JP7773661B2 - 光硬化性組成物 - Google Patents

光硬化性組成物

Info

Publication number
JP7773661B2
JP7773661B2 JP2024558311A JP2024558311A JP7773661B2 JP 7773661 B2 JP7773661 B2 JP 7773661B2 JP 2024558311 A JP2024558311 A JP 2024558311A JP 2024558311 A JP2024558311 A JP 2024558311A JP 7773661 B2 JP7773661 B2 JP 7773661B2
Authority
JP
Japan
Prior art keywords
photocurable composition
photocurable
polymerizable material
multifunctional
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2024558311A
Other languages
English (en)
Japanese (ja)
Other versions
JP2025516450A (ja
JPWO2023224746A5 (https=
JP2025516450A5 (https=
Inventor
フェン ワン，
ウェイジュン リウ，
ティモシー ブライアン スタコウィアック，
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of JP2025516450A publication Critical patent/JP2025516450A/ja
Publication of JPWO2023224746A5 publication Critical patent/JPWO2023224746A5/ja
Publication of JP2025516450A5 publication Critical patent/JP2025516450A5/ja
Priority to JP2025188565A priority Critical patent/JP2026027400A/ja
Application granted granted Critical
Publication of JP7773661B2 publication Critical patent/JP7773661B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/34—Monomers containing two or more unsaturated aliphatic radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/34—Monomers containing two or more unsaturated aliphatic radicals
    • C08F212/36—Divinylbenzene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C08F222/1025—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate of aromatic dialcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/13—Phenols; Phenolates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
    • C08K5/3415—Five-membered rings
    • C08K5/3417—Five-membered rings condensed with carbocyclic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Laminated Bodies (AREA)
JP2024558311A 2022-05-18 2023-04-12 光硬化性組成物 Active JP7773661B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2025188565A JP2026027400A (ja) 2022-05-18 2025-11-07 光硬化性組成物

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17/664,037 2022-05-18
US17/664,037 US11981759B2 (en) 2022-05-18 2022-05-18 Photocurable composition
PCT/US2023/018298 WO2023224746A1 (en) 2022-05-18 2023-04-12 Photocurable composition

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2025188565A Division JP2026027400A (ja) 2022-05-18 2025-11-07 光硬化性組成物

Publications (4)

Publication Number Publication Date
JP2025516450A JP2025516450A (ja) 2025-05-30
JPWO2023224746A5 JPWO2023224746A5 (https=) 2025-07-24
JP2025516450A5 JP2025516450A5 (https=) 2025-07-24
JP7773661B2 true JP7773661B2 (ja) 2025-11-19

Family

ID=88792141

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2024558311A Active JP7773661B2 (ja) 2022-05-18 2023-04-12 光硬化性組成物
JP2025188565A Pending JP2026027400A (ja) 2022-05-18 2025-11-07 光硬化性組成物

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2025188565A Pending JP2026027400A (ja) 2022-05-18 2025-11-07 光硬化性組成物

Country Status (7)

Country Link
US (1) US11981759B2 (https=)
EP (1) EP4526733A1 (https=)
JP (2) JP7773661B2 (https=)
KR (1) KR20250010072A (https=)
CN (1) CN119317873A (https=)
TW (1) TWI885350B (https=)
WO (1) WO2023224746A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230203210A1 (en) * 2021-12-27 2023-06-29 Canon Kabushiki Kaisha Photocurable composition with enhanced thermal stability
WO2025140970A1 (en) * 2023-12-28 2025-07-03 Merck Patent Gmbh Suzuki coupling on bi- and triphenyl compounds
WO2025140969A1 (en) * 2023-12-28 2025-07-03 Merck Patent Gmbh Polyvinyl substituted di- and tri- phenyl compounds for use in forming spin-on layers
WO2025142787A2 (en) * 2023-12-28 2025-07-03 Canon Kabushiki Kaisha Curable composition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010204590A (ja) 2009-03-06 2010-09-16 Nippon Steel Chem Co Ltd 感光性樹脂組成物及びこれを用いた回路配線基板
WO2016027595A1 (ja) 2014-08-19 2016-02-25 富士フイルム株式会社 高分子膜形成用組成物及びその製造方法、高分子膜、分離膜モジュール、並びに、イオン交換装置
CN109946925A (zh) 2019-04-08 2019-06-28 深圳先进技术研究院 一种化合物在促进聚酰亚胺低温固化中的应用、聚酰亚胺前体组合物及其用途

