JPH0225254B2 - - Google Patents
Info
- Publication number
- JPH0225254B2 JPH0225254B2 JP61216690A JP21669086A JPH0225254B2 JP H0225254 B2 JPH0225254 B2 JP H0225254B2 JP 61216690 A JP61216690 A JP 61216690A JP 21669086 A JP21669086 A JP 21669086A JP H0225254 B2 JPH0225254 B2 JP H0225254B2
- Authority
- JP
- Japan
- Prior art keywords
- silicon wafer
- suction disk
- orientation flat
- movable
- holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 54
- 229910052710 silicon Inorganic materials 0.000 claims description 54
- 239000010703 silicon Substances 0.000 claims description 54
- 235000012431 wafers Nutrition 0.000 description 58
- 230000000630 rising effect Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
- Y10S414/136—Associated with semiconductor wafer handling including wafer orienting means
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Control Of Position Or Direction (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61216690A JPS6372138A (ja) | 1986-09-12 | 1986-09-12 | シリコンウエハ−の位置決め装置 |
US07/071,958 US4770600A (en) | 1986-09-12 | 1987-07-10 | Apparatus for positioning silicon wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61216690A JPS6372138A (ja) | 1986-09-12 | 1986-09-12 | シリコンウエハ−の位置決め装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6372138A JPS6372138A (ja) | 1988-04-01 |
JPH0225254B2 true JPH0225254B2 (US20110009641A1-20110113-C00116.png) | 1990-06-01 |
Family
ID=16692395
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61216690A Granted JPS6372138A (ja) | 1986-09-12 | 1986-09-12 | シリコンウエハ−の位置決め装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US4770600A (US20110009641A1-20110113-C00116.png) |
JP (1) | JPS6372138A (US20110009641A1-20110113-C00116.png) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4880348A (en) * | 1987-05-15 | 1989-11-14 | Roboptek, Inc. | Wafer centration device |
DE68911330T2 (de) * | 1988-02-08 | 1994-05-26 | Toshiba Kawasaki Kk | Vorrichtung mit einem Ausrichtungsgestell. |
JPH0736417B2 (ja) * | 1989-10-24 | 1995-04-19 | 株式会社メツクス | ウエハーの位置決め装置 |
US5344521A (en) * | 1991-04-10 | 1994-09-06 | Canon Kabushiki Kaisha | Coating film separating device and coating film separation method using the device |
JP3074313B2 (ja) * | 1993-01-26 | 2000-08-07 | 株式会社メックス | ウエハーの位置決め装置 |
KR0165350B1 (ko) * | 1995-12-13 | 1999-02-18 | 김광호 | 반도체웨이퍼 공급장치 |
JPH09213769A (ja) * | 1996-01-31 | 1997-08-15 | Komatsu Electron Metals Co Ltd | 半導体ウェハの搬送装置 |
US6075334A (en) * | 1999-03-15 | 2000-06-13 | Berkeley Process Control, Inc | Automatic calibration system for wafer transfer robot |
US6185830B1 (en) * | 1999-03-25 | 2001-02-13 | Lucent Technologies, Inc. | Semiconductor wafer fixture for alignment in a grating exposure process |
US6275742B1 (en) | 1999-04-16 | 2001-08-14 | Berkeley Process Control, Inc. | Wafer aligner system |
US6357996B2 (en) * | 1999-05-14 | 2002-03-19 | Newport Corporation | Edge gripping specimen prealigner |
JP4173309B2 (ja) * | 2002-01-28 | 2008-10-29 | 東京エレクトロン株式会社 | センタリング装置及び枚葉式検査装置 |
JP3956350B2 (ja) * | 2002-03-25 | 2007-08-08 | 東京エレクトロン株式会社 | 位置決め機能を有する基板処理装置及び位置決め機能を有する基板処理方法 |
US6779278B1 (en) * | 2003-07-17 | 2004-08-24 | Nanometrics Incorporated | Compact rotating stage |
JP2007005690A (ja) * | 2005-06-27 | 2007-01-11 | Fujifilm Holdings Corp | 半導体装置用検査装置およびこれを用いた半導体装置の検査方法 |
US7921895B2 (en) * | 2006-05-26 | 2011-04-12 | Advanced Display Process Engineering Co., Ltd | Adhesive chuck, and apparatus and method for assembling substrates using the same |
JP2008103544A (ja) * | 2006-10-19 | 2008-05-01 | Yaskawa Electric Corp | アライナー装置 |
JP5049983B2 (ja) * | 2009-01-07 | 2012-10-17 | 本田技研工業株式会社 | 収納装置 |
JP6215059B2 (ja) * | 2014-01-10 | 2017-10-18 | 株式会社ディスコ | マーク検出方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5416984A (en) * | 1977-07-08 | 1979-02-07 | Hitachi Ltd | Wafer locating device |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4024944A (en) * | 1975-12-24 | 1977-05-24 | Texas Instruments Incorporated | Semiconductor slice prealignment system |
US4457664A (en) * | 1982-03-22 | 1984-07-03 | Ade Corporation | Wafer alignment station |
US4662811A (en) * | 1983-07-25 | 1987-05-05 | Hayden Thomas J | Method and apparatus for orienting semiconductor wafers |
JPH0610775B2 (ja) * | 1984-12-05 | 1994-02-09 | 株式会社ニコン | 円形基板の位置決め装置 |
-
1986
- 1986-09-12 JP JP61216690A patent/JPS6372138A/ja active Granted
-
1987
- 1987-07-10 US US07/071,958 patent/US4770600A/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5416984A (en) * | 1977-07-08 | 1979-02-07 | Hitachi Ltd | Wafer locating device |
Also Published As
Publication number | Publication date |
---|---|
JPS6372138A (ja) | 1988-04-01 |
US4770600A (en) | 1988-09-13 |
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