JPH0241894B2 - - Google Patents

Info

Publication number
JPH0241894B2
JPH0241894B2 JP59008757A JP875784A JPH0241894B2 JP H0241894 B2 JPH0241894 B2 JP H0241894B2 JP 59008757 A JP59008757 A JP 59008757A JP 875784 A JP875784 A JP 875784A JP H0241894 B2 JPH0241894 B2 JP H0241894B2
Authority
JP
Japan
Prior art keywords
film
resist
coating
forming
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59008757A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60153124A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP59008757A priority Critical patent/JPS60153124A/ja
Publication of JPS60153124A publication Critical patent/JPS60153124A/ja
Publication of JPH0241894B2 publication Critical patent/JPH0241894B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/165—Monolayers, e.g. Langmuir-Blodgett

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59008757A 1984-01-20 1984-01-20 塗膜形成方法 Granted JPS60153124A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59008757A JPS60153124A (ja) 1984-01-20 1984-01-20 塗膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59008757A JPS60153124A (ja) 1984-01-20 1984-01-20 塗膜形成方法

Publications (2)

Publication Number Publication Date
JPS60153124A JPS60153124A (ja) 1985-08-12
JPH0241894B2 true JPH0241894B2 (https=) 1990-09-19

Family

ID=11701796

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59008757A Granted JPS60153124A (ja) 1984-01-20 1984-01-20 塗膜形成方法

Country Status (1)

Country Link
JP (1) JPS60153124A (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0647093B2 (ja) * 1986-08-01 1994-06-22 株式会社リコー 半導性ないし導電性薄膜の製造方法
JPH0653249B2 (ja) * 1987-01-28 1994-07-20 松下電器産業株式会社 表面の酸化防止方法
JPH0667981B2 (ja) * 1988-04-28 1994-08-31 松下電器産業株式会社 ポリアセチレン又はポリアセン型超長共役ポリマーの製造方法
JP2667250B2 (ja) * 1989-06-15 1997-10-27 松下電子工業株式会社 半導体装置の製造方法

Also Published As

Publication number Publication date
JPS60153124A (ja) 1985-08-12

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