JPH0342656B2 - - Google Patents

Info

Publication number
JPH0342656B2
JPH0342656B2 JP59018287A JP1828784A JPH0342656B2 JP H0342656 B2 JPH0342656 B2 JP H0342656B2 JP 59018287 A JP59018287 A JP 59018287A JP 1828784 A JP1828784 A JP 1828784A JP H0342656 B2 JPH0342656 B2 JP H0342656B2
Authority
JP
Japan
Prior art keywords
sulfonic acid
naphthoquinonediazide
quinonediazide
sulfonyl chloride
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59018287A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60163043A (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1828784A priority Critical patent/JPS60163043A/ja
Priority to EP85300184A priority patent/EP0148787A3/en
Publication of JPS60163043A publication Critical patent/JPS60163043A/ja
Publication of JPH0342656B2 publication Critical patent/JPH0342656B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP1828784A 1984-01-10 1984-02-06 ポジ型感光性樹脂組成物 Granted JPS60163043A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1828784A JPS60163043A (ja) 1984-02-06 1984-02-06 ポジ型感光性樹脂組成物
EP85300184A EP0148787A3 (en) 1984-01-10 1985-01-10 Positive type photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1828784A JPS60163043A (ja) 1984-02-06 1984-02-06 ポジ型感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS60163043A JPS60163043A (ja) 1985-08-24
JPH0342656B2 true JPH0342656B2 (en, 2012) 1991-06-27

Family

ID=11967407

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1828784A Granted JPS60163043A (ja) 1984-01-10 1984-02-06 ポジ型感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS60163043A (en, 2012)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0654381B2 (ja) * 1985-12-24 1994-07-20 日本合成ゴム株式会社 集積回路作製用ポジ型レジスト
JPS62191848A (ja) * 1986-02-17 1987-08-22 Nec Corp ポジレジスト材料
JPS62280843A (ja) * 1986-05-30 1987-12-05 Nec Corp 感光剤
JP2639853B2 (ja) * 1990-05-18 1997-08-13 富士写真フイルム株式会社 新規キノンジアジド化合物及びそれを含有する感光性組成物
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JP3503839B2 (ja) 1994-05-25 2004-03-08 富士写真フイルム株式会社 ポジ型感光性組成物
JP3278306B2 (ja) 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
JP4588551B2 (ja) * 2005-06-16 2010-12-01 富士通株式会社 レジスト組成物、レジストパターンの形成方法、半導体装置及びその製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL254616A (en, 2012) * 1959-08-05
DE2547905C2 (de) * 1975-10-25 1985-11-21 Hoechst Ag, 6230 Frankfurt Lichtempfindliches Aufzeichnungsmaterial

Also Published As

Publication number Publication date
JPS60163043A (ja) 1985-08-24

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term