JPH0583543B2 - - Google Patents

Info

Publication number
JPH0583543B2
JPH0583543B2 JP61016892A JP1689286A JPH0583543B2 JP H0583543 B2 JPH0583543 B2 JP H0583543B2 JP 61016892 A JP61016892 A JP 61016892A JP 1689286 A JP1689286 A JP 1689286A JP H0583543 B2 JPH0583543 B2 JP H0583543B2
Authority
JP
Japan
Prior art keywords
agent
compound
acid chloride
quinone
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61016892A
Other languages
English (en)
Japanese (ja)
Other versions
JPS62178562A (ja
Inventor
Yukihiro Hosaka
Ikuo Nozue
Hitoshi Oka
Yoshuki Harita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP1689286A priority Critical patent/JPS62178562A/ja
Publication of JPS62178562A publication Critical patent/JPS62178562A/ja
Publication of JPH0583543B2 publication Critical patent/JPH0583543B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Pyrane Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP1689286A 1986-01-30 1986-01-30 １，２−キノンジアジド化合物の製造方法 Granted JPS62178562A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1689286A JPS62178562A (ja) 1986-01-30 1986-01-30 １，２−キノンジアジド化合物の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1689286A JPS62178562A (ja) 1986-01-30 1986-01-30 １，２−キノンジアジド化合物の製造方法

Publications (2)

Publication Number Publication Date
JPS62178562A JPS62178562A (ja) 1987-08-05
JPH0583543B2 true JPH0583543B2 (en, 2012) 1993-11-26

Family

ID=11928808

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1689286A Granted JPS62178562A (ja) 1986-01-30 1986-01-30 １，２−キノンジアジド化合物の製造方法

Country Status (1)

Country Link
JP (1) JPS62178562A (en, 2012)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2568827B2 (ja) * 1986-10-29 1997-01-08 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2569650B2 (ja) * 1987-12-15 1997-01-08 日本合成ゴム株式会社 感放射線性樹脂組成物
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JP3278306B2 (ja) 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
PL3542780T3 (pl) * 2008-07-21 2022-05-02 Unigen, Inc. Szereg związków wybielających (rozjaśniających)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3040157A1 (de) * 1980-10-24 1982-06-03 Hoechst Ag, 6000 Frankfurt Lichtemopfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial
DE3043967A1 (de) * 1980-11-21 1982-06-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch auf basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial
DE3421471A1 (de) * 1984-06-08 1985-12-12 Hoechst Ag, 6230 Frankfurt Perfluoralkylgruppen aufweisende 1,2-naphthochinondiazidverbindungen und reproduktionsmaterialien, die diese verbindungen enthalten

Also Published As

Publication number Publication date
JPS62178562A (ja) 1987-08-05

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term