JPH0251499B2 - - Google Patents

Info

Publication number
JPH0251499B2
JPH0251499B2 JP59019728A JP1972884A JPH0251499B2 JP H0251499 B2 JPH0251499 B2 JP H0251499B2 JP 59019728 A JP59019728 A JP 59019728A JP 1972884 A JP1972884 A JP 1972884A JP H0251499 B2 JPH0251499 B2 JP H0251499B2
Authority
JP
Japan
Prior art keywords
sulfonic acid
cresol
naphthoquinonediazide
acid ester
xylenol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59019728A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60164740A (ja
Inventor
Yukihiro Hosaka
Takao Miura
Yoshuki Harita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP1972884A priority Critical patent/JPS60164740A/ja
Publication of JPS60164740A publication Critical patent/JPS60164740A/ja
Publication of JPH0251499B2 publication Critical patent/JPH0251499B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
JP1972884A 1984-02-06 1984-02-06 ポジ型感光性樹脂組成物 Granted JPS60164740A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1972884A JPS60164740A (ja) 1984-02-06 1984-02-06 ポジ型感光性樹脂組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1972884A JPS60164740A (ja) 1984-02-06 1984-02-06 ポジ型感光性樹脂組成物

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2115406A Division JPH0656488B2 (ja) 1990-05-01 1990-05-01 ポジ型感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS60164740A JPS60164740A (ja) 1985-08-27
JPH0251499B2 true JPH0251499B2 (en, 2012) 1990-11-07

Family

ID=12007370

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1972884A Granted JPS60164740A (ja) 1984-02-06 1984-02-06 ポジ型感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPS60164740A (en, 2012)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61185741A (ja) * 1985-02-13 1986-08-19 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
DE3686032T2 (de) * 1985-12-27 1993-02-18 Japan Synthetic Rubber Co Ltd Strahlungsempfindliche positiv arbeitende kunststoffzusammensetzung.
JPH0654385B2 (ja) * 1986-01-27 1994-07-20 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物
JPH0654388B2 (ja) * 1986-05-02 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
DE3724791A1 (de) * 1987-07-27 1989-02-09 Merck Patent Gmbh Positiv-fotoresist-zusammensetzungen
JP2693472B2 (ja) * 1987-11-26 1997-12-24 株式会社東芝 レジスト
US5753406A (en) * 1988-10-18 1998-05-19 Japan Synthetic Rubber Co., Ltd. Radiation-sensitive resin composition
JPH0354565A (ja) * 1989-07-24 1991-03-08 Japan Synthetic Rubber Co Ltd パターン形成方法
US5324620A (en) * 1989-09-08 1994-06-28 Ocg Microeletronic Materials, Inc. Radiation-sensitive compositions containing novolak polymers made from four phenolic derivatives and an aldehyde
US5322757A (en) * 1989-09-08 1994-06-21 Ocg Microelectronic Materials, Inc. Positive photoresists comprising a novolak resin made from 2,3-dimethyl phenol,2,3,5-trimethylphenol and aldehyde with no meta-cresol present
DE69032744T2 (de) * 1989-09-08 1999-06-02 Olin Microelectronic Chemicals, Inc., Norwalk, Conn. Vollständig substituierte novalak-polymere enthaltende strahlungsempfindliche zusammensetzungen
US5346799A (en) * 1991-12-23 1994-09-13 Ocg Microelectronic Materials, Inc. Novolak resins and their use in radiation-sensitive compositions wherein the novolak resins are made by condensing 2,6-dimethylphenol, 2,3-dimethylphenol, a para-substituted phenol and an aldehyde
JP3562673B2 (ja) 1996-01-22 2004-09-08 富士写真フイルム株式会社 ポジ型フォトレジスト組成物

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2870192A (en) * 1957-12-30 1959-01-20 Koppers Co Inc Tricresylphosphate process
GB1146173A (en) * 1966-06-18 1969-03-19 Geigy Uk Ltd Production of triaryl phosphates
JPS5316290A (en) * 1976-07-28 1978-02-15 Hitachi Ltd Safety device for escalator
US4397937A (en) * 1982-02-10 1983-08-09 International Business Machines Corporation Positive resist compositions
JPS58150948A (ja) * 1982-03-03 1983-09-07 Dainippon Ink & Chem Inc 感光性組成物
JPS58182632A (ja) * 1982-04-20 1983-10-25 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS5984238A (ja) * 1982-11-08 1984-05-15 Fuji Photo Film Co Ltd 感光性組成物

Also Published As

Publication number Publication date
JPS60164740A (ja) 1985-08-27

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term