JPH02660B2 - - Google Patents
Info
- Publication number
- JPH02660B2 JPH02660B2 JP54171019A JP17101979A JPH02660B2 JP H02660 B2 JPH02660 B2 JP H02660B2 JP 54171019 A JP54171019 A JP 54171019A JP 17101979 A JP17101979 A JP 17101979A JP H02660 B2 JPH02660 B2 JP H02660B2
- Authority
- JP
- Japan
- Prior art keywords
- signal
- threshold value
- width
- comparator
- outputted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 claims description 3
- 238000001514 detection method Methods 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 11
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- 239000011651 chromium Substances 0.000 description 6
- 229910052804 chromium Inorganic materials 0.000 description 5
- 230000007547 defect Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000007689 inspection Methods 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17101979A JPS5694248A (en) | 1979-12-28 | 1979-12-28 | Detector for foreign matter on surface |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17101979A JPS5694248A (en) | 1979-12-28 | 1979-12-28 | Detector for foreign matter on surface |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5694248A JPS5694248A (en) | 1981-07-30 |
JPH02660B2 true JPH02660B2 (zh) | 1990-01-09 |
Family
ID=15915575
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17101979A Granted JPS5694248A (en) | 1979-12-28 | 1979-12-28 | Detector for foreign matter on surface |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5694248A (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58151544A (ja) * | 1982-03-05 | 1983-09-08 | Nippon Jido Seigyo Kk | 暗視野像による欠陥検査装置 |
JPS58223328A (ja) * | 1982-06-22 | 1983-12-24 | Toshiba Corp | マスク欠陥検査装置 |
JPS60209187A (ja) * | 1984-07-17 | 1985-10-21 | Matsushita Graphic Commun Syst Inc | 固体撮像素子の検査装置 |
DE3929549C1 (en) * | 1989-09-06 | 1991-02-14 | Fa. Carl Zeiss, 7920 Heidenheim, De | Sensitive measurer for light dispersed on optical component - has time-window discriminator blocking detector |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4957887A (zh) * | 1972-09-30 | 1974-06-05 | ||
JPS50143590A (zh) * | 1974-05-08 | 1975-11-19 |
-
1979
- 1979-12-28 JP JP17101979A patent/JPS5694248A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4957887A (zh) * | 1972-09-30 | 1974-06-05 | ||
JPS50143590A (zh) * | 1974-05-08 | 1975-11-19 |
Also Published As
Publication number | Publication date |
---|---|
JPS5694248A (en) | 1981-07-30 |
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