JPH0241163B2 - - Google Patents

Info

Publication number
JPH0241163B2
JPH0241163B2 JP56173190A JP17319081A JPH0241163B2 JP H0241163 B2 JPH0241163 B2 JP H0241163B2 JP 56173190 A JP56173190 A JP 56173190A JP 17319081 A JP17319081 A JP 17319081A JP H0241163 B2 JPH0241163 B2 JP H0241163B2
Authority
JP
Japan
Prior art keywords
heating table
heating
heated
parallel grooves
conveyance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56173190A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5875154A (ja
Inventor
Isao Saegusa
Masamitsu Takanami
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP17319081A priority Critical patent/JPS5875154A/ja
Publication of JPS5875154A publication Critical patent/JPS5875154A/ja
Publication of JPH0241163B2 publication Critical patent/JPH0241163B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Drying Of Solid Materials (AREA)
  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP17319081A 1981-10-29 1981-10-29 加熱装置 Granted JPS5875154A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17319081A JPS5875154A (ja) 1981-10-29 1981-10-29 加熱装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17319081A JPS5875154A (ja) 1981-10-29 1981-10-29 加熱装置

Publications (2)

Publication Number Publication Date
JPS5875154A JPS5875154A (ja) 1983-05-06
JPH0241163B2 true JPH0241163B2 (enrdf_load_stackoverflow) 1990-09-14

Family

ID=15955757

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17319081A Granted JPS5875154A (ja) 1981-10-29 1981-10-29 加熱装置

Country Status (1)

Country Link
JP (1) JPS5875154A (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59228731A (ja) * 1983-06-09 1984-12-22 Toshiba Corp ウエハ−移送装置
JPS62183521A (ja) * 1986-02-07 1987-08-11 Nec Kyushu Ltd 半導体装置の製造装置
JPS62172150U (enrdf_load_stackoverflow) * 1986-04-02 1987-10-31
JPH0257184U (enrdf_load_stackoverflow) * 1988-10-19 1990-04-25
JP4672538B2 (ja) * 2005-12-06 2011-04-20 東京エレクトロン株式会社 加熱処理装置
JP2009052762A (ja) * 2007-08-23 2009-03-12 Shimada Phys & Chem Ind Co Ltd 乾燥装置
CN112204470B (zh) * 2018-06-15 2024-04-16 玛特森技术公司 用于工件的曝光后烘烤加工的方法和装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4913264U (enrdf_load_stackoverflow) * 1972-05-03 1974-02-04
JPS5432910Y2 (enrdf_load_stackoverflow) * 1974-07-18 1979-10-12
JPS51124839A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Infrared ray baking furnace
JPS54149471A (en) * 1978-05-16 1979-11-22 Nec Corp Object moving unit
JPS5558516U (enrdf_load_stackoverflow) * 1978-10-11 1980-04-21

Also Published As

Publication number Publication date
JPS5875154A (ja) 1983-05-06

Similar Documents

Publication Publication Date Title
JP3641217B2 (ja) チップ状電子部品における端部電極形成方法及び装置
JPH0241163B2 (enrdf_load_stackoverflow)
JPH05109792A (ja) キユア装置
JP3497659B2 (ja) 薄板状被塗物の両面塗布装置
US3394680A (en) Machine for applying to cylindrical objects a controlled thickness of electrical coating material
JPS6245811Y2 (enrdf_load_stackoverflow)
JPH08258957A (ja) 素材の姿勢変換装置
JPH07106734A (ja) プリント配線基板の製造装置、乾燥装置、および搬送 装置
JPS6245373A (ja) プリント基板コ−テイング装置用自在傾斜ハンガ−
JPS6224330B2 (enrdf_load_stackoverflow)
JPH054277Y2 (enrdf_load_stackoverflow)
JPH07117826A (ja) 基板製造装置と製造方法および平板搬送装置と搬送方法
JPH0758829B2 (ja) フラックス吹付け方法及び装置
JPS6153632B2 (enrdf_load_stackoverflow)
JP2003083684A (ja) 被加熱物搬送機構
JPS63177958A (ja) ガイドレールの上下動装置を備えたプリント基板搬送装置
JPS6121168Y2 (enrdf_load_stackoverflow)
JPH04106495U (ja) 電子部品製造用の乾燥装置
JPH0525765U (ja) はんだ付け装置におけるプリント基板反り止め機構
JPH0546985B2 (enrdf_load_stackoverflow)
JPH11179254A (ja) 塗装建材の搬送装置
JPS6320896A (ja) プリント基板の導電膜保護部の生成装置
JPS60118513A (ja) ウオ−キングビ−ム式搬送装置
WO1990003099A1 (fr) Procede pour transporter dans une enceinte de sechage un produit en feuille, notamment un substrat de circuit imprime, et installation de sechage pour substrats de circuit imprime
JPH0655290U (ja) 基板押え搬送装置