JP7663120B2 - 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法 - Google Patents

露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法 Download PDF

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Publication number
JP7663120B2
JP7663120B2 JP2023513020A JP2023513020A JP7663120B2 JP 7663120 B2 JP7663120 B2 JP 7663120B2 JP 2023513020 A JP2023513020 A JP 2023513020A JP 2023513020 A JP2023513020 A JP 2023513020A JP 7663120 B2 JP7663120 B2 JP 7663120B2
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Prior art keywords
exposure
substrate
spatial light
alignment
unit
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Japanese (ja)
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JPWO2022215690A1 (https=
JPWO2022215690A5 (https=
Inventor
正紀 加藤
恭志 水野
仁 水野
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2023513020A 2021-04-09 2022-04-05 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法 Active JP7663120B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021066818 2021-04-09
JP2021066818 2021-04-09
PCT/JP2022/017093 WO2022215690A1 (ja) 2021-04-09 2022-04-05 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法

Publications (3)

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JPWO2022215690A1 JPWO2022215690A1 (https=) 2022-10-13
JPWO2022215690A5 JPWO2022215690A5 (https=) 2024-01-17
JP7663120B2 true JP7663120B2 (ja) 2025-04-16

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JP2023513020A Active JP7663120B2 (ja) 2021-04-09 2022-04-05 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法

Country Status (5)

Country Link
JP (1) JP7663120B2 (https=)
KR (1) KR20230150879A (https=)
CN (1) CN117083572A (https=)
TW (1) TW202305513A (https=)
WO (1) WO2022215690A1 (https=)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006186370A (ja) 2004-12-27 2006-07-13 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2008203857A (ja) 2007-02-22 2008-09-04 Nikon Corp 露光方法、フラットパネルディスプレイ用の基板の製造方法、及び露光装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3052587B2 (ja) * 1992-07-28 2000-06-12 日本電気株式会社 露光装置
JP3593642B2 (ja) * 1996-08-29 2004-11-24 富士通株式会社 露光方法及び露光装置
JP2007108559A (ja) 2005-10-17 2007-04-26 Nikon Corp 走査型露光装置及びデバイスの製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006186370A (ja) 2004-12-27 2006-07-13 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2008203857A (ja) 2007-02-22 2008-09-04 Nikon Corp 露光方法、フラットパネルディスプレイ用の基板の製造方法、及び露光装置

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CN117083572A (zh) 2023-11-17
JPWO2022215690A1 (https=) 2022-10-13
WO2022215690A1 (ja) 2022-10-13
TW202305513A (zh) 2023-02-01
KR20230150879A (ko) 2023-10-31

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