JPH0254657B2 - - Google Patents

Info

Publication number
JPH0254657B2
JPH0254657B2 JP57169474A JP16947482A JPH0254657B2 JP H0254657 B2 JPH0254657 B2 JP H0254657B2 JP 57169474 A JP57169474 A JP 57169474A JP 16947482 A JP16947482 A JP 16947482A JP H0254657 B2 JPH0254657 B2 JP H0254657B2
Authority
JP
Japan
Prior art keywords
silicon
silicon dioxide
active region
layer
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57169474A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5874051A (ja
Inventor
Getsuzo Mario
Aran Matsukonerii Hooru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of JPS5874051A publication Critical patent/JPS5874051A/ja
Publication of JPH0254657B2 publication Critical patent/JPH0254657B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/6927—
    • H10P14/61—
    • H10P14/6526—
    • H10P14/6529—
    • H10W10/0121—
    • H10W10/13—
    • H10P14/6334—
    • H10P14/662—
    • H10P14/6682—

Landscapes

  • Local Oxidation Of Silicon (AREA)
  • Element Separation (AREA)
JP57169474A 1981-09-28 1982-09-28 集積回路を作る方法 Granted JPS5874051A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US30588381A 1981-09-28 1981-09-28
US305883 1981-09-28

Publications (2)

Publication Number Publication Date
JPS5874051A JPS5874051A (ja) 1983-05-04
JPH0254657B2 true JPH0254657B2 (enExample) 1990-11-22

Family

ID=23182776

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57169474A Granted JPS5874051A (ja) 1981-09-28 1982-09-28 集積回路を作る方法

Country Status (2)

Country Link
EP (1) EP0075875A3 (enExample)
JP (1) JPS5874051A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04116250U (ja) * 1991-03-29 1992-10-16 スタンレー電気株式会社 衝突検知装置付車載用放電灯

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4631219A (en) * 1985-01-31 1986-12-23 International Business Machines Corporation Growth of bird's beak free semi-rox
US4722910A (en) * 1986-05-27 1988-02-02 Analog Devices, Inc. Partially self-aligned metal contact process
JPH01274457A (ja) * 1988-04-26 1989-11-02 Seiko Instr Inc 半導体装置の製造方法
JP2597703B2 (ja) * 1989-02-27 1997-04-09 三菱電機株式会社 半導体装置の製造方法
US5202286A (en) * 1989-02-27 1993-04-13 Mitsubishi Denki Kabushiki Kaisha Method of forming three-dimensional features on substrates with adjacent insulating films
US4883768A (en) * 1989-02-28 1989-11-28 United Technologies Corporation Mesa fabrication in semiconductor structures
US4927780A (en) * 1989-10-02 1990-05-22 Motorola, Inc. Encapsulation method for localized oxidation of silicon
KR960005553B1 (ko) * 1993-03-31 1996-04-26 현대전자산업주식회사 필드산화막 형성 방법
KR100190363B1 (ko) * 1995-06-28 1999-06-01 김영환 반도체 소자의 소자분리 방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3874919A (en) * 1974-03-13 1975-04-01 Ibm Oxidation resistant mask layer and process for producing recessed oxide region in a silicon body
NL7506594A (nl) * 1975-06-04 1976-12-07 Philips Nv Werkwijze voor het vervaardigen van een halfge- leiderinrichting en halfgeleiderinrichting ver- vaardigd met behulp van de werkwijze.
EP0006706B2 (en) * 1978-06-14 1993-03-17 Fujitsu Limited Process for producing a semiconductor device having an insulating layer of silicon dioxide covered by a film of silicon oxynitride
US4272308A (en) * 1979-10-10 1981-06-09 Varshney Ramesh C Method of forming recessed isolation oxide layers
JPS5821842A (ja) * 1981-07-30 1983-02-08 インタ−ナシヨナル・ビジネス・マシ−ンズ・コ−ポレ−シヨン 分離領域の形成方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04116250U (ja) * 1991-03-29 1992-10-16 スタンレー電気株式会社 衝突検知装置付車載用放電灯

Also Published As

Publication number Publication date
EP0075875A2 (en) 1983-04-06
JPS5874051A (ja) 1983-05-04
EP0075875A3 (en) 1986-07-02

Similar Documents

Publication Publication Date Title
US4333965A (en) Method of making integrated circuits
JPH0254657B2 (enExample)
US4376664A (en) Method of producing a semiconductor device
JPH06163532A (ja) 半導体素子分離方法
JP3039978B2 (ja) 集積ｍｉｓｆｅｔデバイス中に電界分離構造及びゲート構造を形成する方法
JPH0312785B2 (enExample)
US5763316A (en) Substrate isolation process to minimize junction leakage
JPH0210730A (ja) 集積回路チップ上の電界効果トランジスタ用のフィールド・アイソレーション形成方法と構造
JPS6252950B2 (enExample)
EP0020144B1 (en) Method of producing a semiconductor device
JP2822211B2 (ja) 半導体装置の製造方法
JPH0313745B2 (enExample)
JPH079930B2 (ja) 半導体装置の製造方法
JPH08264634A (ja) 半導体装置における分離形成方法
JP2685448B2 (ja) 半導体装置の製造方法
JPS5975667A (ja) 半導体装置の製造方法
JPH04267336A (ja) 半導体装置の製造方法
JPH0117256B2 (enExample)
JPS6150343A (ja) 半導体素子の分離法
JP4982919B2 (ja) 半導体装置の製造方法
JPS6360534B2 (enExample)
JPS6081863A (ja) 半導体装置の製造方法
JPS6118348B2 (enExample)
JPH09129876A (ja) 半導体装置の製造方法
JPH0644569B2 (ja) シリコン基板上の炭化シリコンデバイスの製造方法