JPH024124Y2 - - Google Patents

Info

Publication number
JPH024124Y2
JPH024124Y2 JP1982151138U JP15113882U JPH024124Y2 JP H024124 Y2 JPH024124 Y2 JP H024124Y2 JP 1982151138 U JP1982151138 U JP 1982151138U JP 15113882 U JP15113882 U JP 15113882U JP H024124 Y2 JPH024124 Y2 JP H024124Y2
Authority
JP
Japan
Prior art keywords
target
backing plate
sputtered
sputtering
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1982151138U
Other languages
English (en)
Japanese (ja)
Other versions
JPS5956738U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15113882U priority Critical patent/JPS5956738U/ja
Priority to US06/539,180 priority patent/US4569745A/en
Priority to DE8383306022T priority patent/DE3381593D1/de
Priority to EP83306022A priority patent/EP0106623B1/en
Publication of JPS5956738U publication Critical patent/JPS5956738U/ja
Application granted granted Critical
Publication of JPH024124Y2 publication Critical patent/JPH024124Y2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
JP15113882U 1982-10-05 1982-10-05 スパツタ用タ−ゲツト Granted JPS5956738U (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP15113882U JPS5956738U (ja) 1982-10-05 1982-10-05 スパツタ用タ−ゲツト
US06/539,180 US4569745A (en) 1982-10-05 1983-10-05 Sputtering apparatus
DE8383306022T DE3381593D1 (de) 1982-10-05 1983-10-05 Zerstaeubungsvorrichtung.
EP83306022A EP0106623B1 (en) 1982-10-05 1983-10-05 Sputtering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15113882U JPS5956738U (ja) 1982-10-05 1982-10-05 スパツタ用タ−ゲツト

Publications (2)

Publication Number Publication Date
JPS5956738U JPS5956738U (ja) 1984-04-13
JPH024124Y2 true JPH024124Y2 (enrdf_load_stackoverflow) 1990-01-31

Family

ID=30335006

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15113882U Granted JPS5956738U (ja) 1982-10-05 1982-10-05 スパツタ用タ−ゲツト

Country Status (1)

Country Link
JP (1) JPS5956738U (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10325763B2 (en) * 2017-01-20 2019-06-18 Applied Materials, Inc. Physical vapor deposition processing systems target cooling
US10685821B2 (en) 2017-08-18 2020-06-16 Applied Materials, Inc. Physical vapor deposition processing systems target cooling

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5061382A (enrdf_load_stackoverflow) * 1973-10-02 1975-05-26

Also Published As

Publication number Publication date
JPS5956738U (ja) 1984-04-13

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