applications
DE3570931D1 (en) * 1984-08-10 1989-07-13 Siemens Ag Thermostable polymer system, cross-linkable by irradiation, for microelectronic use
US5215857A (en) * 1985-08-07 1993-06-01 Japan Synthetic Rubber Co., Ltd. 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent
JPS62123444A (ja) 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
US5238774A (en) * 1985-08-07 1993-08-24 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
JPH0721626B2 (ja) * 1985-08-10 1995-03-08 日本合成ゴム株式会社 半導体微細加工用レジスト組成物
JPH083630B2 (ja) * 1986-01-23 1996-01-17 富士写真フイルム株式会社 感光性組成物
JPH06105351B2 (ja) * 1986-03-27 1994-12-21 富士写真フイルム株式会社 感光性組成物
JPH0762761B2 (ja) * 1986-03-28 1995-07-05 富士写真フイルム株式会社 画像形成材料
US5128230A (en) * 1986-12-23 1992-07-07 Shipley Company Inc. Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate
JPS63218957A (ja) * 1987-03-09 1988-09-12 Nippon Kayaku Co Ltd 可染性樹脂膜のパタ−ン形成法
JPH06105350B2 (ja) * 1987-07-13 1994-12-21 富士写真フイルム株式会社 平版印刷版用感光性組成物
US5279922A (en) * 1989-08-07 1994-01-18 Konica Corporation Light-sensitive coating liquid
JPH03170931A (ja) * 1989-08-07 1991-07-24 Konica Corp 感光性塗布液
DE4013575C2 (de) * 1990-04-27 1994-08-11 Basf Ag Verfahren zur Herstellung negativer Reliefkopien
JP2677460B2 (ja) * 1991-02-14 1997-11-17 日本ペイント株式会社 アルカリ現像性感光性樹脂組成物
GB9225724D0 (en) 1992-12-09 1993-02-03 Minnesota Mining & Mfg Transfer imaging elements
EP0631189B1 (en) * 1993-06-24 1999-02-17 Agfa-Gevaert N.V. Improvement of the storage stability of a diazo-based imaging element for making a printing plate
EP0632328B1 (en) * 1993-07-02 1997-10-29 Agfa-Gevaert N.V. Improvement of the storage stability of a diazo-based imaging element for making a printing plate
US6461787B2 (en) 1993-12-02 2002-10-08 Minnesota Mining And Manufacturing Company Transfer imaging elements
AU660882B1 (en) * 1994-01-25 1995-07-06 Morton International, Inc. Waterborne photoresists having non-ionic fluorocarbon surfactants
US6165676A (en) * 1997-04-22 2000-12-26 Konica Corporation Light sensitive composition, image forming material and image forming material manufacturing method
US6296982B1 (en) * 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles
KR100390871B1 (ko) * 2000-02-22 2003-07-10 (주)디엔엘 Ｐｓ 판용 아크릴레이트계 감광성 수지 조성물
JP4553140B2 (ja) 2005-12-13 2010-09-29 信越化学工業株式会社 ポジ型フォトレジスト組成物
US7803881B2 (en) * 2005-12-16 2010-09-28 E.I. Du Pont De Nemours And Company Process for amination of acrylic macromonomers and products therefrom
JP5526534B2 (ja) * 2008-12-05 2014-06-18 日本電気株式会社 カーボンナノチューブインク組成物及びカーボンナノチューブインク組成物の噴霧方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE739245C (de) * 1938-12-14 1943-09-16 Aeg Schlagwettersicheres, in seinem Inneren einen oder mehrere Leistungsschalter enthaltendes Kapselgehaeuse fuer elektrische Einrichtungen
US3589906A (en) * 1968-10-16 1971-06-29 Du Pont Photographic layers containing perfluoro compounds and coating thereof
US3620743A (en) * 1969-12-15 1971-11-16 Norman T Notley Vehicles for vesicular photographic materials
GB1293189A (en) * 1970-06-04 1972-10-18 Agfa Gevaert Photographic silver halide element
US3779768A (en) * 1971-08-26 1973-12-18 Xidex Corp Fluorocarbon surfactants for vesicular films
JPS5729691B2 (en, 2012) * 1975-03-15 1982-06-24
JPS52144970A (en) * 1976-05-28 1977-12-02 Hitachi Ltd Photo resist composition
JPS54135004A (en) * 1978-04-10 1979-10-19 Fuji Photo Film Co Ltd Photosensitive flat printing plate
DE3022362A1 (de) * 1980-06-14 1981-12-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung

Also Published As

Publication number Publication date
US4504567A (en) 1985-03-12
DE3215112A1 (de) 1982-11-11
JPS57178242A (en) 1982-11-02

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