KR20250010072A - 광경화성 조성물 - Google Patents

광경화성 조성물 Download PDF

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Publication number
KR20250010072A
KR20250010072A KR1020247041383A KR20247041383A KR20250010072A KR 20250010072 A KR20250010072 A KR 20250010072A KR 1020247041383 A KR1020247041383 A KR 1020247041383A KR 20247041383 A KR20247041383 A KR 20247041383A KR 20250010072 A KR20250010072 A KR 20250010072A
Authority
KR
South Korea
Prior art keywords
photocurable composition
photo
polymerizable material
cured layer
photoinitiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020247041383A
Other languages
English (en)
Korean (ko)
Inventor
펀 완
웨이쥔 류
티모시 브라이언 스타초위악
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20250010072A publication Critical patent/KR20250010072A/ko
Pending legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/34—Monomers containing two or more unsaturated aliphatic radicals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C08F212/34—Monomers containing two or more unsaturated aliphatic radicals
    • C08F212/36—Divinylbenzene
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
    • C08F222/1025—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate of aromatic dialcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/13—Phenols; Phenolates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3412—Heterocyclic compounds having nitrogen in the ring having one nitrogen atom in the ring
    • C08K5/3415—Five-membered rings
    • C08K5/3417—Five-membered rings condensed with carbocyclic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Laminated Bodies (AREA)
KR1020247041383A 2022-05-18 2023-04-12 광경화성 조성물 Pending KR20250010072A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17/664,037 2022-05-18
US17/664,037 US11981759B2 (en) 2022-05-18 2022-05-18 Photocurable composition
PCT/US2023/018298 WO2023224746A1 (en) 2022-05-18 2023-04-12 Photocurable composition

Publications (1)

Publication Number Publication Date
KR20250010072A true KR20250010072A (ko) 2025-01-20

Family

ID=88792141

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020247041383A Pending KR20250010072A (ko) 2022-05-18 2023-04-12 광경화성 조성물

Country Status (7)

Country Link
US (1) US11981759B2 (https=)
EP (1) EP4526733A1 (https=)
JP (2) JP7773661B2 (https=)
KR (1) KR20250010072A (https=)
CN (1) CN119317873A (https=)
TW (1) TWI885350B (https=)
WO (1) WO2023224746A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20230203210A1 (en) * 2021-12-27 2023-06-29 Canon Kabushiki Kaisha Photocurable composition with enhanced thermal stability
WO2025140970A1 (en) * 2023-12-28 2025-07-03 Merck Patent Gmbh Suzuki coupling on bi- and triphenyl compounds
WO2025140969A1 (en) * 2023-12-28 2025-07-03 Merck Patent Gmbh Polyvinyl substituted di- and tri- phenyl compounds for use in forming spin-on layers
WO2025142787A2 (en) * 2023-12-28 2025-07-03 Canon Kabushiki Kaisha Curable composition

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05155935A (ja) 1991-12-10 1993-06-22 Hitachi Ltd 重合性化合物、その製造方法、及び重合性化合物を含む硬化性組成物
US20060246291A1 (en) * 2002-12-20 2006-11-02 Martin Kunz Method for forming functional layers
WO2006018405A1 (en) * 2004-08-18 2006-02-23 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators
US8940464B2 (en) 2005-12-01 2015-01-27 Basf Se Oxime ester photoinitiators
KR101351286B1 (ko) 2005-12-20 2014-02-17 시바 홀딩 인크 옥심 에스테르 광개시제
US8327196B2 (en) * 2008-07-16 2012-12-04 International Business Machines Corporation Identifying an optimized test bit pattern for analyzing electrical communications channel topologies
EP2745692A1 (en) * 2009-02-13 2014-06-25 Topica Pharmaceuticals, Inc anti-fungal formulation containing luliconazole
JP5583353B2 (ja) * 2009-03-06 2014-09-03 富士フイルム株式会社 固体撮像素子用着色硬化性組成物、カラーフィルタ、及びその製造方法
JP5269651B2 (ja) * 2009-03-06 2013-08-21 新日鉄住金化学株式会社 感光性樹脂組成物及びこれを用いた回路配線基板
CN103153952B (zh) 2010-10-05 2016-07-13 巴斯夫欧洲公司 苯并咔唑化合物的肟酯衍生物及其在可光聚合组合物中作为光敏引发剂的用途
EP2788325B1 (en) 2011-12-07 2016-08-10 Basf Se Oxime ester photoinitiators
JP6313454B2 (ja) * 2014-08-19 2018-04-18 富士フイルム株式会社 高分子膜形成用組成物及びその製造方法、高分子膜、分離膜モジュール、並びに、イオン交換装置
WO2016104748A1 (ja) 2014-12-26 2016-06-30 新日鉄住金化学株式会社 末端変性可溶性多官能ビニル芳香族共重合体、硬化性樹脂組成物及びこれを用いた光導波路
JP2016128527A (ja) 2015-01-09 2016-07-14 日本化薬株式会社 光硬化性着色組成物、硬化物及び物品
WO2017043474A1 (ja) 2015-09-11 2017-03-16 富士フイルム株式会社 複素環含有ポリマー前駆体材料の製造方法、および、その応用
JP6499568B2 (ja) 2015-11-30 2019-04-10 富士フイルム株式会社 感光性組成物、硬化膜の製造方法、硬化膜、タッチパネル、及び、表示装置
CN108864326B (zh) * 2017-05-12 2020-10-13 湖北固润科技股份有限公司 可光固化组合物及其应用
JP7394759B2 (ja) * 2018-06-29 2023-12-08 株式会社Adeka オキシムエステル化合物およびこれを含有する光重合開始剤
CN109946925A (zh) * 2019-04-08 2019-06-28 深圳先进技术研究院 一种化合物在促进聚酰亚胺低温固化中的应用、聚酰亚胺前体组合物及其用途

Also Published As

Publication number Publication date
WO2023224746A1 (en) 2023-11-23
JP2026027400A (ja) 2026-02-18
JP2025516450A (ja) 2025-05-30
CN119317873A (zh) 2025-01-14
US11981759B2 (en) 2024-05-14
TWI885350B (zh) 2025-06-01
TW202346382A (zh) 2023-12-01
JP7773661B2 (ja) 2025-11-19
US20230374167A1 (en) 2023-11-23
EP4526733A1 (en) 2025-03-26

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PA0105 International application

Patent event date: 20241213

Patent event code: PA01051R01D

Comment text: International Patent Application

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Patent event code: PA02012R01D

Patent event date: 20241213

Comment text: Request for Examination of Application

PG1501 Laying open of application