JPH0227724U - - Google Patents

Info

Publication number
JPH0227724U
JPH0227724U JP10620188U JP10620188U JPH0227724U JP H0227724 U JPH0227724 U JP H0227724U JP 10620188 U JP10620188 U JP 10620188U JP 10620188 U JP10620188 U JP 10620188U JP H0227724 U JPH0227724 U JP H0227724U
Authority
JP
Japan
Prior art keywords
semiconductor substrate
back surface
dripping
rotating
spray nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10620188U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10620188U priority Critical patent/JPH0227724U/ja
Publication of JPH0227724U publication Critical patent/JPH0227724U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)

Description

【図面の簡単な説明】
第1図は本考案の一実施例を示す断面図である
。 1…半導体基板、2…真空チヤツク、3…滴下
ノズル、4…噴射ノズル、5…塗布膜。

Claims (1)

    【実用新案登録請求の範囲】
  1. 半導体基板表面に液体を滴下し回転塗布する塗
    布装置において、前記半導体基板裏面周辺部に液
    体又は気体を噴射する噴射ノズルを前記半導体基
    板裏面付近に設置したことを特徴とする塗布装置
JP10620188U 1988-08-10 1988-08-10 Pending JPH0227724U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10620188U JPH0227724U (ja) 1988-08-10 1988-08-10

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10620188U JPH0227724U (ja) 1988-08-10 1988-08-10

Publications (1)

Publication Number Publication Date
JPH0227724U true JPH0227724U (ja) 1990-02-22

Family

ID=31339500

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10620188U Pending JPH0227724U (ja) 1988-08-10 1988-08-10

Country Status (1)

Country Link
JP (1) JPH0227724U (ja)

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