TWI885350B - 光可固化組成物 - Google Patents

光可固化組成物 Download PDF

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Publication number
TWI885350B
TWI885350B TW112112292A TW112112292A TWI885350B TW I885350 B TWI885350 B TW I885350B TW 112112292 A TW112112292 A TW 112112292A TW 112112292 A TW112112292 A TW 112112292A TW I885350 B TWI885350 B TW I885350B
Authority
TW
Taiwan
Prior art keywords
photocurable composition
photocurable
polymerizable material
layer
multifunctional
Prior art date
Application number
TW112112292A
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English (en)
Chinese (zh)
Other versions
TW202346382A (zh
Inventor
萬芬
劉衛軍
堤墨希 史塔維克
Original Assignee
日商佳能股份有限公司
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Publication of TW202346382A publication Critical patent/TW202346382A/zh
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Publication of TWI885350B publication Critical patent/TWI885350B/zh

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/34—Monomers containing two or more unsaturated aliphatic radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/34—Monomers containing two or more unsaturated aliphatic radicals
    • C08F212/36—Divinylbenzene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C08F222/1025—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate of aromatic dialcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/13—Phenols; Phenolates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
    • C08K5/3415—Five-membered rings
    • C08K5/3417—Five-membered rings condensed with carbocyclic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Laminated Bodies (AREA)
TW112112292A 2022-05-18 2023-03-30 光可固化組成物 TWI885350B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US17/664,037 2022-05-18
US17/664,037 US11981759B2 (en) 2022-05-18 2022-05-18 Photocurable composition

Publications (2)

Publication Number Publication Date
TW202346382A TW202346382A (zh) 2023-12-01
TWI885350B true TWI885350B (zh) 2025-06-01

Family

ID=88792141

Family Applications (1)

Application Number Title Priority Date Filing Date
TW112112292A TWI885350B (zh) 2022-05-18 2023-03-30 光可固化組成物

Country Status (7)

Country Link
US (1) US11981759B2 (https=)
EP (1) EP4526733A1 (https=)
JP (2) JP7773661B2 (https=)
KR (1) KR20250010072A (https=)
CN (1) CN119317873A (https=)
TW (1) TWI885350B (https=)
WO (1) WO2023224746A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230203210A1 (en) * 2021-12-27 2023-06-29 Canon Kabushiki Kaisha Photocurable composition with enhanced thermal stability
WO2025140970A1 (en) * 2023-12-28 2025-07-03 Merck Patent Gmbh Suzuki coupling on bi- and triphenyl compounds
WO2025140969A1 (en) * 2023-12-28 2025-07-03 Merck Patent Gmbh Polyvinyl substituted di- and tri- phenyl compounds for use in forming spin-on layers
WO2025142787A2 (en) * 2023-12-28 2025-07-03 Canon Kabushiki Kaisha Curable composition

Citations (4)

* Cited by examiner, † Cited by third party
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CN1726097A (zh) * 2002-12-20 2006-01-25 西巴特殊化学品控股有限公司 形成功能层的方法
TW201625703A (zh) * 2014-12-26 2016-07-16 Nippon Steel & Sumikin Chem Co 末端改質可溶性多官能乙烯基芳香族共聚合物、硬化性樹脂組成物及使用其的光導波管
CN108864326A (zh) * 2017-05-12 2018-11-23 湖北固润科技股份有限公司 可光固化组合物及其应用
TW202014402A (zh) * 2018-06-29 2020-04-16 日商Ａｄｅｋａ股份有限公司 肟酯化合物及含有此之光聚合起始劑

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JPH05155935A (ja) 1991-12-10 1993-06-22 Hitachi Ltd 重合性化合物、その製造方法、及び重合性化合物を含む硬化性組成物
WO2006018405A1 (en) * 2004-08-18 2006-02-23 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators
US8940464B2 (en) 2005-12-01 2015-01-27 Basf Se Oxime ester photoinitiators
KR101351286B1 (ko) 2005-12-20 2014-02-17 시바 홀딩 인크 옥심 에스테르 광개시제
US8327196B2 (en) * 2008-07-16 2012-12-04 International Business Machines Corporation Identifying an optimized test bit pattern for analyzing electrical communications channel topologies
EP2745692A1 (en) * 2009-02-13 2014-06-25 Topica Pharmaceuticals, Inc anti-fungal formulation containing luliconazole
JP5583353B2 (ja) * 2009-03-06 2014-09-03 富士フイルム株式会社 固体撮像素子用着色硬化性組成物、カラーフィルタ、及びその製造方法
JP5269651B2 (ja) * 2009-03-06 2013-08-21 新日鉄住金化学株式会社 感光性樹脂組成物及びこれを用いた回路配線基板
CN103153952B (zh) 2010-10-05 2016-07-13 巴斯夫欧洲公司 苯并咔唑化合物的肟酯衍生物及其在可光聚合组合物中作为光敏引发剂的用途
EP2788325B1 (en) 2011-12-07 2016-08-10 Basf Se Oxime ester photoinitiators
JP6313454B2 (ja) * 2014-08-19 2018-04-18 富士フイルム株式会社 高分子膜形成用組成物及びその製造方法、高分子膜、分離膜モジュール、並びに、イオン交換装置
JP2016128527A (ja) 2015-01-09 2016-07-14 日本化薬株式会社 光硬化性着色組成物、硬化物及び物品
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JP6499568B2 (ja) 2015-11-30 2019-04-10 富士フイルム株式会社 感光性組成物、硬化膜の製造方法、硬化膜、タッチパネル、及び、表示装置
CN109946925A (zh) * 2019-04-08 2019-06-28 深圳先进技术研究院 一种化合物在促进聚酰亚胺低温固化中的应用、聚酰亚胺前体组合物及其用途

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1726097A (zh) * 2002-12-20 2006-01-25 西巴特殊化学品控股有限公司 形成功能层的方法
TW201625703A (zh) * 2014-12-26 2016-07-16 Nippon Steel & Sumikin Chem Co 末端改質可溶性多官能乙烯基芳香族共聚合物、硬化性樹脂組成物及使用其的光導波管
CN108864326A (zh) * 2017-05-12 2018-11-23 湖北固润科技股份有限公司 可光固化组合物及其应用
TW202014402A (zh) * 2018-06-29 2020-04-16 日商Ａｄｅｋａ股份有限公司 肟酯化合物及含有此之光聚合起始劑

Also Published As

Publication number Publication date
WO2023224746A1 (en) 2023-11-23
JP2026027400A (ja) 2026-02-18
JP2025516450A (ja) 2025-05-30
CN119317873A (zh) 2025-01-14
US11981759B2 (en) 2024-05-14
TW202346382A (zh) 2023-12-01
JP7773661B2 (ja) 2025-11-19
US20230374167A1 (en) 2023-11-23
EP4526733A1 (en) 2025-03-26
KR20250010072A (ko) 2025-01-20

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