JPS52144970A - Photo resist composition - Google Patents
Photo resist compositionInfo
- Publication number
- JPS52144970A JPS52144970A JP6111376A JP6111376A JPS52144970A JP S52144970 A JPS52144970 A JP S52144970A JP 6111376 A JP6111376 A JP 6111376A JP 6111376 A JP6111376 A JP 6111376A JP S52144970 A JPS52144970 A JP S52144970A
- Authority
- JP
- Japan
- Prior art keywords
- resist composition
- photo resist
- composition
- hlb
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
PURPOSE: A photo resist composition of good application characteristics is obtained by adding 0.005 to 0.2% by weight of a nonionic surface active agent of more than 11 in HLB to a photoresist composition.
COPYRIGHT: (C)1977,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6111376A JPS52144970A (en) | 1976-05-28 | 1976-05-28 | Photo resist composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6111376A JPS52144970A (en) | 1976-05-28 | 1976-05-28 | Photo resist composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS52144970A true JPS52144970A (en) | 1977-12-02 |
Family
ID=13161689
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6111376A Pending JPS52144970A (en) | 1976-05-28 | 1976-05-28 | Photo resist composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS52144970A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5660441A (en) * | 1979-10-22 | 1981-05-25 | Asahi Chem Ind Co Ltd | Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition |
JPS57178242A (en) * | 1981-04-27 | 1982-11-02 | Konishiroku Photo Ind Co Ltd | Photosensitive lithographic plate |
JPS6079349A (en) * | 1983-10-06 | 1985-05-07 | Mitsubishi Chem Ind Ltd | Water-soluble photosensitive composition and organic color filter |
-
1976
- 1976-05-28 JP JP6111376A patent/JPS52144970A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5660441A (en) * | 1979-10-22 | 1981-05-25 | Asahi Chem Ind Co Ltd | Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition |
JPH0128365B2 (en) * | 1979-10-22 | 1989-06-02 | Asahi Chemical Ind | |
JPS57178242A (en) * | 1981-04-27 | 1982-11-02 | Konishiroku Photo Ind Co Ltd | Photosensitive lithographic plate |
JPH029337B2 (en) * | 1981-04-27 | 1990-03-01 | Konishiroku Photo Ind | |
JPS6079349A (en) * | 1983-10-06 | 1985-05-07 | Mitsubishi Chem Ind Ltd | Water-soluble photosensitive composition and organic color filter |
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