KR102904604B1 - 노광 장치, 노광 방법 및 물품의 제조 방법 - Google Patents

노광 장치, 노광 방법 및 물품의 제조 방법

Info

Publication number
KR102904604B1
KR102904604B1 KR1020220033669A KR20220033669A KR102904604B1 KR 102904604 B1 KR102904604 B1 KR 102904604B1 KR 1020220033669 A KR1020220033669 A KR 1020220033669A KR 20220033669 A KR20220033669 A KR 20220033669A KR 102904604 B1 KR102904604 B1 KR 102904604B1
Authority
KR
South Korea
Prior art keywords
area
substrate
stage
exposure
synchronization error
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
KR1020220033669A
Other languages
English (en)
Korean (ko)
Other versions
KR20220138803A (ko
Inventor
타카노리 사토
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20220138803A publication Critical patent/KR20220138803A/ko
Application granted granted Critical
Publication of KR102904604B1 publication Critical patent/KR102904604B1/ko
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020220033669A 2021-04-06 2022-03-18 노광 장치, 노광 방법 및 물품의 제조 방법 Active KR102904604B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2021-064794 2021-04-06
JP2021064794A JP7699458B2 (ja) 2021-04-06 2021-04-06 露光装置、露光方法及び物品の製造方法

Publications (2)

Publication Number Publication Date
KR20220138803A KR20220138803A (ko) 2022-10-13
KR102904604B1 true KR102904604B1 (ko) 2025-12-26

Family

ID=83599343

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020220033669A Active KR102904604B1 (ko) 2021-04-06 2022-03-18 노광 장치, 노광 방법 및 물품의 제조 방법

Country Status (2)

Country Link
JP (1) JP7699458B2 (https=)
KR (1) KR102904604B1 (https=)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006202914A (ja) 2005-01-19 2006-08-03 Nikon Corp 解析方法、評価方法、制御方法、露光方法、解析装置、制御装置及び露光装置
JP2006295151A (ja) 2005-03-18 2006-10-26 Nikon Corp 露光方法及び露光装置、デバイス製造方法、並びに露光装置の評価方法
JP2011086892A (ja) 2009-10-19 2011-04-28 Canon Inc 位置制御装置、露光装置およびデバイス製造方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3781116B2 (ja) * 1994-05-18 2006-05-31 株式会社ニコン 走査露光方法及び走査露光装置
JPH09115799A (ja) * 1995-10-16 1997-05-02 Nikon Corp 走査型露光装置
JPH1167655A (ja) * 1997-08-11 1999-03-09 Nikon Corp 走査型露光装置及び同期誤差解析方法
JP3097620B2 (ja) * 1997-10-09 2000-10-10 日本電気株式会社 走査型縮小投影露光装置
JP3559766B2 (ja) 2001-02-21 2004-09-02 キヤノン株式会社 走査露光装置及び走査露光方法並びにデバイスの製造方法
JP2004319780A (ja) * 2003-04-16 2004-11-11 Nikon Corp 露光方法及び露光装置並びにデバイス製造方法
JP2009302173A (ja) * 2008-06-11 2009-12-24 Canon Inc 露光装置及びデバイス製造方法
JP2011044554A (ja) * 2009-08-20 2011-03-03 Toshiba Corp 露光制御装置および半導体デバイスの製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006202914A (ja) 2005-01-19 2006-08-03 Nikon Corp 解析方法、評価方法、制御方法、露光方法、解析装置、制御装置及び露光装置
JP2006295151A (ja) 2005-03-18 2006-10-26 Nikon Corp 露光方法及び露光装置、デバイス製造方法、並びに露光装置の評価方法
JP2011086892A (ja) 2009-10-19 2011-04-28 Canon Inc 位置制御装置、露光装置およびデバイス製造方法

Also Published As

Publication number Publication date
JP2022160187A (ja) 2022-10-19
JP7699458B2 (ja) 2025-06-27
KR20220138803A (ko) 2022-10-13

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