JPH0225378B2 - - Google Patents

Info

Publication number
JPH0225378B2
JPH0225378B2 JP18352083A JP18352083A JPH0225378B2 JP H0225378 B2 JPH0225378 B2 JP H0225378B2 JP 18352083 A JP18352083 A JP 18352083A JP 18352083 A JP18352083 A JP 18352083A JP H0225378 B2 JPH0225378 B2 JP H0225378B2
Authority
JP
Japan
Prior art keywords
polyimide
general formula
formula
mol
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18352083A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6072925A (ja
Inventor
Tsunetomo Nakano
Hiroshi Yasuno
Itsusho Nishio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP18352083A priority Critical patent/JPS6072925A/ja
Publication of JPS6072925A publication Critical patent/JPS6072925A/ja
Publication of JPH0225378B2 publication Critical patent/JPH0225378B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP18352083A 1983-09-30 1983-09-30 有機溶媒可溶性の感光性ポリイミド Granted JPS6072925A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18352083A JPS6072925A (ja) 1983-09-30 1983-09-30 有機溶媒可溶性の感光性ポリイミド

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18352083A JPS6072925A (ja) 1983-09-30 1983-09-30 有機溶媒可溶性の感光性ポリイミド

Publications (2)

Publication Number Publication Date
JPS6072925A JPS6072925A (ja) 1985-04-25
JPH0225378B2 true JPH0225378B2 (en, 2012) 1990-06-01

Family

ID=16137281

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18352083A Granted JPS6072925A (ja) 1983-09-30 1983-09-30 有機溶媒可溶性の感光性ポリイミド

Country Status (1)

Country Link
JP (1) JPS6072925A (en, 2012)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0778370B2 (ja) * 1985-11-26 1995-08-23 ヤマハ発動機株式会社 ４行程エンジンの制御装置
JPH0730703B2 (ja) * 1986-03-07 1995-04-10 ヤマハ発動機株式会社 エンジンの排気制御装置
JPH0243221A (ja) * 1988-06-10 1990-02-13 Occidental Chem Corp 新規可溶性ポリイミドシロキサン及びその製法及び用途
JP2540927B2 (ja) * 1988-12-16 1996-10-09 日立化成工業株式会社 感光性樹脂組成物およびこれを用いた感光性エレメント
JP2785359B2 (ja) * 1989-07-27 1998-08-13 日立化成工業株式会社 ポリイミド系樹脂の製造法
US5851736A (en) * 1991-03-05 1998-12-22 Nitto Denko Corporation Heat-resistant photoresist composition, photosensitive substrate, and process for forming heat-resistant positive or negative pattern
TW268072B (en, 2012) * 1993-12-09 1996-01-11 Honda Motor Co Ltd
JP3709997B2 (ja) * 1994-03-29 2005-10-26 日東電工株式会社 耐熱性ネガ型フォトレジスト組成物および感光性基材、ならびにネガ型パターン形成方法
JP3232022B2 (ja) * 1997-03-31 2001-11-26 信越化学工業株式会社 感光性樹脂組成物
JP4529252B2 (ja) 1999-09-28 2010-08-25 日立化成デュポンマイクロシステムズ株式会社 ポジ型感光性樹脂組成物、パターンの製造法及び電子部品
EP2469337B1 (en) 2004-05-07 2014-01-22 Hitachi Chemical DuPont MicroSystems Ltd. Positive photosensitive resin composition, method for forming pattern, and electronic component
US7638254B2 (en) 2004-05-07 2009-12-29 Hitachi Chemical Dupont Microsystems Ltd Positive photosensitive resin composition, method for forming pattern, and electronic part
TWI407255B (zh) 2005-09-22 2013-09-01 Hitachi Chem Dupont Microsys 負片型感光性樹脂組成物、圖案形成方法以及電子零件
US8298747B2 (en) 2007-03-12 2012-10-30 Hitachi Chemical Dupont Microsystems, Ltd. Photosensitive resin composition, process for producing patterned hardened film with use thereof and electronic part
KR101275474B1 (ko) 2007-10-29 2013-06-14 히다치 가세이듀퐁 마이쿠로시스데무즈 가부시키가이샤 포지티브형 감광성 수지 조성물, 패턴의 제조방법 및 전자부품
KR101010036B1 (ko) * 2009-08-28 2011-01-21 주식회사 엘지화학 신규한 폴리아믹산, 이를 포함하는 감광성 수지 조성물 및 이로부터 제조된 드라이 필름
KR101840484B1 (ko) * 2010-02-26 2018-03-20 닛산 가가쿠 고교 가부시키 가이샤 디아민 화합물, 액정 배향제 및 액정 표시 소자
JP6870289B2 (ja) * 2016-11-17 2021-05-12 Jsr株式会社 液晶配向剤、液晶素子の製造方法、液晶配向膜、液晶素子

Also Published As

Publication number Publication date
JPS6072925A (ja) 1985-04-25

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