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05155935A (ja) 1991-12-10 1993-06-22 Hitachi Ltd 重合性化合物、その製造方法、及び重合性化合物を含む硬化性組成物
US20060246291A1 (en) * 2002-12-20 2006-11-02 Martin Kunz Method for forming functional layers
WO2006018405A1 (en) * 2004-08-18 2006-02-23 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators
US8940464B2 (en) 2005-12-01 2015-01-27 Basf Se Oxime ester photoinitiators
KR101351286B1 (ko) 2005-12-20 2014-02-17 시바 홀딩 인크 옥심 에스테르 광개시제
US8327196B2 (en) * 2008-07-16 2012-12-04 International Business Machines Corporation Identifying an optimized test bit pattern for analyzing electrical communications channel topologies
EP2745692A1 (en) * 2009-02-13 2014-06-25 Topica Pharmaceuticals, Inc anti-fungal formulation containing luliconazole
JP5583353B2 (ja) * 2009-03-06 2014-09-03 富士フイルム株式会社 固体撮像素子用着色硬化性組成物、カラーフィルタ、及びその製造方法
CN103153952B (zh) 2010-10-05 2016-07-13 巴斯夫欧洲公司 苯并咔唑化合物的肟酯衍生物及其在可光聚合组合物中作为光敏引发剂的用途
EP2788325B1 (en) 2011-12-07 2016-08-10 Basf Se Oxime ester photoinitiators
WO2016104748A1 (ja) 2014-12-26 2016-06-30 新日鉄住金化学株式会社 末端変性可溶性多官能ビニル芳香族共重合体、硬化性樹脂組成物及びこれを用いた光導波路
JP2016128527A (ja) 2015-01-09 2016-07-14 日本化薬株式会社 光硬化性着色組成物、硬化物及び物品
WO2017043474A1 (ja) 2015-09-11 2017-03-16 富士フイルム株式会社 複素環含有ポリマー前駆体材料の製造方法、および、その応用
JP6499568B2 (ja) 2015-11-30 2019-04-10 富士フイルム株式会社 感光性組成物、硬化膜の製造方法、硬化膜、タッチパネル、及び、表示装置
CN108864326B (zh) * 2017-05-12 2020-10-13 湖北固润科技股份有限公司 可光固化组合物及其应用
JP7394759B2 (ja) * 2018-06-29 2023-12-08 株式会社Adeka オキシムエステル化合物およびこれを含有する光重合開始剤

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010204590A (ja) 2009-03-06 2010-09-16 Nippon Steel Chem Co Ltd 感光性樹脂組成物及びこれを用いた回路配線基板
WO2016027595A1 (ja) 2014-08-19 2016-02-25 富士フイルム株式会社 高分子膜形成用組成物及びその製造方法、高分子膜、分離膜モジュール、並びに、イオン交換装置
CN109946925A (zh) 2019-04-08 2019-06-28 深圳先进技术研究院 一种化合物在促进聚酰亚胺低温固化中的应用、聚酰亚胺前体组合物及其用途

Also Published As

Publication number Publication date
WO2023224746A1 (en) 2023-11-23
JP2026027400A (ja) 2026-02-18
JP2025516450A (ja) 2025-05-30
CN119317873A (zh) 2025-01-14
US11981759B2 (en) 2024-05-14
TWI885350B (zh) 2025-06-01
TW202346382A (zh) 2023-12-01
US20230374167A1 (en) 2023-11-23
EP4526733A1 (en) 2025-03-26
KR20250010072A (ko) 2025-01-20

Similar Documents

Publication Publication Date Title
JP7773661B2 (ja) 光硬化性組成物
JP7237915B2 (ja) 光硬化性組成物
TWI819378B (zh) 用於形成具有高熱穩定性的固化層之光可固化組成物
JP7663515B2 (ja) 硬化性組成物
JP7223073B2 (ja) 光硬化性組成物
KR20260006642A (ko) 광경화성 조성물
TW202607049A (zh) 光可固化組成物
JP7832925B2 (ja) 光硬化性組成物
JP7808086B2 (ja) 高い熱安定性を有する硬化層を製造するための硬化性組成物
CN121794115A (zh) 喷墨自适应平坦化用的热固化性组合物
TWI861422B (zh) 光可固化組成物
TW202536097A (zh) 光可固化組成物
JP2025508327A (ja) 反応性ポリマーを含む光硬化性組成物
JP2024024590A (ja) 光硬化性組成物
TW202332705A (zh) 包括非反應性聚合物之光可固化組成物
WO2024123531A1 (en) Photocurable composition with high silicon content

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20250715

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20250715

A871 Explanation of circumstances concerning accelerated examination

Free format text: JAPANESE INTERMEDIATE CODE: A871

Effective date: 20250715

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20251010

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20251107

R150 Certificate of patent or registration of utility model

Ref document number: 7773661

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150