JPH0196222A - １，２，２−トリメチル−１−（置換フェニル）ポリジシランおよびその製造法 - Google Patents
１，２，２−トリメチル−１−（置換フェニル）ポリジシランおよびその製造法Info
- Publication number
- JPH0196222A JPH0196222A JP25492487A JP25492487A JPH0196222A JP H0196222 A JPH0196222 A JP H0196222A JP 25492487 A JP25492487 A JP 25492487A JP 25492487 A JP25492487 A JP 25492487A JP H0196222 A JPH0196222 A JP H0196222A
- Authority
- JP
- Japan
- Prior art keywords
- group
- trimethyl
- formula
- polydisilane
- substituted phenyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 title claims description 8
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 8
- 125000006239 protecting group Chemical group 0.000 claims abstract description 6
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 5
- RQJRLVCBMAKXFG-UHFFFAOYSA-N phenyl(silyl)silane Chemical class [SiH3][SiH2]C1=CC=CC=C1 RQJRLVCBMAKXFG-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 9
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 9
- 229910052783 alkali metal Inorganic materials 0.000 claims description 8
- 150000001340 alkali metals Chemical class 0.000 claims description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 7
- 125000003277 amino group Chemical group 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 5
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
- 238000006482 condensation reaction Methods 0.000 claims description 3
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 abstract description 9
- 239000000463 material Substances 0.000 abstract description 4
- 238000009833 condensation Methods 0.000 abstract description 3
- 230000005494 condensation Effects 0.000 abstract description 3
- 230000003287 optical effect Effects 0.000 abstract description 3
- 229920002120 photoresistant polymer Polymers 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 239000003513 alkali Substances 0.000 abstract 2
- -1 dichloro-trimethyl-substituted phenyldisilane Chemical class 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 16
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 239000007810 chemical reaction solvent Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 239000012776 electronic material Substances 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000011232 storage material Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- ANKUCNJFFZQDBW-UHFFFAOYSA-N COC1=CC=C(C=C1)[SiH2][SiH3] Chemical compound COC1=CC=C(C=C1)[SiH2][SiH3] ANKUCNJFFZQDBW-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 102100024133 Coiled-coil domain-containing protein 50 Human genes 0.000 description 1
- 101000910772 Homo sapiens Coiled-coil domain-containing protein 50 Proteins 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000000010 aprotic solvent Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical group C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
- 125000004665 trialkylsilyl group Chemical group 0.000 description 1
Landscapes
- Silicon Polymers (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25492487A JPH0196222A (ja) | 1987-10-08 | 1987-10-08 | １，２，２−トリメチル−１−（置換フェニル）ポリジシランおよびその製造法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25492487A JPH0196222A (ja) | 1987-10-08 | 1987-10-08 | １，２，２−トリメチル−１−（置換フェニル）ポリジシランおよびその製造法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0196222A true JPH0196222A (ja) | 1989-04-14 |
| JPH0424366B2 JPH0424366B2 (enrdf_load_stackoverflow) | 1992-04-24 |
Family
ID=17271749
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25492487A Granted JPH0196222A (ja) | 1987-10-08 | 1987-10-08 | １，２，２−トリメチル−１−（置換フェニル）ポリジシランおよびその製造法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0196222A (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997046605A1 (fr) * | 1996-06-07 | 1997-12-11 | Osaka Gas Company Limited | Polysilanes et materiaux de transport des trous positifs |
| JP2002167438A (ja) * | 2000-11-29 | 2002-06-11 | Jsr Corp | ケイ素ポリマー、膜形成用組成物および絶縁膜形成用材料 |
| JP2003162058A (ja) * | 2001-11-28 | 2003-06-06 | Seiko Epson Corp | 膜パターンの形成方法、膜パターン、半導体装置の製造方法、半導体装置、電気光学装置の製造方法、及び電気光学装置 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6098431A (ja) * | 1983-11-04 | 1985-06-01 | Nippon Telegr & Teleph Corp <Ntt> | パタン形成材料及びパタン形成方法 |
| JPS60228542A (ja) * | 1984-04-05 | 1985-11-13 | アメリカ合衆国 | ポリシランおよびこれを使用する方法 |
| JPS63141046A (ja) * | 1986-12-03 | 1988-06-13 | Toshiba Corp | レジスト |
-
1987
- 1987-10-08 JP JP25492487A patent/JPH0196222A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6098431A (ja) * | 1983-11-04 | 1985-06-01 | Nippon Telegr & Teleph Corp <Ntt> | パタン形成材料及びパタン形成方法 |
| JPS60228542A (ja) * | 1984-04-05 | 1985-11-13 | アメリカ合衆国 | ポリシランおよびこれを使用する方法 |
| JPS63141046A (ja) * | 1986-12-03 | 1988-06-13 | Toshiba Corp | レジスト |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1997046605A1 (fr) * | 1996-06-07 | 1997-12-11 | Osaka Gas Company Limited | Polysilanes et materiaux de transport des trous positifs |
| JP2002167438A (ja) * | 2000-11-29 | 2002-06-11 | Jsr Corp | ケイ素ポリマー、膜形成用組成物および絶縁膜形成用材料 |
| JP2003162058A (ja) * | 2001-11-28 | 2003-06-06 | Seiko Epson Corp | 膜パターンの形成方法、膜パターン、半導体装置の製造方法、半導体装置、電気光学装置の製造方法、及び電気光学装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0424366B2 (enrdf_load_stackoverflow) | 1992-04-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |