JPH0261973B2 - - Google Patents

Info

Publication number
JPH0261973B2
JPH0261973B2 JP8601083A JP8601083A JPH0261973B2 JP H0261973 B2 JPH0261973 B2 JP H0261973B2 JP 8601083 A JP8601083 A JP 8601083A JP 8601083 A JP8601083 A JP 8601083A JP H0261973 B2 JPH0261973 B2 JP H0261973B2
Authority
JP
Japan
Prior art keywords
group
formula
composition according
carbon atoms
hexafluorophosphate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8601083A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58213019A (ja
Inventor
Aauingu Edowaado
Furederitsuku Girubaato Jonson Buraian
Maiaa Kuruto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novartis AG
Original Assignee
Ciba Geigy AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Geigy AG filed Critical Ciba Geigy AG
Publication of JPS58213019A publication Critical patent/JPS58213019A/ja
Publication of JPH0261973B2 publication Critical patent/JPH0261973B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
JP8601083A 1982-05-19 1983-05-18 有機金属塩を含有する光重合性組成物 Granted JPS58213019A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB8214609 1982-05-19
GB8214609 1982-05-19

Publications (2)

Publication Number Publication Date
JPS58213019A JPS58213019A (ja) 1983-12-10
JPH0261973B2 true JPH0261973B2 (enExample) 1990-12-21

Family

ID=10530464

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8601083A Granted JPS58213019A (ja) 1982-05-19 1983-05-18 有機金属塩を含有する光重合性組成物

Country Status (6)

Country Link
EP (1) EP0094914B1 (enExample)
JP (1) JPS58213019A (enExample)
CA (1) CA1300307C (enExample)
DE (1) DE3366408D1 (enExample)
HK (1) HK58689A (enExample)
SG (1) SG20789G (enExample)

Families Citing this family (63)

