KR20230150879A - 노광 장치, 디바이스 제조 방법 및 플랫 패널 디스플레이의 제조 방법 - Google Patents

노광 장치, 디바이스 제조 방법 및 플랫 패널 디스플레이의 제조 방법 Download PDF

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Publication number
KR20230150879A
KR20230150879A KR1020237033911A KR20237033911A KR20230150879A KR 20230150879 A KR20230150879 A KR 20230150879A KR 1020237033911 A KR1020237033911 A KR 1020237033911A KR 20237033911 A KR20237033911 A KR 20237033911A KR 20230150879 A KR20230150879 A KR 20230150879A
Authority
KR
South Korea
Prior art keywords
exposure
substrate
unit
spatial light
light modulator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020237033911A
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English (en)
Korean (ko)
Inventor
마사키 가토
야스시 미즈노
히토시 미즈노
Original Assignee
가부시키가이샤 니콘
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 니콘 filed Critical 가부시키가이샤 니콘
Publication of KR20230150879A publication Critical patent/KR20230150879A/ko
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020237033911A 2021-04-09 2022-04-05 노광 장치, 디바이스 제조 방법 및 플랫 패널 디스플레이의 제조 방법 Pending KR20230150879A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2021066818 2021-04-09
JPJP-P-2021-066818 2021-04-09
PCT/JP2022/017093 WO2022215690A1 (ja) 2021-04-09 2022-04-05 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法

Publications (1)

Publication Number Publication Date
KR20230150879A true KR20230150879A (ko) 2023-10-31

Family

ID=83546189

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020237033911A Pending KR20230150879A (ko) 2021-04-09 2022-04-05 노광 장치, 디바이스 제조 방법 및 플랫 패널 디스플레이의 제조 방법

Country Status (5)

Country Link
JP (1) JP7663120B2 (https=)
KR (1) KR20230150879A (https=)
CN (1) CN117083572A (https=)
TW (1) TW202305513A (https=)
WO (1) WO2022215690A1 (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007108559A (ja) 2005-10-17 2007-04-26 Nikon Corp 走査型露光装置及びデバイスの製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3052587B2 (ja) * 1992-07-28 2000-06-12 日本電気株式会社 露光装置
JP3593642B2 (ja) * 1996-08-29 2004-11-24 富士通株式会社 露光方法及び露光装置
US7459247B2 (en) * 2004-12-27 2008-12-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8431328B2 (en) * 2007-02-22 2013-04-30 Nikon Corporation Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007108559A (ja) 2005-10-17 2007-04-26 Nikon Corp 走査型露光装置及びデバイスの製造方法

Also Published As

Publication number Publication date
CN117083572A (zh) 2023-11-17
JPWO2022215690A1 (https=) 2022-10-13
WO2022215690A1 (ja) 2022-10-13
TW202305513A (zh) 2023-02-01
JP7663120B2 (ja) 2025-04-16

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