HK58689A - Photopolymerisation with organometal salts - Google Patents

Photopolymerisation with organometal salts

Info

Publication number
HK58689A
HK58689A HK58689A HK58689A HK58689A HK 58689 A HK58689 A HK 58689A HK 58689 A HK58689 A HK 58689A HK 58689 A HK58689 A HK 58689A HK 58689 A HK58689 A HK 58689A
Authority
HK
Hong Kong
Prior art keywords
group
composition according
atom
hexafluorophosphate
tricarbonyl
Prior art date
Application number
HK58689A
Other languages
German (de)
English (en)
French (fr)
Chinese (zh)
Inventor
Edward Dr. Irving
Brian Frederick Gilbert Dr. Johnson
Kurt Dr. Meier
Original Assignee
Ciba-Geigy A.G.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba-Geigy A.G. filed Critical Ciba-Geigy A.G.
Publication of HK58689A publication Critical patent/HK58689A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
HK58689A 1982-05-19 1989-07-20 Photopolymerisation with organometal salts HK58689A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8214609 1982-05-19

Publications (1)

Publication Number Publication Date
HK58689A true HK58689A (en) 1989-07-28

Family

ID=10530464

Family Applications (1)

Application Number Title Priority Date Filing Date
HK58689A HK58689A (en) 1982-05-19 1989-07-20 Photopolymerisation with organometal salts

Country Status (6)

Country Link
EP (1) EP0094914B1 (enExample)
JP (1) JPS58213019A (enExample)
CA (1) CA1300307C (enExample)
DE (1) DE3366408D1 (enExample)
HK (1) HK58689A (enExample)
SG (1) SG20789G (enExample)

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JPH01118564A (ja) * 1987-10-30 1989-05-11 Toshiba Chem Corp 一液性エポキシ樹脂組成物
US4985340A (en) * 1988-06-01 1991-01-15 Minnesota Mining And Manufacturing Company Energy curable compositions: two component curing agents
US5215860A (en) * 1988-08-19 1993-06-01 Minnesota Mining And Manufacturing Company Energy-curable cyanate compositions
US5667934A (en) * 1990-10-09 1997-09-16 International Business Machines Corporation Thermally stable photoimaging composition
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US5212210A (en) * 1992-03-18 1993-05-18 Minnesota Mining And Manufacturing Company Energy curable compositions having improved cure speeds
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US5670590A (en) * 1994-05-06 1997-09-23 Minnesota Mining And Manufacturing Company Energy polymerizable compositions, homopolymers and copolymers of oxazolines
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DE59701299D1 (de) * 1996-07-29 2000-04-27 Ciba Sc Holding Ag Flüssige, strahlungshärtbare Zusammensetzung, insbesondere für die Stereolithographie
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US8871335B2 (en) 2005-08-31 2014-10-28 Kuraray America Inc. Solar control laminate
US8435098B2 (en) 2006-01-27 2013-05-07 Saint-Gobain Abrasives, Inc. Abrasive article with cured backsize layer
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US20100190881A1 (en) 2009-01-28 2010-07-29 3D Systems, Incorporated Radiation Curable Compositions Useful in Solid Freeform Fabrication Systems
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KR101833078B1 (ko) 2009-12-17 2018-02-27 디에스엠 아이피 어셋츠 비.브이. 적층식 제작을 위한 발광 다이오드 경화성 액체 수지 조성물
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US9176377B2 (en) 2010-06-01 2015-11-03 Inpria Corporation Patterned inorganic layers, radiation based patterning compositions and corresponding methods
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WO2014105422A1 (en) 2012-12-27 2014-07-03 3M Innovative Properties Company Polymerizable composition including a benzoxazine and an acid-forming peroxide catalyst, article, and method
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US9310684B2 (en) 2013-08-22 2016-04-12 Inpria Corporation Organometallic solution based high resolution patterning compositions
JP6419172B2 (ja) 2013-10-16 2018-11-07 スリーエム イノベイティブ プロパティズ カンパニー ベンゾオキサジン重合
JP6195552B2 (ja) * 2014-02-21 2017-09-13 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、レジスト膜、及び、パターン形成方法、並びに、これらを用いた電子デバイスの製造方法
CN107735427B (zh) 2015-06-09 2021-06-04 3M创新有限公司 铵盐催化的苯并噁嗪聚合
EP3439856B1 (en) 2016-04-08 2020-02-19 Solvay Specialty Polymers USA, LLC Photocurable polymers, photocurable polymer compositions and lithographic processes including the same
CN113667280A (zh) * 2021-08-28 2021-11-19 林州致远电子科技有限公司 一种具有uv遮蔽作用的树脂组合物及在覆铜板中的应用

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US3709861A (en) * 1970-12-14 1973-01-09 Shell Oil Co Process for light-induced curing of epoxy resins in presence of cyclopentadienylmanganese tricarbonyl compounds

Also Published As

Publication number Publication date
EP0094914A3 (en) 1984-02-08
JPS58213019A (ja) 1983-12-10
CA1300307C (en) 1992-05-05
DE3366408D1 (en) 1986-10-30
JPH0261973B2 (enExample) 1990-12-21
EP0094914A2 (de) 1983-11-23
SG20789G (en) 1989-09-22
EP0094914B1 (de) 1986-09-24

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)