JPWO2022215690A1 - - Google Patents
Info
- Publication number
- JPWO2022215690A1 JPWO2022215690A1 JP2023513020A JP2023513020A JPWO2022215690A1 JP WO2022215690 A1 JPWO2022215690 A1 JP WO2022215690A1 JP 2023513020 A JP2023513020 A JP 2023513020A JP 2023513020 A JP2023513020 A JP 2023513020A JP WO2022215690 A1 JPWO2022215690 A1 JP WO2022215690A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021066818 | 2021-04-09 | ||
PCT/JP2022/017093 WO2022215690A1 (ja) | 2021-04-09 | 2022-04-05 | 露光装置、デバイス製造方法およびフラットパネルディスプレイの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2022215690A1 true JPWO2022215690A1 (ja) | 2022-10-13 |
JPWO2022215690A5 JPWO2022215690A5 (ja) | 2024-01-17 |
Family
ID=83546189
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023513020A Pending JPWO2022215690A1 (ja) | 2021-04-09 | 2022-04-05 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPWO2022215690A1 (ja) |
KR (1) | KR20230150879A (ja) |
CN (1) | CN117083572A (ja) |
TW (1) | TW202305513A (ja) |
WO (1) | WO2022215690A1 (ja) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3052587B2 (ja) * | 1992-07-28 | 2000-06-12 | 日本電気株式会社 | 露光装置 |
JP3593642B2 (ja) * | 1996-08-29 | 2004-11-24 | 富士通株式会社 | 露光方法及び露光装置 |
US7459247B2 (en) * | 2004-12-27 | 2008-12-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2007108559A (ja) | 2005-10-17 | 2007-04-26 | Nikon Corp | 走査型露光装置及びデバイスの製造方法 |
US8431328B2 (en) * | 2007-02-22 | 2013-04-30 | Nikon Corporation | Exposure method, method for manufacturing flat panel display substrate, and exposure apparatus |
-
2022
- 2022-04-05 WO PCT/JP2022/017093 patent/WO2022215690A1/ja active Application Filing
- 2022-04-05 KR KR1020237033911A patent/KR20230150879A/ko unknown
- 2022-04-05 JP JP2023513020A patent/JPWO2022215690A1/ja active Pending
- 2022-04-05 CN CN202280025233.XA patent/CN117083572A/zh active Pending
- 2022-04-07 TW TW111113260A patent/TW202305513A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
CN117083572A (zh) | 2023-11-17 |
WO2022215690A1 (ja) | 2022-10-13 |
KR20230150879A (ko) | 2023-10-31 |
TW202305513A (zh) | 2023-02-01 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20231005 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20231005 |