JPS6471128A - Method and device for applying resist and developing device for resist - Google Patents
Method and device for applying resist and developing device for resistInfo
- Publication number
- JPS6471128A JPS6471128A JP1755888A JP1755888A JPS6471128A JP S6471128 A JPS6471128 A JP S6471128A JP 1755888 A JP1755888 A JP 1755888A JP 1755888 A JP1755888 A JP 1755888A JP S6471128 A JPS6471128 A JP S6471128A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- substrate
- applying
- vibrated
- susceptor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To obtain a fine resist pattern by applying a resist while a substrate is vibrated minutely when the resist is applied onto the substrate. CONSTITUTION:An silicon substrate 11 is placed onto a support plate 15a for a susceptor 15, and the substrate 11 is fixed to the susceptor 15 by a suction mechanism. Power is applied to vibrating means 31, and the substrate 11 is vibrated finely. When the substrate 11 is vibrated finely, a positive type resist is dropped from a resist dropper 21. A fixed time passes, the substrate 11 is turned, and resist application through the so-called spin coating is conducted.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1755888A JPS6471128A (en) | 1987-05-02 | 1988-01-28 | Method and device for applying resist and developing device for resist |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10919287 | 1987-05-02 | ||
| JP1755888A JPS6471128A (en) | 1987-05-02 | 1988-01-28 | Method and device for applying resist and developing device for resist |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6471128A true JPS6471128A (en) | 1989-03-16 |
Family
ID=26354103
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1755888A Pending JPS6471128A (en) | 1987-05-02 | 1988-01-28 | Method and device for applying resist and developing device for resist |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6471128A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02152966A (en) * | 1988-12-05 | 1990-06-12 | Otsuka Pharmaceut Co Ltd | 4-hydroxycarbostyril derivative |
| JPH03186851A (en) * | 1989-12-18 | 1991-08-14 | Fujitsu Ltd | Developing method for photoresist |
| JPH06163388A (en) * | 1992-11-18 | 1994-06-10 | Sekisui Finechem Co Ltd | Coating method of resist material |
| JP2007090236A (en) * | 2005-09-28 | 2007-04-12 | Matsushita Electric Ind Co Ltd | Die, coating apparatus, manufacturing method of optical disk, and optical disk |
| JP2008253937A (en) * | 2007-04-06 | 2008-10-23 | Disco Abrasive Syst Ltd | Coating method with liquid resin and device |
-
1988
- 1988-01-28 JP JP1755888A patent/JPS6471128A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02152966A (en) * | 1988-12-05 | 1990-06-12 | Otsuka Pharmaceut Co Ltd | 4-hydroxycarbostyril derivative |
| JPH03186851A (en) * | 1989-12-18 | 1991-08-14 | Fujitsu Ltd | Developing method for photoresist |
| JPH06163388A (en) * | 1992-11-18 | 1994-06-10 | Sekisui Finechem Co Ltd | Coating method of resist material |
| JP2007090236A (en) * | 2005-09-28 | 2007-04-12 | Matsushita Electric Ind Co Ltd | Die, coating apparatus, manufacturing method of optical disk, and optical disk |
| JP2008253937A (en) * | 2007-04-06 | 2008-10-23 | Disco Abrasive Syst Ltd | Coating method with liquid resin and device |
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