JPH02660B2 - - Google Patents

Info

Publication number
JPH02660B2
JPH02660B2 JP54171019A JP17101979A JPH02660B2 JP H02660 B2 JPH02660 B2 JP H02660B2 JP 54171019 A JP54171019 A JP 54171019A JP 17101979 A JP17101979 A JP 17101979A JP H02660 B2 JPH02660 B2 JP H02660B2
Authority
JP
Japan
Prior art keywords
signal
threshold value
width
comparator
outputted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP54171019A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5694248A (en
Inventor
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17101979A priority Critical patent/JPS5694248A/ja
Publication of JPS5694248A publication Critical patent/JPS5694248A/ja
Publication of JPH02660B2 publication Critical patent/JPH02660B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust
JP17101979A 1979-12-28 1979-12-28 Detector for foreign matter on surface Granted JPS5694248A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17101979A JPS5694248A (en) 1979-12-28 1979-12-28 Detector for foreign matter on surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17101979A JPS5694248A (en) 1979-12-28 1979-12-28 Detector for foreign matter on surface

Publications (2)

Publication Number Publication Date
JPS5694248A JPS5694248A (en) 1981-07-30
JPH02660B2 true JPH02660B2 (zh) 1990-01-09

Family

ID=15915575

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17101979A Granted JPS5694248A (en) 1979-12-28 1979-12-28 Detector for foreign matter on surface

Country Status (1)

Country Link
JP (1) JPS5694248A (zh)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58151544A (ja) * 1982-03-05 1983-09-08 Nippon Jido Seigyo Kk 暗視野像による欠陥検査装置
JPS58223328A (ja) * 1982-06-22 1983-12-24 Toshiba Corp マスク欠陥検査装置
JPS60209187A (ja) * 1984-07-17 1985-10-21 Matsushita Graphic Commun Syst Inc 固体撮像素子の検査装置
DE3929549C1 (en) * 1989-09-06 1991-02-14 Fa. Carl Zeiss, 7920 Heidenheim, De Sensitive measurer for light dispersed on optical component - has time-window discriminator blocking detector

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4957887A (zh) * 1972-09-30 1974-06-05
JPS50143590A (zh) * 1974-05-08 1975-11-19

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4957887A (zh) * 1972-09-30 1974-06-05
JPS50143590A (zh) * 1974-05-08 1975-11-19

Also Published As

Publication number Publication date
JPS5694248A (en) 1981-07-30

Similar Documents

Publication Publication Date Title
US20110101226A1 (en) Method and apparatus for duv transmission mapping
CN109975319B (zh) 一种平面光学元件表面质量快速检测装置及其方法
JP3712481B2 (ja) 半導体装置の製造方法
JPH02660B2 (zh)
JPH0682727B2 (ja) 検査用基板とその製造方法
JPS6038827A (ja) 自動異物検査装置の感度校正方法
JP2002340811A (ja) 表面評価装置
JPH06118009A (ja) 異物検査装置および異物検査方法
JPH03203343A (ja) 検査方法
JPH0755702A (ja) 結晶欠陥計測装置及びそれを用いた半導体製造装置
JPH0291504A (ja) 微細パターンの断面プロファイルの検査方法
JPH07167793A (ja) 位相差半導体検査装置および半導体装置の製造方法
JPH05215696A (ja) 欠陥検査方法および装置
JPH0743323B2 (ja) 表面異物検査装置
US7573568B2 (en) Method and apparatus for detecting a photolithography processing error, and method and apparatus for monitoring a photolithography process
JPH04344447A (ja) 透明ガラス基板の欠陥検出装置
JPH08264605A (ja) 積層基板の検査方法、およびこれを用いたsoiウェハ、このsoiウェハを用いた半導体集積回路装置、ならびに積層基板の検査装置
JPH07142363A (ja) 半導体集積回路装置の製造方法および製造装置
JPS63103951A (ja) ゴミ検査装置
JPH09218162A (ja) 表面欠陥検査装置
JPH1020472A (ja) 位相シフトマスクの製造方法および製造装置
JPH0915134A (ja) パーティクルの検査方法および検査装置
JPH05234870A (ja) 薬液塗布方法及び装置
JPH04103144A (ja) 異物検査方法
JPH10227617A (ja) 微小線幅測定方法及び微小線幅測定装置