JPH0322618B2 - - Google Patents

Info

Publication number
JPH0322618B2
JPH0322618B2 JP58133108A JP13310883A JPH0322618B2 JP H0322618 B2 JPH0322618 B2 JP H0322618B2 JP 58133108 A JP58133108 A JP 58133108A JP 13310883 A JP13310883 A JP 13310883A JP H0322618 B2 JPH0322618 B2 JP H0322618B2
Authority
JP
Japan
Prior art keywords
naphthoquinonediazide
sulfonic acid
organic solvent
photosensitive resin
quinonediazide compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58133108A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6024545A (ja
Inventor
Yukihiro Hosaka
Yoichi Kamoshita
Shinichi Kawamura
Yoshuki Harita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP13310883A priority Critical patent/JPS6024545A/ja
Publication of JPS6024545A publication Critical patent/JPS6024545A/ja
Publication of JPH0322618B2 publication Critical patent/JPH0322618B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP13310883A 1983-07-21 1983-07-21 ポジ型感光性樹脂組成物 Granted JPS6024545A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13310883A JPS6024545A (ja) 1983-07-21 1983-07-21 ポジ型感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13310883A JPS6024545A (ja) 1983-07-21 1983-07-21 ポジ型感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS6024545A JPS6024545A (ja) 1985-02-07
JPH0322618B2 true JPH0322618B2 (en, 2012) 1991-03-27

Family

ID=15096997

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13310883A Granted JPS6024545A (ja) 1983-07-21 1983-07-21 ポジ型感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS6024545A (en, 2012)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61267043A (ja) * 1985-05-21 1986-11-26 Konishiroku Photo Ind Co Ltd 感光性平版印刷版
JPS62123444A (ja) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
ATE45228T1 (de) * 1985-10-25 1989-08-15 Hoechst Celanese Corp Verfahren zur herstellung eines positiv arbeitenden photoresists.
JPH01293340A (ja) * 1988-05-20 1989-11-27 Japan Synthetic Rubber Co Ltd 感放射線性樹脂組成物
US5063138A (en) * 1988-11-10 1991-11-05 Ocg Microelectronic Materials, Inc. Positive-working photoresist process employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent during photoresist coating
US4965167A (en) * 1988-11-10 1990-10-23 Olin Hunt Specialty Products, Inc. Positive-working photoresist employing a selected mixture of ethyl lactate and ethyl 3-ethoxy propionate as casting solvent
JP2584311B2 (ja) * 1989-03-20 1997-02-26 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP3064595B2 (ja) 1991-04-26 2000-07-12 住友化学工業株式会社 ポジ型レジスト組成物
US5458921A (en) * 1994-10-11 1995-10-17 Morton International, Inc. Solvent system for forming films of photoimageable compositions
US7214455B2 (en) 2002-05-29 2007-05-08 Toray Industries, Inc. Photosensitive resin composition and process for producing heat-resistant resin film
KR20040092550A (ko) * 2003-04-24 2004-11-04 클라리언트 인터내셔널 리미티드 레지스트 조성물 및 레지스트 제거용 유기용제
CN100565310C (zh) 2005-02-02 2009-12-02 可隆株式会社 制备显示器用阵列板的方法
JP4699482B2 (ja) * 2005-02-02 2011-06-08 コーロン インダストリーズ インク ポジティブ型ドライフィルムフォトレジストの製造方法
JP5132240B2 (ja) * 2007-10-12 2013-01-30 旭化成イーマテリアルズ株式会社 ポジ型感光性樹脂組成物
WO2010047264A1 (ja) * 2008-10-20 2010-04-29 住友ベークライト株式会社 スプレー塗布用ポジ型感光性樹脂組成物及びそれを用いた貫通電極の製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3699135A (en) * 1969-08-18 1972-10-17 Eastman Kodak Co Organosilicon polymeric dyes
BE757067A (fr) * 1969-10-03 1971-03-16 Eastman Kodak Co Procede de fabrication d'objets par voie photographique
JPS5128001A (en) * 1974-08-29 1976-03-09 Polychrome Corp Kizaijono kankohifuku oyobi sonoseizoho
JPS55129341A (en) * 1979-03-29 1980-10-07 Daicel Chem Ind Ltd Photosensitive covering composition
JPS56140342A (en) * 1980-04-02 1981-11-02 Tokyo Ohka Kogyo Co Ltd Image forming composition and formation of resist image
DE3022473A1 (de) * 1980-06-14 1981-12-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
DE3107109A1 (de) * 1981-02-26 1982-09-09 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes kopiermaterial
DE3151078A1 (de) * 1981-12-23 1983-07-28 Hoechst Ag, 6230 Frankfurt Verfahren zur herstellung von reliefbildern
US4526856A (en) * 1983-05-23 1985-07-02 Allied Corporation Low striation positive diazoketone resist composition with cyclic ketone(s) and aliphatic alcohol as solvents

Also Published As

Publication number Publication date
JPS6024545A (ja) 1985-02-07

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