JPH0469465U - - Google Patents

Info

Publication number
JPH0469465U
JPH0469465U JP11073390U JP11073390U JPH0469465U JP H0469465 U JPH0469465 U JP H0469465U JP 11073390 U JP11073390 U JP 11073390U JP 11073390 U JP11073390 U JP 11073390U JP H0469465 U JPH0469465 U JP H0469465U
Authority
JP
Japan
Prior art keywords
plasma cvd
electrode
electrode structure
metal plate
glow discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11073390U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11073390U priority Critical patent/JPH0469465U/ja
Publication of JPH0469465U publication Critical patent/JPH0469465U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP11073390U 1990-10-22 1990-10-22 Pending JPH0469465U (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11073390U JPH0469465U (ko) 1990-10-22 1990-10-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11073390U JPH0469465U (ko) 1990-10-22 1990-10-22

Publications (1)

Publication Number Publication Date
JPH0469465U true JPH0469465U (ko) 1992-06-19

Family

ID=31858115

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11073390U Pending JPH0469465U (ko) 1990-10-22 1990-10-22

Country Status (1)

Country Link
JP (1) JPH0469465U (ko)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06333849A (ja) * 1993-05-19 1994-12-02 Tokyo Electron Ltd プラズマ処理装置
JPH07122502A (ja) * 1993-10-21 1995-05-12 Nec Corp プラズマ加工装置
JP2002093721A (ja) * 2000-09-14 2002-03-29 Canon Inc 堆積膜形成方法及び装置
JP2007258379A (ja) * 2006-03-22 2007-10-04 Tokyo Electron Ltd プラズマ処理装置
JP2013538284A (ja) * 2010-07-02 2013-10-10 アプライド マテリアルズ インコーポレイテッド 堆積装置および堆積の非対称性を低減させる方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06333849A (ja) * 1993-05-19 1994-12-02 Tokyo Electron Ltd プラズマ処理装置
JPH07122502A (ja) * 1993-10-21 1995-05-12 Nec Corp プラズマ加工装置
JP2002093721A (ja) * 2000-09-14 2002-03-29 Canon Inc 堆積膜形成方法及び装置
JP4557400B2 (ja) * 2000-09-14 2010-10-06 キヤノン株式会社 堆積膜形成方法
JP2007258379A (ja) * 2006-03-22 2007-10-04 Tokyo Electron Ltd プラズマ処理装置
JP2013538284A (ja) * 2010-07-02 2013-10-10 アプライド マテリアルズ インコーポレイテッド 堆積装置および堆積の非対称性を低減させる方法

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