JPS52144970A - Photo resist composition - Google Patents

Photo resist composition

Info

Publication number
JPS52144970A
JPS52144970A JP6111376A JP6111376A JPS52144970A JP S52144970 A JPS52144970 A JP S52144970A JP 6111376 A JP6111376 A JP 6111376A JP 6111376 A JP6111376 A JP 6111376A JP S52144970 A JPS52144970 A JP S52144970A
Authority
JP
Japan
Prior art keywords
resist composition
photo resist
composition
hlb
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6111376A
Other languages
Japanese (ja)
Inventor
Seiji Miura
Hajime Morishita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6111376A priority Critical patent/JPS52144970A/en
Publication of JPS52144970A publication Critical patent/JPS52144970A/en
Pending legal-status Critical Current

Links

Landscapes

  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE: A photo resist composition of good application characteristics is obtained by adding 0.005 to 0.2% by weight of a nonionic surface active agent of more than 11 in HLB to a photoresist composition.
COPYRIGHT: (C)1977,JPO&Japio
JP6111376A 1976-05-28 1976-05-28 Photo resist composition Pending JPS52144970A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6111376A JPS52144970A (en) 1976-05-28 1976-05-28 Photo resist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6111376A JPS52144970A (en) 1976-05-28 1976-05-28 Photo resist composition

Publications (1)

Publication Number Publication Date
JPS52144970A true JPS52144970A (en) 1977-12-02

Family

ID=13161689

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6111376A Pending JPS52144970A (en) 1976-05-28 1976-05-28 Photo resist composition

Country Status (1)

Country Link
JP (1) JPS52144970A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5660441A (en) * 1979-10-22 1981-05-25 Asahi Chem Ind Co Ltd Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition
JPS57178242A (en) * 1981-04-27 1982-11-02 Konishiroku Photo Ind Co Ltd Photosensitive lithographic plate
JPS6079349A (en) * 1983-10-06 1985-05-07 Mitsubishi Chem Ind Ltd Water-soluble photosensitive composition and organic color filter

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5660441A (en) * 1979-10-22 1981-05-25 Asahi Chem Ind Co Ltd Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition
JPH0128365B2 (en) * 1979-10-22 1989-06-02 Asahi Chemical Ind
JPS57178242A (en) * 1981-04-27 1982-11-02 Konishiroku Photo Ind Co Ltd Photosensitive lithographic plate
JPH029337B2 (en) * 1981-04-27 1990-03-01 Konishiroku Photo Ind
JPS6079349A (en) * 1983-10-06 1985-05-07 Mitsubishi Chem Ind Ltd Water-soluble photosensitive composition and organic color filter

Similar Documents

Publication Publication Date Title
JPS52144970A (en) Photo resist composition
JPS5358506A (en) Detergent composition
JPS5394770A (en) Photo mask
JPS534007A (en) Fuel composition
JPS5436342A (en) Releasing agent composition
JPS5389673A (en) Fine pattern forming method of semiconductor device
JPS5219516A (en) Photosensitive composition
JPS551110A (en) Exposure to electron beam
JPS5341428A (en) Miticidal composition
JPS5497373A (en) Removal method of resist
JPS51119752A (en) Silicon emulsion compositions
JPS52144972A (en) Formation method of photo resist film
JPS52102366A (en) Thickening compositions
JPS5259606A (en) Liquid detergent composition
JPS5269880A (en) Producing emulsified liquid of hindered esters
JPS52103405A (en) Detergent compositions for use in drainage pipes
JPS52113164A (en) Removal of organic agent
JPS52137535A (en) Carburetor
JPS5397775A (en) Etching method
JPS5314570A (en) Production of photo mask
JPS5365310A (en) Detergent for removing radioactivity
JPS568463A (en) Anti-fogging coating composition
JPS52147961A (en) Solid state relay
JPS534008A (en) Fuel composition
JPS52125133A (en) Preparation of alkylhydroquinone