JPH0342656B2 - - Google Patents
Info
- Publication number
- JPH0342656B2 JPH0342656B2 JP59018287A JP1828784A JPH0342656B2 JP H0342656 B2 JPH0342656 B2 JP H0342656B2 JP 59018287 A JP59018287 A JP 59018287A JP 1828784 A JP1828784 A JP 1828784A JP H0342656 B2 JPH0342656 B2 JP H0342656B2
- Authority
- JP
- Japan
- Prior art keywords
- sulfonic acid
- naphthoquinonediazide
- quinonediazide
- sulfonyl chloride
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1828784A JPS60163043A (ja) | 1984-02-06 | 1984-02-06 | ポジ型感光性樹脂組成物 |
EP85300184A EP0148787A3 (en) | 1984-01-10 | 1985-01-10 | Positive type photosensitive resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1828784A JPS60163043A (ja) | 1984-02-06 | 1984-02-06 | ポジ型感光性樹脂組成物 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60163043A JPS60163043A (ja) | 1985-08-24 |
JPH0342656B2 true JPH0342656B2 (en, 2012) | 1991-06-27 |
Family
ID=11967407
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1828784A Granted JPS60163043A (ja) | 1984-01-10 | 1984-02-06 | ポジ型感光性樹脂組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60163043A (en, 2012) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0654381B2 (ja) * | 1985-12-24 | 1994-07-20 | 日本合成ゴム株式会社 | 集積回路作製用ポジ型レジスト |
JPS62191848A (ja) * | 1986-02-17 | 1987-08-22 | Nec Corp | ポジレジスト材料 |
JPS62280843A (ja) * | 1986-05-30 | 1987-12-05 | Nec Corp | 感光剤 |
JP2639853B2 (ja) * | 1990-05-18 | 1997-08-13 | 富士写真フイルム株式会社 | 新規キノンジアジド化合物及びそれを含有する感光性組成物 |
JP2944296B2 (ja) | 1992-04-06 | 1999-08-30 | 富士写真フイルム株式会社 | 感光性平版印刷版の製造方法 |
JP3503839B2 (ja) | 1994-05-25 | 2004-03-08 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
JP3278306B2 (ja) | 1994-10-31 | 2002-04-30 | 富士写真フイルム株式会社 | ポジ型フォトレジスト組成物 |
JP4588551B2 (ja) * | 2005-06-16 | 2010-12-01 | 富士通株式会社 | レジスト組成物、レジストパターンの形成方法、半導体装置及びその製造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL254616A (en, 2012) * | 1959-08-05 | |||
DE2547905C2 (de) * | 1975-10-25 | 1985-11-21 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Aufzeichnungsmaterial |
-
1984
- 1984-02-06 JP JP1828784A patent/JPS60163043A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60163043A (ja) | 1985-08-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |