JPH0142132B2 - - Google Patents

Info

Publication number
JPH0142132B2
JPH0142132B2 JP56054429A JP5442981A JPH0142132B2 JP H0142132 B2 JPH0142132 B2 JP H0142132B2 JP 56054429 A JP56054429 A JP 56054429A JP 5442981 A JP5442981 A JP 5442981A JP H0142132 B2 JPH0142132 B2 JP H0142132B2
Authority
JP
Japan
Prior art keywords
mask
wafer
rays
atmosphere
atmosphere chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56054429A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57169242A (en
Inventor
Motoya Taniguchi
Minoru Ikeda
Nobuyuki Akyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56054429A priority Critical patent/JPS57169242A/ja
Priority to US06/367,996 priority patent/US4403336A/en
Publication of JPS57169242A publication Critical patent/JPS57169242A/ja
Publication of JPH0142132B2 publication Critical patent/JPH0142132B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP56054429A 1981-04-13 1981-04-13 X-ray transferring device Granted JPS57169242A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP56054429A JPS57169242A (en) 1981-04-13 1981-04-13 X-ray transferring device
US06/367,996 US4403336A (en) 1981-04-13 1982-04-13 X-Ray exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56054429A JPS57169242A (en) 1981-04-13 1981-04-13 X-ray transferring device

Publications (2)

Publication Number Publication Date
JPS57169242A JPS57169242A (en) 1982-10-18
JPH0142132B2 true JPH0142132B2 (enExample) 1989-09-11

Family

ID=12970468

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56054429A Granted JPS57169242A (en) 1981-04-13 1981-04-13 X-ray transferring device

Country Status (2)

Country Link
US (1) US4403336A (enExample)
JP (1) JPS57169242A (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59101833A (ja) * 1982-12-03 1984-06-12 Hitachi Ltd Ｘ線露光装置
EP0121969A3 (en) * 1983-03-15 1988-01-20 Micronix Partners Lithography system
US4516253A (en) * 1983-03-15 1985-05-07 Micronix Partners Lithography system
US4514858A (en) * 1983-03-15 1985-04-30 Micronix Partners Lithography system
US4525852A (en) * 1983-03-15 1985-06-25 Micronix Partners Alignment apparatus
JPS61161719A (ja) * 1985-01-11 1986-07-22 Canon Inc 露光装置
JPS60154527A (ja) * 1984-01-24 1985-08-14 Canon Inc 露光装置
JPS60178627A (ja) * 1984-02-24 1985-09-12 Canon Inc Ｘ線転写装置
JPS60198726A (ja) * 1984-03-23 1985-10-08 Hitachi Ltd Ｘ線露光装置の露光量調整方法と装置
JPS6167917A (ja) * 1984-09-11 1986-04-08 Nippon Telegr & Teleph Corp <Ntt> Ｘ線取り出し筒
JPS6197918A (ja) * 1984-10-19 1986-05-16 Hitachi Ltd Ｘ線露光装置
JPS62237727A (ja) * 1986-04-09 1987-10-17 Hitachi Ltd Ｘ線露光装置およびその方法
JPS63119233A (ja) * 1986-11-07 1988-05-23 Hitachi Ltd Ｘ線転写装置
US4803712A (en) * 1987-01-20 1989-02-07 Hitachi, Ltd. X-ray exposure system
EP0358521B1 (en) * 1988-09-09 1995-06-07 Canon Kabushiki Kaisha An exposure apparatus
JP2766935B2 (ja) * 1989-10-20 1998-06-18 キヤノン株式会社 Ｘ線露光装置
US7198619B2 (en) * 2002-03-26 2007-04-03 Ultradent Products, Inc. Valve syringe
US7052808B2 (en) * 2003-02-11 2006-05-30 Infineon Technologies Ag Transmission mask with differential attenuation to improve ISO-dense proximity
JP4829006B2 (ja) * 2005-05-17 2011-11-30 ウシオ電機株式会社 露光装置
US9316622B2 (en) * 2013-05-08 2016-04-19 Hamilton Sundstrand Corporation Microwave vibration sensors

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4119855A (en) * 1977-07-08 1978-10-10 Massachusetts Institute Of Technology Non vacuum soft x-ray lithographic source
US4185202A (en) * 1977-12-05 1980-01-22 Bell Telephone Laboratories, Incorporated X-ray lithography

Also Published As

Publication number Publication date
US4403336A (en) 1983-09-06
JPS57169242A (en) 1982-10-18

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