JPS59107346A - 耐熱性感光材料 - Google Patents

耐熱性感光材料

Info

Publication number
JPS59107346A
JPS59107346A JP21808782A JP21808782A JPS59107346A JP S59107346 A JPS59107346 A JP S59107346A JP 21808782 A JP21808782 A JP 21808782A JP 21808782 A JP21808782 A JP 21808782A JP S59107346 A JPS59107346 A JP S59107346A
Authority
JP
Japan
Prior art keywords
heat
polyimide precursor
photosensitive material
resistant photosensitive
resistant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21808782A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0153770B2 (enExample
Inventor
Tsunetomo Nakano
中野　常朝
Hiroshi Yasuno
安野　弘
Tetsutsugu Katsube
哲嗣 勝部
Hiroshi Watanabe
洋 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ube Corp
Original Assignee
Ube Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ube Industries Ltd filed Critical Ube Industries Ltd
Priority to JP21808782A priority Critical patent/JPS59107346A/ja
Publication of JPS59107346A publication Critical patent/JPS59107346A/ja
Publication of JPH0153770B2 publication Critical patent/JPH0153770B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP21808782A 1982-12-13 1982-12-13 耐熱性感光材料 Granted JPS59107346A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21808782A JPS59107346A (ja) 1982-12-13 1982-12-13 耐熱性感光材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21808782A JPS59107346A (ja) 1982-12-13 1982-12-13 耐熱性感光材料

Publications (2)

Publication Number Publication Date
JPS59107346A true JPS59107346A (ja) 1984-06-21
JPH0153770B2 JPH0153770B2 (enExample) 1989-11-15

Family

ID=16714430

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21808782A Granted JPS59107346A (ja) 1982-12-13 1982-12-13 耐熱性感光材料

Country Status (1)

Country Link
JP (1) JPS59107346A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007107636A (ja) * 2005-10-14 2007-04-26 Jtekt Corp クランクプーリ装置
JP2007107633A (ja) * 2005-10-14 2007-04-26 Jtekt Corp オルタネータ用プーリ装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007107636A (ja) * 2005-10-14 2007-04-26 Jtekt Corp クランクプーリ装置
JP2007107633A (ja) * 2005-10-14 2007-04-26 Jtekt Corp オルタネータ用プーリ装置

Also Published As

Publication number Publication date
JPH0153770B2 (enExample) 1989-11-15

Similar Documents

Publication Publication Date Title
JP2826940B2 (ja) ｉ線露光用感光性組成物
JPS606368B2 (ja) 感光性ポリイミド前駆体
JPS59108031A (ja) 感光性ポリイミド
JPH04288365A (ja) 感光性重合体材料
JPS60233646A (ja) レリ−フ構造体の製造方法
JP2826979B2 (ja) ｉ線用感光性組成物
JPH0876376A (ja) 感光性樹脂組成物及びそれを用いるパターン化されたポリイミド皮膜の形成方法
JPS62184056A (ja) 感光性組成物
JP4399949B2 (ja) 感光性樹脂組成物、パターンの製造法及び電子部品
JPS61167941A (ja) 高感度ポリアミドエステルホトレジスト組成物
JPH03186847A (ja) 感光性樹脂組成物
JPH0219943B2 (enExample)
JPH11125909A (ja) 感光性樹脂組成物、その硬化物及び半導体装置
JP2826978B2 (ja) ｉ線露光用組成物
JPH0153770B2 (enExample)
JPS62215264A (ja) 新しい感光性組成物
JPH08337652A (ja) ポリイミド前駆体、その製造法、ポリイミド、その製造法、感光性樹脂組成物、ポリイミドパターンの製造法及び半導体素子の製造法
JPS59212833A (ja) 感光性耐熱材料
JPH03274557A (ja) 感光性樹脂組成物及びパターン形成方法
JPH04337380A (ja) 耐熱感光性ポリイミド接着剤
JPH05224419A (ja) ポリイミド微細パターンの形成方法
JPH10158397A (ja) ポリイミド前駆体、その製造法、ポリイミド、その製造法、感光性樹脂組成物
JPH11231531A (ja) 感光性樹脂組成物、パターン製造法及び半導体装置
JPS61170731A (ja) 耐熱性フオトレジストフイルム
JPH0153969B2 (enExample)