JP7699458B2 - 露光装置、露光方法及び物品の製造方法 - Google Patents

露光装置、露光方法及び物品の製造方法 Download PDF

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Publication number
JP7699458B2
JP7699458B2 JP2021064794A JP2021064794A JP7699458B2 JP 7699458 B2 JP7699458 B2 JP 7699458B2 JP 2021064794 A JP2021064794 A JP 2021064794A JP 2021064794 A JP2021064794 A JP 2021064794A JP 7699458 B2 JP7699458 B2 JP 7699458B2
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Japan
Prior art keywords
area
substrate
stage
synchronization error
exposure
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JP2021064794A
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Japanese (ja)
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JP2022160187A5 (https=
JP2022160187A (ja
Inventor
隆紀 佐藤
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2021064794A priority Critical patent/JP7699458B2/ja
Priority to KR1020220033669A priority patent/KR102904604B1/ko
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Publication of JP2022160187A5 publication Critical patent/JP2022160187A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2021064794A 2021-04-06 2021-04-06 露光装置、露光方法及び物品の製造方法 Active JP7699458B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2021064794A JP7699458B2 (ja) 2021-04-06 2021-04-06 露光装置、露光方法及び物品の製造方法
KR1020220033669A KR102904604B1 (ko) 2021-04-06 2022-03-18 노광 장치, 노광 방법 및 물품의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2021064794A JP7699458B2 (ja) 2021-04-06 2021-04-06 露光装置、露光方法及び物品の製造方法

Publications (3)

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JP2022160187A JP2022160187A (ja) 2022-10-19
JP2022160187A5 JP2022160187A5 (https=) 2024-04-05
JP7699458B2 true JP7699458B2 (ja) 2025-06-27

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JP2021064794A Active JP7699458B2 (ja) 2021-04-06 2021-04-06 露光装置、露光方法及び物品の製造方法

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JP (1) JP7699458B2 (https=)
KR (1) KR102904604B1 (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002246304A (ja) 2001-02-21 2002-08-30 Canon Inc 走査露光装置及び走査露光方法並びにデバイスの製造方法
JP2006295151A (ja) 2005-03-18 2006-10-26 Nikon Corp 露光方法及び露光装置、デバイス製造方法、並びに露光装置の評価方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3781116B2 (ja) * 1994-05-18 2006-05-31 株式会社ニコン 走査露光方法及び走査露光装置
JPH09115799A (ja) * 1995-10-16 1997-05-02 Nikon Corp 走査型露光装置
JPH1167655A (ja) * 1997-08-11 1999-03-09 Nikon Corp 走査型露光装置及び同期誤差解析方法
JP3097620B2 (ja) * 1997-10-09 2000-10-10 日本電気株式会社 走査型縮小投影露光装置
JP2004319780A (ja) * 2003-04-16 2004-11-11 Nikon Corp 露光方法及び露光装置並びにデバイス製造方法
JP2006202914A (ja) * 2005-01-19 2006-08-03 Nikon Corp 解析方法、評価方法、制御方法、露光方法、解析装置、制御装置及び露光装置
JP2009302173A (ja) * 2008-06-11 2009-12-24 Canon Inc 露光装置及びデバイス製造方法
JP2011044554A (ja) * 2009-08-20 2011-03-03 Toshiba Corp 露光制御装置および半導体デバイスの製造方法
JP2011086892A (ja) * 2009-10-19 2011-04-28 Canon Inc 位置制御装置、露光装置およびデバイス製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002246304A (ja) 2001-02-21 2002-08-30 Canon Inc 走査露光装置及び走査露光方法並びにデバイスの製造方法
JP2006295151A (ja) 2005-03-18 2006-10-26 Nikon Corp 露光方法及び露光装置、デバイス製造方法、並びに露光装置の評価方法

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Publication number Publication date
KR102904604B1 (ko) 2025-12-26
JP2022160187A (ja) 2022-10-19
KR20220138803A (ko) 2022-10-13

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