JPH0247853B2 - - Google Patents
Info
- Publication number
- JPH0247853B2 JPH0247853B2 JP57052775A JP5277582A JPH0247853B2 JP H0247853 B2 JPH0247853 B2 JP H0247853B2 JP 57052775 A JP57052775 A JP 57052775A JP 5277582 A JP5277582 A JP 5277582A JP H0247853 B2 JPH0247853 B2 JP H0247853B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- conductive film
- conductivity type
- window
- base region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/34—Bipolar devices
- H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions
Landscapes
- Electrodes Of Semiconductors (AREA)
- Bipolar Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57052775A JPS58169971A (ja) | 1982-03-30 | 1982-03-30 | 半導体装置およびその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57052775A JPS58169971A (ja) | 1982-03-30 | 1982-03-30 | 半導体装置およびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58169971A JPS58169971A (ja) | 1983-10-06 |
| JPH0247853B2 true JPH0247853B2 (cs) | 1990-10-23 |
Family
ID=12924230
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57052775A Granted JPS58169971A (ja) | 1982-03-30 | 1982-03-30 | 半導体装置およびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58169971A (cs) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3230050A1 (de) * | 1982-08-12 | 1984-02-16 | Siemens AG, 1000 Berlin und 8000 München | Integrierte halbleiterschaltung mit bipolaren bauelementen und verfahren zur herstellung derselben |
| US5077227A (en) * | 1986-06-03 | 1991-12-31 | Matsushita Electric Industrial Co., Ltd. | Semiconductor device and method for fabricating the same |
| JP2692292B2 (ja) * | 1989-09-02 | 1997-12-17 | 富士電機株式会社 | 集積回路装置用縦形バイポーラトランジスタ |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5690561A (en) * | 1979-12-22 | 1981-07-22 | Fujitsu Ltd | Manufacture of semiconductor device |
| JPS5735370A (en) * | 1980-08-12 | 1982-02-25 | Nec Corp | Semiconductor device |
| JPS5843573A (ja) * | 1981-09-08 | 1983-03-14 | Matsushita Electric Ind Co Ltd | バイポ−ラトランジスタ |
| JPS58142573A (ja) * | 1982-02-19 | 1983-08-24 | Hitachi Ltd | 半導体集積回路およびその製造方法 |
-
1982
- 1982-03-30 JP JP57052775A patent/JPS58169971A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58169971A (ja) | 1983-10-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS62290173A (ja) | 半導体集積回路装置の製造方法 | |
| JPH0247853B2 (cs) | ||
| EP0142186B1 (en) | Method of manufacturing a pattern of conductive material | |
| JPS5918874B2 (ja) | ハンドウタイソウチノセイゾウホウホウ | |
| JP3173114B2 (ja) | 薄膜トランジスタ | |
| JPS6252950B2 (cs) | ||
| JPS59977B2 (ja) | 絶縁ゲ−ト型集積回路 | |
| JPS5923476B2 (ja) | 半導体装置の製造方法 | |
| JPH1064898A (ja) | 半導体装置の製造方法 | |
| JPH0243336B2 (cs) | ||
| JPS6220711B2 (cs) | ||
| JPS5940571A (ja) | 半導体装置 | |
| JPS641063B2 (cs) | ||
| JP2594697B2 (ja) | 半導体装置の製造方法 | |
| JPS5961181A (ja) | 半導体装置の製造方法 | |
| JP2745946B2 (ja) | 半導体集積回路の製造方法 | |
| JP2654056B2 (ja) | 半導体装置の製造方法 | |
| JP2630616B2 (ja) | 半導体装置の製造方法 | |
| JPS5826177B2 (ja) | 半導体装置の製造方法 | |
| JPH0369168A (ja) | 薄膜電界効果トランジスタ | |
| JPS59121978A (ja) | 半導体装置の製造方法 | |
| JP2624365B2 (ja) | 半導体装置の製造方法 | |
| JPS59134868A (ja) | 半導体装置の製造方法 | |
| JPS6040696B2 (ja) | 半導体装置の製造方法 | |
| JPS63153859A (ja) | 半導体素子の製造方法 |