JPH0231785Y2 - - Google Patents

Info

Publication number
JPH0231785Y2
JPH0231785Y2 JP1985128926U JP12892685U JPH0231785Y2 JP H0231785 Y2 JPH0231785 Y2 JP H0231785Y2 JP 1985128926 U JP1985128926 U JP 1985128926U JP 12892685 U JP12892685 U JP 12892685U JP H0231785 Y2 JPH0231785 Y2 JP H0231785Y2
Authority
JP
Japan
Prior art keywords
liquid
tank
supply device
control valve
trap tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1985128926U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6237923U (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985128926U priority Critical patent/JPH0231785Y2/ja
Publication of JPS6237923U publication Critical patent/JPS6237923U/ja
Application granted granted Critical
Publication of JPH0231785Y2 publication Critical patent/JPH0231785Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Photographic Processing Devices Using Wet Methods (AREA)
  • Degasification And Air Bubble Elimination (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
  • Coating Apparatus (AREA)
JP1985128926U 1985-08-26 1985-08-26 Expired JPH0231785Y2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985128926U JPH0231785Y2 (enrdf_load_stackoverflow) 1985-08-26 1985-08-26

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985128926U JPH0231785Y2 (enrdf_load_stackoverflow) 1985-08-26 1985-08-26

Publications (2)

Publication Number Publication Date
JPS6237923U JPS6237923U (enrdf_load_stackoverflow) 1987-03-06
JPH0231785Y2 true JPH0231785Y2 (enrdf_load_stackoverflow) 1990-08-28

Family

ID=31025039

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985128926U Expired JPH0231785Y2 (enrdf_load_stackoverflow) 1985-08-26 1985-08-26

Country Status (1)

Country Link
JP (1) JPH0231785Y2 (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0750673B2 (ja) * 1988-02-10 1995-05-31 東京エレクトロン株式会社 レジスト塗布装置
JP2766485B2 (ja) * 1988-09-13 1998-06-18 東京エレクトロン株式会社 現像装置
JP2715144B2 (ja) * 1989-06-08 1998-02-18 東京エレクトロン株式会社 処理液の供給装置
JP2688108B2 (ja) * 1990-06-01 1997-12-08 富士写真フイルム株式会社 自動現像機のガス排出装置
JP2748664B2 (ja) * 1990-07-17 1998-05-13 日本電気株式会社 薬液処理装置
JP2001032081A (ja) * 1999-07-19 2001-02-06 Electroplating Eng Of Japan Co 添加剤供給装置
JP4776429B2 (ja) * 2006-05-11 2011-09-21 東京エレクトロン株式会社 処理液供給システム、処理液供給方法、処理液供給プログラム及びそのプログラムを記録したコンピュータ読み取り可能な記録媒体
JP5015655B2 (ja) * 2007-05-09 2012-08-29 ルネサスエレクトロニクス株式会社 液体材料供給装置およびこれを用いた液体材料供給方法
JP5434329B2 (ja) * 2009-07-17 2014-03-05 東京エレクトロン株式会社 処理液供給装置及び処理液供給方法
JP5922901B2 (ja) * 2011-09-29 2016-05-24 株式会社Ｓｃｒｅｅｎセミコンダクターソリューションズ 処理液供給装置、基板処理装置、気泡の除去方法および基板処理方法
JP6222118B2 (ja) * 2015-01-09 2017-11-01 東京エレクトロン株式会社 処理液濾過装置、薬液供給装置及び処理液濾過方法並びに記憶媒体

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5977225U (ja) * 1982-11-15 1984-05-25 ソニー株式会社 半導体素子製造装置
JPS60117727A (ja) * 1983-11-30 1985-06-25 Canon Hanbai Kk フオトレジスト供給装置

Also Published As

Publication number Publication date
JPS6237923U (enrdf_load_stackoverflow) 1987-03-06

Similar Documents

Publication Publication Date Title
JPH0231785Y2 (enrdf_load_stackoverflow)
US4997490A (en) Method of cleaning and rinsing wafers
KR930022485A (ko) 기판처리장치
KR102291891B1 (ko) 세정수 공급 장치
TWI644344B (zh) Processing liquid supply device, substrate processing system, and processing liquid supply method
JP2000189742A (ja) 気体溶解モジュ―ル
JPS587831A (ja) 高圧水によるウェハの洗浄方法及び装置
JP5412135B2 (ja) オゾン水供給装置
KR100280011B1 (ko) 반도체장치 제조용 기포분리기와 이를 적용한 액체공급장치 및 그 구동방법
JPH0523674A (ja) 炭酸ガス中和装置
TW423985B (en) Apparatus for removing impurities in air
KR20080045783A (ko) 반도체 제조용 용액의 공급 제어장치
JPH11121422A (ja) 薬液供給装置
JPS57144089A (en) Automatic control method for batch-wise activated sludge method
JP3442263B2 (ja) 液供給機構、液処理装置および液処理方法
JPS6242535Y2 (enrdf_load_stackoverflow)
JPH10318818A (ja) 液面検出器及び液面制御装置
JPH04100527A (ja) 微細気泡発生装置
EP1908443A1 (en) Mixing device for tub
JPH1090038A (ja) 液面検出装置
JPH07328603A (ja) 液体処理装置
JP2813197B2 (ja) 処理液供給装置
JP2558490B2 (ja) 現像装置
JPS62117689A (ja) 冷却水管の洗浄装置
JPH04197434A (ja) 液処理方法