JPH0153349B2 - - Google Patents

Info

Publication number
JPH0153349B2
JPH0153349B2 JP57180282A JP18028282A JPH0153349B2 JP H0153349 B2 JPH0153349 B2 JP H0153349B2 JP 57180282 A JP57180282 A JP 57180282A JP 18028282 A JP18028282 A JP 18028282A JP H0153349 B2 JPH0153349 B2 JP H0153349B2
Authority
JP
Japan
Prior art keywords
electron beam
deposited
vapor deposition
film
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57180282A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5970769A (ja
Inventor
Yasuo Konishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Home Electronics Ltd
Original Assignee
NEC Home Electronics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Home Electronics Ltd filed Critical NEC Home Electronics Ltd
Priority to JP57180282A priority Critical patent/JPS5970769A/ja
Publication of JPS5970769A publication Critical patent/JPS5970769A/ja
Publication of JPH0153349B2 publication Critical patent/JPH0153349B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Physical Vapour Deposition (AREA)
JP57180282A 1982-10-13 1982-10-13 蒸着方法 Granted JPS5970769A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57180282A JPS5970769A (ja) 1982-10-13 1982-10-13 蒸着方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57180282A JPS5970769A (ja) 1982-10-13 1982-10-13 蒸着方法

Publications (2)

Publication Number Publication Date
JPS5970769A JPS5970769A (ja) 1984-04-21
JPH0153349B2 true JPH0153349B2 (enrdf_load_stackoverflow) 1989-11-14

Family

ID=16080486

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57180282A Granted JPS5970769A (ja) 1982-10-13 1982-10-13 蒸着方法

Country Status (1)

Country Link
JP (1) JPS5970769A (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR910004557B1 (ko) * 1986-08-12 1991-07-06 미쯔비시지도오샤 고오교오 가부시기가이샤 가스침탄방법 및 장치
KR102319130B1 (ko) * 2020-03-11 2021-10-29 티오에스주식회사 가변 온도조절 장치를 구비한 금속-산화물 전자빔 증발원

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5548832A (en) * 1978-10-04 1980-04-08 Matsushita Electric Ind Co Ltd Magnetic recording and reproducing unit of rotary head type
JPS5622172Y2 (enrdf_load_stackoverflow) * 1978-11-27 1981-05-25
JPS55139630A (en) * 1979-04-16 1980-10-31 Sony Corp Supporter for magnetic head
JPS5928363Y2 (ja) * 1979-05-17 1984-08-16 オリンパス光学工業株式会社 超音波顕微鏡の走査装置
JPS5774657A (en) * 1980-08-30 1982-05-10 Olympus Optical Co Ltd Ultrasonic microscope device

Also Published As

Publication number Publication date
JPS5970769A (ja) 1984-04-21

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