JPS5770273A - Method for fixing mask for vapor deposition - Google Patents
Method for fixing mask for vapor depositionInfo
- Publication number
- JPS5770273A JPS5770273A JP14514380A JP14514380A JPS5770273A JP S5770273 A JPS5770273 A JP S5770273A JP 14514380 A JP14514380 A JP 14514380A JP 14514380 A JP14514380 A JP 14514380A JP S5770273 A JPS5770273 A JP S5770273A
- Authority
- JP
- Japan
- Prior art keywords
- substrate plate
- vapor deposition
- mask
- magnet
- fixed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE:To eliminate displacement of a position as well as to facilitate detachment by a method wherein a mask for vapor deposition comprising a magnetic material is placed at a desired position of a substrate plate and fixed to said substrate plate by a magnet through said substrate plate. CONSTITUTION:A mask 2 for vapor deposition comporising a magnetic material is fixed to a desired position by a magnet 6 through a substrate plate 1 and a composite body comprising the substrate plate 1, the mask 2 and the magnet 6 is fixed in the air by a holding tool 4. In this condition, if an evaporation substrate is evaporated from a boat 3, only a periphery on a surface of the substrate plate can be uniformly vapor deposited.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14514380A JPS5770273A (en) | 1980-10-16 | 1980-10-16 | Method for fixing mask for vapor deposition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14514380A JPS5770273A (en) | 1980-10-16 | 1980-10-16 | Method for fixing mask for vapor deposition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5770273A true JPS5770273A (en) | 1982-04-30 |
Family
ID=15378405
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14514380A Pending JPS5770273A (en) | 1980-10-16 | 1980-10-16 | Method for fixing mask for vapor deposition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5770273A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59179777A (en) * | 1983-03-30 | 1984-10-12 | Ulvac Corp | Pattern forming device in continuous thin film forming device |
JPS59194406A (en) * | 1983-04-18 | 1984-11-05 | Matsushita Electric Ind Co Ltd | High permeability magnetic material |
WO2000037707A1 (en) * | 1998-12-21 | 2000-06-29 | Uhp Corporation | Local selective surface processing with magnetic mask holder |
WO2005106081A1 (en) * | 2004-05-04 | 2005-11-10 | OTB Oberflächentechnik in Berlin GmbH & Co. | Method and system for selectively coating or etching surfaces |
-
1980
- 1980-10-16 JP JP14514380A patent/JPS5770273A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59179777A (en) * | 1983-03-30 | 1984-10-12 | Ulvac Corp | Pattern forming device in continuous thin film forming device |
JPS6324065B2 (en) * | 1983-03-30 | 1988-05-19 | Ulvac Corp | |
JPS59194406A (en) * | 1983-04-18 | 1984-11-05 | Matsushita Electric Ind Co Ltd | High permeability magnetic material |
WO2000037707A1 (en) * | 1998-12-21 | 2000-06-29 | Uhp Corporation | Local selective surface processing with magnetic mask holder |
WO2005106081A1 (en) * | 2004-05-04 | 2005-11-10 | OTB Oberflächentechnik in Berlin GmbH & Co. | Method and system for selectively coating or etching surfaces |
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