JPH01125530U - - Google Patents

Info

Publication number
JPH01125530U
JPH01125530U JP6257288U JP6257288U JPH01125530U JP H01125530 U JPH01125530 U JP H01125530U JP 6257288 U JP6257288 U JP 6257288U JP 6257288 U JP6257288 U JP 6257288U JP H01125530 U JPH01125530 U JP H01125530U
Authority
JP
Japan
Prior art keywords
flat plate
electrode
reaction chamber
electrodes
cvd apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6257288U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0351971Y2 (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988062572U priority Critical patent/JPH0351971Y2/ja
Publication of JPH01125530U publication Critical patent/JPH01125530U/ja
Application granted granted Critical
Publication of JPH0351971Y2 publication Critical patent/JPH0351971Y2/ja
Expired legal-status Critical Current

Links

JP1988062572U 1988-05-12 1988-05-12 Expired JPH0351971Y2 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988062572U JPH0351971Y2 (ko) 1988-05-12 1988-05-12

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988062572U JPH0351971Y2 (ko) 1988-05-12 1988-05-12

Publications (2)

Publication Number Publication Date
JPH01125530U true JPH01125530U (ko) 1989-08-28
JPH0351971Y2 JPH0351971Y2 (ko) 1991-11-08

Family

ID=31288175

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988062572U Expired JPH0351971Y2 (ko) 1988-05-12 1988-05-12

Country Status (1)

Country Link
JP (1) JPH0351971Y2 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002093716A (ja) * 2000-09-12 2002-03-29 Kobe Steel Ltd プラズマ表面処理装置

Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5265184A (en) * 1975-11-26 1977-05-30 Nippon Telegr & Teleph Corp <Ntt> Eqipment for simultaneous sputtering at both surface
US4116806A (en) * 1977-12-08 1978-09-26 Battelle Development Corporation Two-sided planar magnetron sputtering apparatus
JPS556410A (en) * 1978-06-26 1980-01-17 Hitachi Ltd Plasma gas phase reactor
JPS5527626A (en) * 1978-08-17 1980-02-27 Murata Manufacturing Co Electronic part magazine container
JPS5559727A (en) * 1978-10-27 1980-05-06 Hitachi Ltd Plasma deposition device
JPS5585673A (en) * 1978-12-20 1980-06-27 Advanced Coating Tech Cathode for sputtering
JPS5645761A (en) * 1979-09-25 1981-04-25 Mitsubishi Electric Corp Plasma reaction apparatus
JPS5664437A (en) * 1979-08-22 1981-06-01 Onera (Off Nat Aerospatiale) Method and device for chemically etching integrated circuit by dry process
JPS5681923A (en) * 1979-12-06 1981-07-04 Sumitomo Electric Ind Ltd Manufacture of thin film
EP0034706A2 (de) * 1980-02-08 1981-09-02 VEB Zentrum für Forschung und Technologie Mikroelektronik Verfahren und Vorrichtung zum Plasmaätzen oder zur Plasma CVD
JPS56114387A (en) * 1980-02-13 1981-09-08 Sanyo Electric Co Ltd Manufacture of photovoltaic force element
JPS5743413A (en) * 1980-05-19 1982-03-11 Energy Conversion Devices Inc Semiconductor element and method of producing same
JPS5767020A (en) * 1980-10-15 1982-04-23 Agency Of Ind Science & Technol Thin silicon film and its manufacture
JPS5778546A (en) * 1980-11-05 1982-05-17 Stanley Electric Co Ltd Production of photoconductive silicon layer
JPS5784137A (en) * 1980-11-14 1982-05-26 Matsushita Electric Ind Co Ltd Plasma chemical evaporation
JPS5789217A (en) * 1980-11-26 1982-06-03 Seiko Epson Corp Manufacturing device of semiconductor
JPS58174570A (ja) * 1982-03-29 1983-10-13 エナージー・コンバーション・デバイセス・インコーポレーテッド グロー放電法による膜形成装置

Patent Citations (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5265184A (en) * 1975-11-26 1977-05-30 Nippon Telegr & Teleph Corp <Ntt> Eqipment for simultaneous sputtering at both surface
US4116806A (en) * 1977-12-08 1978-09-26 Battelle Development Corporation Two-sided planar magnetron sputtering apparatus
JPS556410A (en) * 1978-06-26 1980-01-17 Hitachi Ltd Plasma gas phase reactor
JPS5527626A (en) * 1978-08-17 1980-02-27 Murata Manufacturing Co Electronic part magazine container
JPS5559727A (en) * 1978-10-27 1980-05-06 Hitachi Ltd Plasma deposition device
JPS5585673A (en) * 1978-12-20 1980-06-27 Advanced Coating Tech Cathode for sputtering
JPS5664437A (en) * 1979-08-22 1981-06-01 Onera (Off Nat Aerospatiale) Method and device for chemically etching integrated circuit by dry process
JPS5645761A (en) * 1979-09-25 1981-04-25 Mitsubishi Electric Corp Plasma reaction apparatus
JPS5681923A (en) * 1979-12-06 1981-07-04 Sumitomo Electric Ind Ltd Manufacture of thin film
EP0034706A2 (de) * 1980-02-08 1981-09-02 VEB Zentrum für Forschung und Technologie Mikroelektronik Verfahren und Vorrichtung zum Plasmaätzen oder zur Plasma CVD
JPS56114387A (en) * 1980-02-13 1981-09-08 Sanyo Electric Co Ltd Manufacture of photovoltaic force element
JPS5743413A (en) * 1980-05-19 1982-03-11 Energy Conversion Devices Inc Semiconductor element and method of producing same
JPS5767020A (en) * 1980-10-15 1982-04-23 Agency Of Ind Science & Technol Thin silicon film and its manufacture
JPS5778546A (en) * 1980-11-05 1982-05-17 Stanley Electric Co Ltd Production of photoconductive silicon layer
JPS5784137A (en) * 1980-11-14 1982-05-26 Matsushita Electric Ind Co Ltd Plasma chemical evaporation
JPS5789217A (en) * 1980-11-26 1982-06-03 Seiko Epson Corp Manufacturing device of semiconductor
JPS58174570A (ja) * 1982-03-29 1983-10-13 エナージー・コンバーション・デバイセス・インコーポレーテッド グロー放電法による膜形成装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002093716A (ja) * 2000-09-12 2002-03-29 Kobe Steel Ltd プラズマ表面処理装置

Also Published As

Publication number Publication date
JPH0351971Y2 (ko) 1991-11-08

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