JPH0153770B2 - - Google Patents

Info

Publication number
JPH0153770B2
JPH0153770B2 JP21808782A JP21808782A JPH0153770B2 JP H0153770 B2 JPH0153770 B2 JP H0153770B2 JP 21808782 A JP21808782 A JP 21808782A JP 21808782 A JP21808782 A JP 21808782A JP H0153770 B2 JPH0153770 B2 JP H0153770B2
Authority
JP
Japan
Prior art keywords
polyimide precursor
heat
photosensitive material
relief pattern
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP21808782A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59107346A (ja
Inventor
Tsunetomo Nakano
Hiroshi Yasuno
Tetsutsugu Katsube
Hiroshi Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP21808782A priority Critical patent/JPS59107346A/ja
Publication of JPS59107346A publication Critical patent/JPS59107346A/ja
Publication of JPH0153770B2 publication Critical patent/JPH0153770B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP21808782A 1982-12-13 1982-12-13 耐熱性感光材料 Granted JPS59107346A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21808782A JPS59107346A (ja) 1982-12-13 1982-12-13 耐熱性感光材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21808782A JPS59107346A (ja) 1982-12-13 1982-12-13 耐熱性感光材料

Publications (2)

Publication Number Publication Date
JPS59107346A JPS59107346A (ja) 1984-06-21
JPH0153770B2 true JPH0153770B2 (enExample) 1989-11-15

Family

ID=16714430

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21808782A Granted JPS59107346A (ja) 1982-12-13 1982-12-13 耐熱性感光材料

Country Status (1)

Country Link
JP (1) JPS59107346A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007107633A (ja) * 2005-10-14 2007-04-26 Jtekt Corp オルタネータ用プーリ装置
JP2007107636A (ja) * 2005-10-14 2007-04-26 Jtekt Corp クランクプーリ装置

Also Published As

Publication number Publication date
JPS59107346A (ja) 1984-06-21

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