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US5191101A (en) * 1982-11-22 1993-03-02 Minnesota Mining And Manufacturing Company Energy polymerizable compositions containing organometallic initiators
US5089536A (en) * 1982-11-22 1992-02-18 Minnesota Mining And Manufacturing Company Energy polmerizable compositions containing organometallic initiators
EP0152377B1 (de) * 1984-02-10 1987-12-09 Ciba-Geigy Ag Härtbare Zusammensetzung und deren Verwendung
DE3565013D1 (en) * 1984-02-10 1988-10-20 Ciba Geigy Ag Process for the preparation of a protection layer or a relief pattern
US4677137A (en) * 1985-05-31 1987-06-30 Minnesota Mining And Manufacturing Company Supported photoinitiator
US4707432A (en) * 1985-09-23 1987-11-17 Ciba-Geigy Corporation Ferrocenium/alpha-cleavage photoinitiator systems for free radical polymerizable compositions
JPH0675194B2 (ja) * 1986-03-31 1994-09-21 キヤノン株式会社 重合性薄膜
US4740577A (en) * 1987-08-28 1988-04-26 Minnesota Mining And Manufacturing Company Energy polymerizable polyurethane precursors
US4950696A (en) * 1987-08-28 1990-08-21 Minnesota Mining And Manufacturing Company Energy-induced dual curable compositions
US4952612A (en) * 1987-08-28 1990-08-28 Minnesota Mining And Manufacturing Company Energy-induced curable compositions
US5086086A (en) * 1987-08-28 1992-02-04 Minnesota Mining And Manufacturing Company Energy-induced curable compositions
JPH01118564A (ja) * 1987-10-30 1989-05-11 Toshiba Chem Corp 一液性エポキシ樹脂組成物
US4985340A (en) * 1988-06-01 1991-01-15 Minnesota Mining And Manufacturing Company Energy curable compositions: two component curing agents
US5215860A (en) * 1988-08-19 1993-06-01 Minnesota Mining And Manufacturing Company Energy-curable cyanate compositions
US5667934A (en) * 1990-10-09 1997-09-16 International Business Machines Corporation Thermally stable photoimaging composition
JP3268532B2 (ja) * 1992-01-22 2002-03-25 ミネソタ マイニング アンド マニファクチャリング カンパニー 光活性化可能な熱硬化性エポキシ組成物
US5212210A (en) * 1992-03-18 1993-05-18 Minnesota Mining And Manufacturing Company Energy curable compositions having improved cure speeds
US5667893A (en) * 1992-10-09 1997-09-16 Minnesota Mining And Manufacturing Company Substrate coated or impregnated with flexible epoxy composition
US5514728A (en) * 1993-07-23 1996-05-07 Minnesota Mining And Manufacturing Company Catalysts and initiators for polymerization
ES2147777T3 (es) 1993-09-16 2000-10-01 Ciba Sc Holding Ag Compuestos vinileter con grupos funcionales adicionales, distintos de vinileter, y su utilizacion en la formulacion de compuestos reticulables.
DE4340949A1 (de) * 1993-12-01 1995-06-08 Thera Ges Fuer Patente Lichtinitiiert kationisch härtende Epoxidmasse und ihre Verwendung
US5670590A (en) * 1994-05-06 1997-09-23 Minnesota Mining And Manufacturing Company Energy polymerizable compositions, homopolymers and copolymers of oxazolines
TW418215B (en) 1995-03-13 2001-01-11 Ciba Sc Holding Ag A process for the production of three-dimensional articles in a stereolithography bath comprising the step of sequentially irradiating a plurality of layers of a liquid radiation-curable composition
ATE191090T1 (de) * 1996-07-29 2000-04-15 Ciba Sc Holding Ag Flüssige, strahlungshärtbare zusammensetzung, insbesondere für die stereolithographie
US5789333A (en) * 1997-03-05 1998-08-04 Iowa State University Research Foundation, Inc. Catalyst system comprising a first catalyst system tethered to a supported catalyst
US6133335A (en) 1998-12-31 2000-10-17 3M Innovative Properties Company Photo-polymerizable compositions and articles made therefrom
US6265459B1 (en) 1998-12-31 2001-07-24 3M Innovative Properties Company Accelerators useful for energy polymerizable compositions
US6387981B1 (en) 1999-10-28 2002-05-14 3M Innovative Properties Company Radiopaque dental materials with nano-sized particles
US6572693B1 (en) 1999-10-28 2003-06-03 3M Innovative Properties Company Aesthetic dental materials
JP4800535B2 (ja) 1999-10-28 2011-10-26 スリーエム イノベイティブ プロパティズ カンパニー ナノサイズシリカ粒子を含有する歯科材料
US6730156B1 (en) 1999-10-28 2004-05-04 3M Innovative Properties Company Clustered particle dental fillers
US6635689B1 (en) 2000-06-26 2003-10-21 3M Innovative Properties Company Accelerators for cationic polymerization catalyzed by iron-based catalysts
