JPH01100435U - - Google Patents

Info

Publication number
JPH01100435U
JPH01100435U JP19687087U JP19687087U JPH01100435U JP H01100435 U JPH01100435 U JP H01100435U JP 19687087 U JP19687087 U JP 19687087U JP 19687087 U JP19687087 U JP 19687087U JP H01100435 U JPH01100435 U JP H01100435U
Authority
JP
Japan
Prior art keywords
cleaning nozzle
semiconductor wafer
nozzle
cleaning
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19687087U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP19687087U priority Critical patent/JPH01100435U/ja
Publication of JPH01100435U publication Critical patent/JPH01100435U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)

Description

【図面の簡単な説明】
第1図は本考案の一実施例の断面図である。 1……ウエハ、2……スピンモータ、3……基
体、4……塗布液配管、5……ノズル、6……バ
ツクリンスノズル、7……移動ステージ、8……
溶剤配管、9……カツプ。

Claims (1)

    【実用新案登録請求の範囲】
  1. 半導体ウエハを真空吸着する基体と該基体を回
    転させるモータと前記半導体ウエハ上に塗布液を
    滴下させるノズルと半導体ウエハの裏面を洗浄す
    るための洗浄用ノズルとを有する塗布装置におい
    て、前記洗浄用ノズルは該洗浄用ノズルを移動さ
    せる移動ステージ上に固定されていることを特徴
    とする塗布装置。
JP19687087U 1987-12-24 1987-12-24 Pending JPH01100435U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19687087U JPH01100435U (ja) 1987-12-24 1987-12-24

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19687087U JPH01100435U (ja) 1987-12-24 1987-12-24

Publications (1)

Publication Number Publication Date
JPH01100435U true JPH01100435U (ja) 1989-07-05

Family

ID=31487460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19687087U Pending JPH01100435U (ja) 1987-12-24 1987-12-24

Country Status (1)

Country Link
JP (1) JPH01100435U (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05317789A (ja) * 1992-05-22 1993-12-03 Tokyo Ohka Kogyo Co Ltd 裏面洗浄装置
JP2000114152A (ja) * 1998-10-08 2000-04-21 Tokyo Electron Ltd 基板処理装置
JP2017098295A (ja) * 2015-11-18 2017-06-01 トヨタ自動車株式会社 半導体装置の製造装置及び製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05317789A (ja) * 1992-05-22 1993-12-03 Tokyo Ohka Kogyo Co Ltd 裏面洗浄装置
JP2000114152A (ja) * 1998-10-08 2000-04-21 Tokyo Electron Ltd 基板処理装置
JP2017098295A (ja) * 2015-11-18 2017-06-01 トヨタ自動車株式会社 半導体装置の製造装置及び製造方法

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