JPS61219951A - ポジ型感放射線性組成物 - Google Patents

ポジ型感放射線性組成物

Info

Publication number
JPS61219951A
JPS61219951A JP6081585A JP6081585A JPS61219951A JP S61219951 A JPS61219951 A JP S61219951A JP 6081585 A JP6081585 A JP 6081585A JP 6081585 A JP6081585 A JP 6081585A JP S61219951 A JPS61219951 A JP S61219951A
Authority
JP
Japan
Prior art keywords
naphthoquinonediazide
sulfonic acid
quinonediazide
sensitive composition
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6081585A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0588466B2 (en, 2012
Inventor
Yoichi Kamoshita
鴨志田 洋一
Mitsunobu Koshiba
小柴 満信
Takao Miura
孝夫 三浦
Yoshiyuki Harita
榛田 善行
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP6081585A priority Critical patent/JPS61219951A/ja
Publication of JPS61219951A publication Critical patent/JPS61219951A/ja
Publication of JPH0588466B2 publication Critical patent/JPH0588466B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/0226Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP6081585A 1985-03-27 1985-03-27 ポジ型感放射線性組成物 Granted JPS61219951A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6081585A JPS61219951A (ja) 1985-03-27 1985-03-27 ポジ型感放射線性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6081585A JPS61219951A (ja) 1985-03-27 1985-03-27 ポジ型感放射線性組成物

Publications (2)

Publication Number Publication Date
JPS61219951A true JPS61219951A (ja) 1986-09-30
JPH0588466B2 JPH0588466B2 (en, 2012) 1993-12-22

Family

ID=13153222

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6081585A Granted JPS61219951A (ja) 1985-03-27 1985-03-27 ポジ型感放射線性組成物

Country Status (1)

Country Link
JP (1) JPS61219951A (en, 2012)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4823037A (en) * 1986-11-05 1989-04-18 Hitachi, Ltd. DC Electric motor having field poles of permanent magnet
EP0875787A1 (en) * 1997-04-30 1998-11-04 Wako Pure Chemical Industries, Ltd. Method for reducing the substrate dependence of resist
EP1335243A1 (en) * 2002-02-08 2003-08-13 Eastman Kodak Company Imaging materials containing benzothiazine dyes
EP1334999A3 (en) * 2002-02-08 2004-02-18 Eastman Kodak Company Polymethine and azomethine dyes for imaging elements
WO2008078622A1 (ja) * 2006-12-27 2008-07-03 Konica Minolta Medical & Graphic, Inc. ポジ型平版印刷版材料及びそれを用いた平版印刷版の作製方法
EP2428842A1 (en) 2010-09-14 2012-03-14 Rohm and Haas Electronic Materials LLC Photoresists comprising multi-amide component

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036203A (en, 2012) * 1973-07-27 1975-04-05
JPS5590943A (en) * 1978-12-28 1980-07-10 Fuji Photo Film Co Ltd Photosensitive material and image forming method applicable thereto
JPS5747875A (en) * 1980-09-02 1982-03-18 Matsushita Electric Ind Co Ltd Resist composition
JPS58149042A (ja) * 1982-03-02 1983-09-05 Tokyo Ohka Kogyo Co Ltd ポジ型感光性組成物
JPS58182633A (ja) * 1982-04-19 1983-10-25 Tokyo Ohka Kogyo Co Ltd ポジ型画像の形成方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036203A (en, 2012) * 1973-07-27 1975-04-05
JPS5590943A (en) * 1978-12-28 1980-07-10 Fuji Photo Film Co Ltd Photosensitive material and image forming method applicable thereto
JPS5747875A (en) * 1980-09-02 1982-03-18 Matsushita Electric Ind Co Ltd Resist composition
JPS58149042A (ja) * 1982-03-02 1983-09-05 Tokyo Ohka Kogyo Co Ltd ポジ型感光性組成物
JPS58182633A (ja) * 1982-04-19 1983-10-25 Tokyo Ohka Kogyo Co Ltd ポジ型画像の形成方法

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4823037A (en) * 1986-11-05 1989-04-18 Hitachi, Ltd. DC Electric motor having field poles of permanent magnet
EP0875787A1 (en) * 1997-04-30 1998-11-04 Wako Pure Chemical Industries, Ltd. Method for reducing the substrate dependence of resist
US6303264B1 (en) 1997-04-30 2001-10-16 Wako Pure Chemical Industries, Ltd Agent for reducing the substrate dependence of resist
EP1335243A1 (en) * 2002-02-08 2003-08-13 Eastman Kodak Company Imaging materials containing benzothiazine dyes
EP1334999A3 (en) * 2002-02-08 2004-02-18 Eastman Kodak Company Polymethine and azomethine dyes for imaging elements
US6881840B2 (en) 2002-02-08 2005-04-19 Eastman Kodak Company Benzothiazine dyes for imaging elements
WO2008078622A1 (ja) * 2006-12-27 2008-07-03 Konica Minolta Medical & Graphic, Inc. ポジ型平版印刷版材料及びそれを用いた平版印刷版の作製方法
EP2428842A1 (en) 2010-09-14 2012-03-14 Rohm and Haas Electronic Materials LLC Photoresists comprising multi-amide component

Also Published As

Publication number Publication date
JPH0588466B2 (en, 2012) 1993-12-22

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