JPH0588466B2 - - Google Patents

Info

Publication number
JPH0588466B2
JPH0588466B2 JP60060815A JP6081585A JPH0588466B2 JP H0588466 B2 JPH0588466 B2 JP H0588466B2 JP 60060815 A JP60060815 A JP 60060815A JP 6081585 A JP6081585 A JP 6081585A JP H0588466 B2 JPH0588466 B2 JP H0588466B2
Authority
JP
Japan
Prior art keywords
radiation
acid
compound
naphthoquinonediazide
sensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60060815A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61219951A (ja
Inventor
Yoichi Kamoshita
Mitsunobu Koshiba
Takao Miura
Yoshuki Harita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP6081585A priority Critical patent/JPS61219951A/ja
Publication of JPS61219951A publication Critical patent/JPS61219951A/ja
Publication of JPH0588466B2 publication Critical patent/JPH0588466B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP6081585A 1985-03-27 1985-03-27 ポジ型感放射線性組成物 Granted JPS61219951A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6081585A JPS61219951A (ja) 1985-03-27 1985-03-27 ポジ型感放射線性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6081585A JPS61219951A (ja) 1985-03-27 1985-03-27 ポジ型感放射線性組成物

Publications (2)

Publication Number Publication Date
JPS61219951A JPS61219951A (ja) 1986-09-30
JPH0588466B2 true JPH0588466B2 (en, 2012) 1993-12-22

Family

ID=13153222

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6081585A Granted JPS61219951A (ja) 1985-03-27 1985-03-27 ポジ型感放射線性組成物

Country Status (1)

Country Link
JP (1) JPS61219951A (en, 2012)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2594922B2 (ja) * 1986-11-05 1997-03-26 株式会社日立製作所 永久磁石界磁式電動機の運転方法
TW546540B (en) 1997-04-30 2003-08-11 Wako Pure Chem Ind Ltd An agent for reducing the substrate dependence of resist and a resist composition
US6881840B2 (en) 2002-02-08 2005-04-19 Eastman Kodak Company Benzothiazine dyes for imaging elements
US6558888B1 (en) * 2002-02-08 2003-05-06 Eastman Kodak Company Imaging materials containing novel benzothiazine dyes
WO2008078622A1 (ja) * 2006-12-27 2008-07-03 Konica Minolta Medical & Graphic, Inc. ポジ型平版印刷版材料及びそれを用いた平版印刷版の作製方法
JP2012073612A (ja) 2010-09-14 2012-04-12 Rohm & Haas Electronic Materials Llc マルチアミド成分を含むフォトレジスト

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5619619B2 (en, 2012) * 1973-07-27 1981-05-08
JPS5590943A (en) * 1978-12-28 1980-07-10 Fuji Photo Film Co Ltd Photosensitive material and image forming method applicable thereto
JPS5747875A (en) * 1980-09-02 1982-03-18 Matsushita Electric Ind Co Ltd Resist composition
JPS58149042A (ja) * 1982-03-02 1983-09-05 Tokyo Ohka Kogyo Co Ltd ポジ型感光性組成物
JPS58182633A (ja) * 1982-04-19 1983-10-25 Tokyo Ohka Kogyo Co Ltd ポジ型画像の形成方法

Also Published As

Publication number Publication date
JPS61219951A (ja) 1986-09-30

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