JPH0148532B2 - - Google Patents

Info

Publication number
JPH0148532B2
JPH0148532B2 JP6575982A JP6575982A JPH0148532B2 JP H0148532 B2 JPH0148532 B2 JP H0148532B2 JP 6575982 A JP6575982 A JP 6575982A JP 6575982 A JP6575982 A JP 6575982A JP H0148532 B2 JPH0148532 B2 JP H0148532B2
Authority
JP
Japan
Prior art keywords
alkali
photosensitive composition
naphthoquinonediazide
group
ratio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6575982A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58182632A (ja
Inventor
Yukihiro Hosaka
Yoichi Kamoshita
Yoshuki Harita
Toko Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP6575982A priority Critical patent/JPS58182632A/ja
Priority to US06/484,312 priority patent/US4499171A/en
Priority to EP83302258A priority patent/EP0092444B1/en
Priority to DE8383302258T priority patent/DE3381834D1/de
Publication of JPS58182632A publication Critical patent/JPS58182632A/ja
Publication of JPH0148532B2 publication Critical patent/JPH0148532B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP6575982A 1982-04-20 1982-04-20 ポジ型感光性樹脂組成物 Granted JPS58182632A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP6575982A JPS58182632A (ja) 1982-04-20 1982-04-20 ポジ型感光性樹脂組成物
US06/484,312 US4499171A (en) 1982-04-20 1983-04-12 Positive type photosensitive resin composition with at least two o-quinone diazides
EP83302258A EP0092444B1 (en) 1982-04-20 1983-04-20 Positive type photosensitive resin composition
DE8383302258T DE3381834D1 (de) 1982-04-20 1983-04-20 Zusammensetzung von photoempfindlichem harz des positivtyps.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6575982A JPS58182632A (ja) 1982-04-20 1982-04-20 ポジ型感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS58182632A JPS58182632A (ja) 1983-10-25
JPH0148532B2 true JPH0148532B2 (en, 2012) 1989-10-19

Family

ID=13296273

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6575982A Granted JPS58182632A (ja) 1982-04-20 1982-04-20 ポジ型感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS58182632A (en, 2012)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0648381B2 (ja) * 1984-01-26 1994-06-22 三菱化成株式会社 ポジ型フオトレジスト組成物
JPS60164740A (ja) * 1984-02-06 1985-08-27 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS60189739A (ja) * 1984-03-09 1985-09-27 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
ATE45228T1 (de) * 1985-10-25 1989-08-15 Hoechst Celanese Corp Verfahren zur herstellung eines positiv arbeitenden photoresists.
JPS63161449A (ja) * 1986-12-24 1988-07-05 Sumitomo Chem Co Ltd 高コントラストなフオトレジスト組成物
JPH02110462A (ja) * 1988-06-21 1990-04-23 Mitsubishi Kasei Corp ポジ型フォトレジスト
JPH0656488B2 (ja) * 1990-05-01 1994-07-27 日本合成ゴム株式会社 ポジ型感光性樹脂組成物
JP2626467B2 (ja) * 1993-04-30 1997-07-02 日本合成ゴム株式会社 １，２−キノンジアジドスルホン酸エステルの製造方法
JP2626468B2 (ja) * 1993-04-30 1997-07-02 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物
KR101430962B1 (ko) * 2008-03-04 2014-08-18 주식회사 동진쎄미켐 포토레지스트 조성물 및 이를 이용한 어레이 기판의 제조방법

Also Published As

Publication number Publication date
JPS58182632A (ja) 1983-10-25

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