JPS60163043A - ポジ型感光性樹脂組成物 - Google Patents

ポジ型感光性樹脂組成物

Info

Publication number
JPS60163043A
JPS60163043A JP1828784A JP1828784A JPS60163043A JP S60163043 A JPS60163043 A JP S60163043A JP 1828784 A JP1828784 A JP 1828784A JP 1828784 A JP1828784 A JP 1828784A JP S60163043 A JPS60163043 A JP S60163043A
Authority
JP
Japan
Prior art keywords
naphthoquinonediazide
sulfonic acid
quinonediazide
hydroxyl group
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1828784A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0342656B2 (en, 2012
Inventor
Yukihiro Hosaka
幸宏 保坂
Takao Miura
孝夫 三浦
Yoshiyuki Harita
榛田　善行
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
JSR Corp
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd, Japan Synthetic Rubber Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP1828784A priority Critical patent/JPS60163043A/ja
Priority to EP85300184A priority patent/EP0148787A3/en
Publication of JPS60163043A publication Critical patent/JPS60163043A/ja
Publication of JPH0342656B2 publication Critical patent/JPH0342656B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP1828784A 1984-01-10 1984-02-06 ポジ型感光性樹脂組成物 Granted JPS60163043A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP1828784A JPS60163043A (ja) 1984-02-06 1984-02-06 ポジ型感光性樹脂組成物
EP85300184A EP0148787A3 (en) 1984-01-10 1985-01-10 Positive type photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1828784A JPS60163043A (ja) 1984-02-06 1984-02-06 ポジ型感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS60163043A true JPS60163043A (ja) 1985-08-24
JPH0342656B2 JPH0342656B2 (en, 2012) 1991-06-27

Family

ID=11967407

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1828784A Granted JPS60163043A (ja) 1984-01-10 1984-02-06 ポジ型感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS60163043A (en, 2012)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62150245A (ja) * 1985-12-24 1987-07-04 Japan Synthetic Rubber Co Ltd 集積回路作製用ポジ型レジスト
JPS62191848A (ja) * 1986-02-17 1987-08-22 Nec Corp ポジレジスト材料
JPS62280843A (ja) * 1986-05-30 1987-12-05 Nec Corp 感光剤
JPH0422955A (ja) * 1990-05-18 1992-01-27 Fuji Photo Film Co Ltd 新規キノンジアジド化合物及びそれを含有する感光性組成物
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
EP0684521A1 (en) 1994-05-25 1995-11-29 Fuji Photo Film Co., Ltd. Positive working photosensitive compositions
EP0710886A1 (en) 1994-10-31 1996-05-08 Fuji Photo Film Co., Ltd. Positive photoresist composition
JP2006350039A (ja) * 2005-06-16 2006-12-28 Fujitsu Ltd レジスト組成物、レジストパターンの形成方法、半導体装置及びその製造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3102809A (en) * 1959-08-05 1963-09-03 Azoplate Corp Naphthoquinone-(1,2)-diozides and printing plates made therewith
JPS5254503A (en) * 1975-10-25 1977-05-04 Hoechst Ag Photoosensitive copying material

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3102809A (en) * 1959-08-05 1963-09-03 Azoplate Corp Naphthoquinone-(1,2)-diozides and printing plates made therewith
JPS5254503A (en) * 1975-10-25 1977-05-04 Hoechst Ag Photoosensitive copying material

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62150245A (ja) * 1985-12-24 1987-07-04 Japan Synthetic Rubber Co Ltd 集積回路作製用ポジ型レジスト
JPS62191848A (ja) * 1986-02-17 1987-08-22 Nec Corp ポジレジスト材料
JPS62280843A (ja) * 1986-05-30 1987-12-05 Nec Corp 感光剤
JPH0422955A (ja) * 1990-05-18 1992-01-27 Fuji Photo Film Co Ltd 新規キノンジアジド化合物及びそれを含有する感光性組成物
EP0565006A2 (en) 1992-04-06 1993-10-13 Fuji Photo Film Co., Ltd. Method for preparing PS plate
EP0684521A1 (en) 1994-05-25 1995-11-29 Fuji Photo Film Co., Ltd. Positive working photosensitive compositions
EP0710886A1 (en) 1994-10-31 1996-05-08 Fuji Photo Film Co., Ltd. Positive photoresist composition
JP2006350039A (ja) * 2005-06-16 2006-12-28 Fujitsu Ltd レジスト組成物、レジストパターンの形成方法、半導体装置及びその製造方法

Also Published As

Publication number Publication date
JPH0342656B2 (en, 2012) 1991-06-27

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term