JPWO2022215690A1 - - Google Patents
Info
- Publication number
- JPWO2022215690A1 JPWO2022215690A1 JP2023513020A JP2023513020A JPWO2022215690A1 JP WO2022215690 A1 JPWO2022215690 A1 JP WO2022215690A1 JP 2023513020 A JP2023513020 A JP 2023513020A JP 2023513020 A JP2023513020 A JP 2023513020A JP WO2022215690 A1 JPWO2022215690 A1 JP WO2022215690A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021066818 | 2021-04-09 | ||
| JP2021066818 | 2021-04-09 | ||
| PCT/JP2022/017093 WO2022215690A1 (ja) | 2021-04-09 | 2022-04-05 | 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JPWO2022215690A1 true JPWO2022215690A1 (https=) | 2022-10-13 |
| JPWO2022215690A5 JPWO2022215690A5 (https=) | 2024-01-17 |
| JP7663120B2 JP7663120B2 (ja) | 2025-04-16 |
Family
ID=83546189
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023513020A Active JP7663120B2 (ja) | 2021-04-09 | 2022-04-05 | 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP7663120B2 (https=) |
| KR (1) | KR20230150879A (https=) |
| CN (1) | CN117083572A (https=) |
| TW (1) | TW202305513A (https=) |
| WO (1) | WO2022215690A1 (https=) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0653105A (ja) * | 1992-07-28 | 1994-02-25 | Nec Corp | 露光装置 |
| JPH1074677A (ja) * | 1996-08-29 | 1998-03-17 | Fujitsu Ltd | 露光方法及び露光装置 |
| JP2006186370A (ja) * | 2004-12-27 | 2006-07-13 | Asml Netherlands Bv | リソグラフィ装置およびデバイス製造方法 |
| JP2008203857A (ja) * | 2007-02-22 | 2008-09-04 | Nikon Corp | 露光方法、フラットパネルディスプレイ用の基板の製造方法、及び露光装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007108559A (ja) | 2005-10-17 | 2007-04-26 | Nikon Corp | 走査型露光装置及びデバイスの製造方法 |
-
2022
- 2022-04-05 KR KR1020237033911A patent/KR20230150879A/ko active Pending
- 2022-04-05 JP JP2023513020A patent/JP7663120B2/ja active Active
- 2022-04-05 WO PCT/JP2022/017093 patent/WO2022215690A1/ja not_active Ceased
- 2022-04-05 CN CN202280025233.XA patent/CN117083572A/zh active Pending
- 2022-04-07 TW TW111113260A patent/TW202305513A/zh unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0653105A (ja) * | 1992-07-28 | 1994-02-25 | Nec Corp | 露光装置 |
| JPH1074677A (ja) * | 1996-08-29 | 1998-03-17 | Fujitsu Ltd | 露光方法及び露光装置 |
| JP2006186370A (ja) * | 2004-12-27 | 2006-07-13 | Asml Netherlands Bv | リソグラフィ装置およびデバイス製造方法 |
| JP2008203857A (ja) * | 2007-02-22 | 2008-09-04 | Nikon Corp | 露光方法、フラットパネルディスプレイ用の基板の製造方法、及び露光装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN117083572A (zh) | 2023-11-17 |
| WO2022215690A1 (ja) | 2022-10-13 |
| TW202305513A (zh) | 2023-02-01 |
| KR20230150879A (ko) | 2023-10-31 |
| JP7663120B2 (ja) | 2025-04-16 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231005 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20231005 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20240604 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20240726 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20240927 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20241105 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20241223 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250213 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20250305 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20250318 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 7663120 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |