JPS57152466A - Deposition method for vapor deposited film - Google Patents

Deposition method for vapor deposited film

Info

Publication number
JPS57152466A
JPS57152466A JP3834281A JP3834281A JPS57152466A JP S57152466 A JPS57152466 A JP S57152466A JP 3834281 A JP3834281 A JP 3834281A JP 3834281 A JP3834281 A JP 3834281A JP S57152466 A JPS57152466 A JP S57152466A
Authority
JP
Japan
Prior art keywords
substrate
mask
vapor deposition
deposited
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3834281A
Other languages
Japanese (ja)
Inventor
Toru Maekawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP3834281A priority Critical patent/JPS57152466A/en
Publication of JPS57152466A publication Critical patent/JPS57152466A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To obtain a semiconductor device, etc. of high reliability with improved adhesive strength between a mask made of a magnetic material and a substrate of a semiconductor, etc., by depositing a magnetic body layer on the surface of said substrate and depositing a metallic film thereon while attracting the mask with magnetic force. CONSTITUTION:A magnetic body material 12 of metallic Ni, etc. is deposited and formed on the rear surface of a substrate 11 of Si, etc., and is deposited on a permanent magnet 13 via the Ni layer 12. The permanent magnet is placed on a fine adjusting table 15 via a substrate holder 14. A mask 16 made of a magnetic material for vapor deposition is aligned to the prescribed position of the substrate 11 by moving the table 15 finely to the upper part, thence, the mask 16 is attracted with the magnet 13 so that it is adhered tightly to the surface of the substrate 11. These are introduced into a vapor deposition chamber, and a vapor deposition film of Al, etc. is deposited on the substrate 11 to prescribed patterns through the mask 16. By this method, the patterns of the vapor deposited films of high accuracy are obtained without intrusion of the vapor deposition particles between the substrate 11 and the mask 16.
JP3834281A 1981-03-16 1981-03-16 Deposition method for vapor deposited film Pending JPS57152466A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3834281A JPS57152466A (en) 1981-03-16 1981-03-16 Deposition method for vapor deposited film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3834281A JPS57152466A (en) 1981-03-16 1981-03-16 Deposition method for vapor deposited film

Publications (1)

Publication Number Publication Date
JPS57152466A true JPS57152466A (en) 1982-09-20

Family

ID=12522606

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3834281A Pending JPS57152466A (en) 1981-03-16 1981-03-16 Deposition method for vapor deposited film

Country Status (1)

Country Link
JP (1) JPS57152466A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000037707A1 (en) * 1998-12-21 2000-06-29 Uhp Corporation Local selective surface processing with magnetic mask holder

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000037707A1 (en) * 1998-12-21 2000-06-29 Uhp Corporation Local selective surface processing with magnetic mask holder

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