WO2003063804A1 (en) 2002-01-31 2003-08-07 3M Innovative Properties Company Dental pastes, dental articles, and methods
JP2005529200A (ja) 2002-05-03 2005-09-29 ディーエスエム アイピー アセッツ ビー．ブイ． 照射硬化可能な樹脂組成物及びそれを用いるラピッドプロトタイピング法
US6989225B2 (en) 2002-07-18 2006-01-24 3D Systems, Inc. Stereolithographic resins with high temperature and high impact resistance
US7449146B2 (en) 2002-09-30 2008-11-11 3M Innovative Properties Company Colorimetric sensor
US20040062682A1 (en) 2002-09-30 2004-04-01 Rakow Neal Anthony Colorimetric sensor
US6841333B2 (en) 2002-11-01 2005-01-11 3M Innovative Properties Company Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions
CN101775197B (zh) 2003-07-23 2012-09-26 帝斯曼知识产权资产管理有限公司 可降低粘度的辐射固化树脂组合物
US7553670B2 (en) 2004-04-28 2009-06-30 3M Innovative Properties Company Method for monitoring a polymerization in a three-dimensional sample
US8287611B2 (en) 2005-01-28 2012-10-16 Saint-Gobain Abrasives, Inc. Abrasive articles and methods for making same
US7591865B2 (en) 2005-01-28 2009-09-22 Saint-Gobain Abrasives, Inc. Method of forming structured abrasive article
SE529306C2 (sv) 2005-03-18 2007-06-26 Perstorp Specialty Chem Ab Ultravioletthärdande hartskomposition
US8871335B2 (en) 2005-08-31 2014-10-28 Kuraray America Inc. Solar control laminate
US8435098B2 (en) 2006-01-27 2013-05-07 Saint-Gobain Abrasives, Inc. Abrasive article with cured backsize layer
US7767143B2 (en) 2006-06-27 2010-08-03 3M Innovative Properties Company Colorimetric sensors
US20080103226A1 (en) 2006-10-31 2008-05-01 Dsm Ip Assets B.V. Photo-curable resin composition
GB0623936D0 (en) * 2006-11-29 2007-01-10 Univ Strathclyde Polymers with transmission into the ultraviolet
CA2672243C (en) 2006-12-21 2012-04-03 Saint-Gobain Abrasives, Inc. Low corrosion abrasive articles and methods for forming same
US20100190881A1 (en) 2009-01-28 2010-07-29 3D Systems, Incorporated Radiation Curable Compositions Useful in Solid Freeform Fabrication Systems
EP2406318B1 (en) 2009-03-13 2021-04-21 DSM IP Assets B.V. Radiation curable resin composition and rapid three-dimensional imaging process using the same
CN102858738B (zh) 2009-12-17 2015-07-22 帝斯曼知识产权资产管理有限公司 用于加成法制造的包含三芳基锍硼酸盐阳离子光引发剂的液体可辐射固化树脂
AU2011207304B2 (en) 2010-01-22 2014-07-17 Stratasys, Inc. Liquid radiation curable resins capable of curing into layers with selective visual effects and methods for the use thereof
US9176377B2 (en) 2010-06-01 2015-11-03 Inpria Corporation Patterned inorganic layers, radiation based patterning compositions and corresponding methods
EP2502728B1 (en) 2011-03-23 2017-01-04 DSM IP Assets B.V. Lightweight and high strength three-dimensional articles producible by additive fabrication processes
EP2938652B1 (en) 2012-12-27 2021-03-31 3M Innovative Properties Company Polymerizable composition including a benzoxazine and an acid-forming peroxide catalyst, article, and method
EP2992057B1 (en) 2013-04-30 2018-01-31 3M Innovative Properties Company Process for preparing poly(benzoxazines)
US9310684B2 (en) 2013-08-22 2016-04-12 Inpria Corporation Organometallic solution based high resolution patterning compositions
CN105612198B (zh) 2013-10-16 2017-10-13 3M创新有限公司 苯并噁嗪聚合
JP6195552B2 (ja) * 2014-02-21 2017-09-13 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、及び、パターン形成方法、並びに、これらを用いた電子デバイスの製造方法
EP3307807A1 (en) 2015-06-09 2018-04-18 3M Innovative Properties Company Ammonium salt catalyzed benzoxazine polymerization
WO2017174545A1 (en) 2016-04-08 2017-10-12 Solvay Specialty Polymers Usa, Llc Photocurable polymers, photocurable polymer compositions and lithographic processes including the same
CN113667280A (zh) * 2021-08-28 2021-11-19 林州致远电子科技有限公司 一种具有uv遮蔽作用的树脂组合物及在覆铜板中的应用

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3709861A (en) * 1970-12-14 1973-01-09 Shell Oil Co Process for light-induced curing of epoxy resins in presence of cyclopentadienylmanganese tricarbonyl compounds

Also Published As

Publication number Publication date
EP0094914B1 (de) 1986-09-24
EP0094914A2 (de) 1983-11-23
DE3366408D1 (en) 1986-10-30
SG20789G (en) 1989-09-22
EP0094914A3 (en) 1984-02-08
CA1300307C (en) 1992-05-05
JPS58213019A (ja) 1983-12-10
HK58689A (en) 1989-07-28

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